Patents by Inventor Etsu Takeuchi

Etsu Takeuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210259232
    Abstract: A release device for a vaporizable and/or sublimateable pesticide is provided. The release device is suitable for use against subterranean pests (e.g. fire ants). The release device may be driven into and/or placed in a cavity within the soil or other substrate where the pests reside. The release device comprises a vapor injector which releases the pesticidal composition through apertures into the pest habitat, where it is distributed in vapor form.
    Type: Application
    Filed: February 19, 2021
    Publication date: August 26, 2021
    Inventors: Nathan Woodbury, Robert James Etsu Takeuchi, Steven Lin, Anthony Hoover, Shannon Pyke
  • Publication number: 20200046186
    Abstract: A cleaning apparatus engageable with a vacuum source is provided. The vacuum source can be used to draw fluid through an interior space of a housing of the cleaning apparatus through an inlet tube so that debris entrained in the fluid collects in a debris collection zone upstream of a downstream opening in the inlet tube. Methods of using the cleaning apparatus are provided.
    Type: Application
    Filed: March 26, 2018
    Publication date: February 13, 2020
    Inventors: Nathan WOODBURY, Robert James Etsu TAKEUCHI, Alyssa WONGKEE
  • Publication number: 20190239501
    Abstract: Devices and methods for the control of pests, including plant pests, using the vapors of a plant health, pesticidal and/or pest control composition are disclosed. Compositions, devices and methods for the selective control of plant or other pests while not harming one or more beneficial insects are also disclosed. In some embodiments, the pests are include bugs, fleas, lice, ticks, plant pathogenic insects, acari, or the like. In some embodiments, the pests are varroa mites and the beneficial insects are honey bees.
    Type: Application
    Filed: December 29, 2018
    Publication date: August 8, 2019
    Inventors: Karan MANHAS, Annett ROZEK, Nathan WOODBURY, Shannon LENTZ, Robert James Etsu TAKEUCHI, Sasha OZEROFF, Jay K. SHAH
  • Publication number: 20180116198
    Abstract: Devices and methods for the control of pests using the vapors of a pesticidal and/or pest control composition are disclosed. Compositions, devices and methods for the selective control of pests while not harming one or more beneficial insects are also disclosed. In some embodiments, the pests are bed bugs, fleas, lice, ticks, or the like. In some embodiments, the pests are varroa mites and the beneficial insects are honey bees.
    Type: Application
    Filed: December 21, 2017
    Publication date: May 3, 2018
    Inventors: Karan MANHAS, Annett ROZEK, Nathan WOODBURY, Shannon LENTZ, Robert James Etsu TAKEUCHI, Sasha OZEROFF
  • Publication number: 20160286782
    Abstract: Devices and methods for the control of pests using the vapors of a pesticidal composition. Compostions, devices and methods for the selective control of pests while not harming one or more beneficial insects are also disclosed. In some embodiments, the pests are bed bugs, fleas, lice, ticks, or the like. In some embodiments, the pests are varroa mites and the beneficial insects are honey bees.
    Type: Application
    Filed: November 18, 2014
    Publication date: October 6, 2016
    Inventors: Karan MANHAS, Annett ROZEK, Nathan WOODBURY, Shannon LENTZ, Robert James Etsu TAKEUCHI, Sasha OZEROFF
  • Patent number: 9399725
    Abstract: To provide a temporary bonding adhesive for a semiconductor wafer that reduces damage to a semiconductor wafer, makes it readily detachable, and can shorten the time required for thermal decomposition, and a manufacturing method for a semiconductor device using this. A temporary bonding adhesive for a semiconductor wafer, being a temporary bonding adhesive used for temporarily bonding a semiconductor wafer onto a supporting substrate in order to process a semiconductor wafer, and for detaching a semiconductor wafer from a supporting substrate by heating after processing, containing a resin composition whereof the 50% weight loss temperature decreases after irradiation by active energy rays.
    Type: Grant
    Filed: June 15, 2010
    Date of Patent: July 26, 2016
    Assignee: SUMITOMO BAKELITE CO., LTD.
    Inventors: Etsu Takeuchi, Junya Kusunoki, Hiromichi Sugiyama, Toshiharu Kuboyama, Masakazu Kawata
  • Publication number: 20130009172
    Abstract: An object of the invention is to provide a method of manufacturing a light-emitting element, in which residue from a fixing resin layer is less likely to be left on a semiconductor layer and a supporting base in the case of manufacturing the light-emitting element by a laser lift-off technique. Furthermore, another object of the invention is to provide a highly reliable light-emitting element that is manufactured by the method of the present invention. The above-described objects are accomplished by applying a thermally decomposable resin composition as a fixing resin layer that fixes the semiconductor layer to a supporting base, and by thermally decomposing the fixing resin layer at the time of peeling off the semiconductor layer from the supporting base.
    Type: Application
    Filed: March 17, 2011
    Publication date: January 10, 2013
    Applicant: SUMITOMO BAKELITE CO., LTD.
    Inventors: Junya Kusunoki, Etsu Takeuchi, Hiromichi Sugiyama, Toshiharu Kuboyama, Masakazu Kawata
  • Publication number: 20120228782
    Abstract: Disclosed is a method for manufacturing an electronic device, the method including: placing an electronic component on a substrate 11; forming standing portions 13 on the surface of the substrate 11 on which the electronic component 10 is placed, the standing portions 13 comprising a thermally decomposable resin; applying an encapsulating material 14 so as to encapsulate the electronic component 10 and cover around the standing portions 13 while exposing a portion of each of the standing portions 13 from the surface of the encapsulating material 14; heating the standing portions 13 to decompose and remove the standing portions 13, thereby forming holes 141 through the encapsulating material 14; and placing a conductive material 15 in the holes 141.
    Type: Application
    Filed: November 19, 2010
    Publication date: September 13, 2012
    Applicant: Sumitomo Bakelite Co, Ltd
    Inventors: Masakazu Kawata, Etsu Takeuchi, Junya Kusunoki, Hiromichi Sugiyama
  • Publication number: 20110318938
    Abstract: To provide a temporary bonding adhesive for a semiconductor wafer that reduces damage to a semiconductor wafer, makes it readily detachable, and can shorten the time required for thermal decomposition, and a manufacturing method for a semiconductor device using this. A temporary bonding adhesive for a semiconductor wafer, being a temporary bonding adhesive used for temporarily bonding a semiconductor wafer onto a supporting substrate in order to process a semiconductor wafer, and for detaching a semiconductor wafer from a supporting substrate by heating after processing, containing a resin composition composition whereof the 50% weight loss temperature decreases after irradiation by active energy rays.
    Type: Application
    Filed: June 15, 2010
    Publication date: December 29, 2011
    Applicant: SUMITOMO BAKELITE CO., LTD.
    Inventors: Etsu Takeuchi, Junya Kusunoki, Hiromichi Sugiyama, Toshiharu Kuboyama, Masakazu Kawata
  • Patent number: 8053515
    Abstract: A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
    Type: Grant
    Filed: December 3, 2007
    Date of Patent: November 8, 2011
    Assignee: Promerus LLC
    Inventors: Edmund Elce, Andrew Bell, Brian Knapp, Hendra Ng, Larry F. Rhodes, Robert Shick, Wei Zhang, William DiMenna, Saikumar Jayaraman, Jianyong Jin, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Xiaoming Wu, Etsu Takeuchi
  • Publication number: 20110263095
    Abstract: To provide a temporary bonding adhesive for a semiconductor wafer that can reduce damage to the semiconductor wafer, is easily detachable, and can shorten the time required for thermal decomposition, and a manufacturing method for a semiconductor device using the same. A temporary bonding adhesive for a semiconductor device is provided, being a temporary bonding adhesive used for temporarily bonding a semiconductor wafer onto a supporting substrate in order to process a semiconductor wafer, and for detaching a semiconductor wafer from a supporting substrate by heating after processing, containing a resin composition such that the difference between the 95% weight loss temperature and the 5% weight loss temperature is 1 degree Celsius?(95% weight loss temperature)?(5% weight loss temperature)?300 degrees Celsius.
    Type: Application
    Filed: June 15, 2010
    Publication date: October 27, 2011
    Applicant: SUMITOMO BAKELITE CO., LTD.
    Inventors: Etsu Takeuchi, Junya Kusunoki, Hiromichi Sugiyama, Toshiharu Kuboyama, Masakazu Kawata
  • Patent number: 7858721
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Grant
    Filed: April 27, 2009
    Date of Patent: December 28, 2010
    Assignee: Promerus LLC
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Ho Kang
  • Publication number: 20090215976
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Application
    Filed: April 27, 2009
    Publication date: August 27, 2009
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Daoji Gan, Etsu Takeuchi, Seok Ho Kang
  • Patent number: 7524594
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Grant
    Filed: July 1, 2005
    Date of Patent: April 28, 2009
    Assignee: Promerus LLC
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Ho Kang
  • Publication number: 20080194740
    Abstract: A polymer includes a first type of repeat unit represented by Formula I: where X is selected from —CH2—, —CH2—CH2—, or —O—; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1, R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.
    Type: Application
    Filed: December 3, 2007
    Publication date: August 14, 2008
    Inventors: Edmund Elce, Andrew Bell, Brian Knapp, Hendra Ng, Larry F. Rhodes, Robert Shick, Wei Zhang, William DiMenna, Saikumar Jayaraman, Jianyong Jin, Rajesh Raja Puthenkovilakom, Ramakrishna Ravikiran, Xiaoming Wu, Etsu Takeuchi
  • Publication number: 20060008734
    Abstract: Some embodiments in accordance with the present invention relate to norbornene-type polymers and to photosensitive dielectric resin compositions formed therefrom. Other embodiments relate to films formed from such compositions and to devices, such as electrical, electronic and optoelectronic devices, that encompass such films.
    Type: Application
    Filed: July 1, 2005
    Publication date: January 12, 2006
    Inventors: Dino Amoroso, Brian Bedwell, Andrew Bell, Edmund Elce, Rajesh Puthenkovilakom, Ramakrishna Ravikiran, Robert Shick, Xiaoming Wu, Hiroaki Makabe, Yasunori Takahashi, Etsu Takeuchi, Daoji Gan, Seok Kang
  • Patent number: 6709804
    Abstract: A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprises coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition forms a resin layer having excellent heat resistance.
    Type: Grant
    Filed: February 19, 2003
    Date of Patent: March 23, 2004
    Assignees: Riken, Sumitomo Bakelite Company, Ltd.
    Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
  • Publication number: 20030194621
    Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a polyamic acid or a polyimide which has substituents having a cis-diene structure at the side chains; a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating the substrate with the composition and forming fine patterns by exposure of irradiation; and processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device which comprise coating the substrate with the composition and forming fine patterns by crosslinking the cis-diene group by polycondensation with oxidation with the singlet oxygen generated by exposure of irradiation to the oxygen sensitizer in the presence of oxygen.
    Type: Application
    Filed: February 19, 2003
    Publication date: October 16, 2003
    Applicant: RIKEN
    Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
  • Patent number: 6528231
    Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or a polyimide. A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with the photosensitive resin composition and forming fine patterns by exposure to radiation. Processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device, which comprise coating a substrate with the photosensitive resin composition and forming fine patterns by crosslinking cis-diene by oxidation polycondensation with singlet oxygen generated by exposure of the oxygen sensitizer to radiation. The photosensitive resin composition is of the negative type and exhibits high sensitivity and high resolution. The photosensitive resin composition can form a resin layer having excellent heat resistance.
    Type: Grant
    Filed: January 24, 2000
    Date of Patent: March 4, 2003
    Assignees: Riken, Sumitomo Bakelite Company, Ltd.
    Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
  • Patent number: D909210
    Type: Grant
    Filed: June 21, 2018
    Date of Patent: February 2, 2021
    Inventors: Karan Manhas, Annett Rozek, Nathan Woodbury, Robert James Etsu Takeuchi