Patents by Inventor Etsuji Kimura

Etsuji Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5840380
    Abstract: A basicity-resistant refractory wherein the substratum includes a surface layer of a composite oxide of which magnesium oxide is the main component, and an oxide as a second component and which forms a high melting point composite oxide with magnesium oxide and iron oxides through reaction with iron oxides in a melt or a calcined mass. The oxide which is the second component may be one or more of titanium oxide, niobium oxide, neodymium oxide, lanthanum oxide, manganese oxide, nickel oxide, and cobalt oxide.
    Type: Grant
    Filed: April 15, 1996
    Date of Patent: November 24, 1998
    Assignee: Mitsubishi Materials Corporation
    Inventors: Etsuji Kimura, Kenichi Yamaguchi, Fumihiko Ogino
  • Patent number: 5595948
    Abstract: A refractory is disclosed which contains integrally sintered magnesia particles forming the skeleton of the refractory and a mineral phase of magnesium orthotitanate (Mg.sub.2 TiO.sub.4) formed between the magnesia particles, thus giving an increased erosion resistance. Preferably, the refractory comprises coarse magnesia particles having an average particle diameter of at least 1 mm or a mixture of coarse magnesia particles having an average particle diameter of at least 1 mm and medium magnesia particles having an average particle diameter of 1 to 0.15 mm and 5 to 50 wt. % of magnesium orthotitanate intervening between the magnesia particles. The refractory not only has an excellent durability in a basic atmosphere, but also has a high strength because of combination of the coarse or medium magnesia particles so that it does not tend to deform and has a high durability against thermal shock.
    Type: Grant
    Filed: June 16, 1995
    Date of Patent: January 21, 1997
    Assignee: Mitsubishi Materials Corporation
    Inventors: Etsuji Kimura, Kenichi Yamaguchi, Fumihiko Ogino, Susumu Okabe
  • Patent number: 5439616
    Abstract: An infrared light-excited light-emitting substance given by the general formula:R1.sub.x R2(.sub.1-x)Ba.sub.z Cl.sub.3+2z where R1 is a rare-earth element, x satisfies the relation 0.01<x.ltoreq.1, R2 is another rare-earth element, and z satisfies the relation 1<z<4. Preferably, the substance is a transparent crystal having a transparency exceeding 70% in a wavelength range from 400 to 1500 nm, excluding wavelengths absorbed by rare-earth ions. The light-emitting substance can convert infrared light into visible light in a wavelength range from blue light to green light at a high conversion efficiency.
    Type: Grant
    Filed: August 3, 1994
    Date of Patent: August 8, 1995
    Assignee: Mitsubishi Materials Corporation
    Inventors: Shoji Ishiwata, Etsuji Kimura, Michihiro Tanaka, Yasuhiro Hanaue, Yuhu Wang, Shinobu Nagahama, Naruhito Sawanobori
  • Patent number: 5432458
    Abstract: Phosphorus concentration in molten copper can be determined by measuring temperature and electric resistivity of molten copper.
    Type: Grant
    Filed: June 26, 1991
    Date of Patent: July 11, 1995
    Assignee: Mitsubishi Materials Corporation
    Inventors: Etsuji Kimura, Yasuhiro Hanaue
  • Patent number: 5372657
    Abstract: Disclosed herein is an amorphous material in the form of foil for the regenerator, which is prepared by quenching a melt of a rare earth alloy by injection toward the surface of a roll running at a high speed, said alloy being composed of one or more rare earth elements in an amount of 50-99 atomic %, with the remainder being one or more iron family elements. This amorphous material has a large, stable specific heat capacity at very low temperatures.
    Type: Grant
    Filed: September 11, 1992
    Date of Patent: December 13, 1994
    Assignees: Mitsubishi Materials Corp., Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yasuhiro Hanaue, Etsuji Kimura, Takuo Takeshita, Uichiro Mizutani, Yoshiki Hoshino
  • Patent number: 5142254
    Abstract: An ultrasonic delay line device has an adjusting circuit for adjusting delay time provided between two terminals at the power input side of an ultrasonic delay line, wherein the adjusting circuit includes a serial connection of a fixed capacitor and a variable resistor connected between said two terminals of the power input side and a fixed coil connected in parallel with the serial connection of the fixed capacitor and the variable resistor.
    Type: Grant
    Filed: August 31, 1990
    Date of Patent: August 25, 1992
    Assignee: Asahi Glass Company Ltd.
    Inventors: Etsuji Kimura, Naomitsu Umemura, Masahiko Maeda
  • Patent number: 5130679
    Abstract: An ultrasonic delay line comprises a delay medium provided with transducers on at least a side surface thereof, an insulating substrate having a frame-like body in which a wiring pattern is print-formed and an opening having substantially the same shape as the outer configuration of the delay medium, the delay medium being fitted in the opening so that an electrode of the transducer is electrically connectable with the wiring pattern, and a packaging member covering at least a part of major surfaces of the insulating substrate and the delay medium so as to secure the two.
    Type: Grant
    Filed: February 11, 1991
    Date of Patent: July 14, 1992
    Assignee: Asahi Glass Company Ltd.
    Inventors: Haruto Hashimoto, Etsuji Kimura, Yutaka Igarashi
  • Patent number: 5002647
    Abstract: In the process for preparing thick films comprising dispersing powder of a starting material for thick films in a solvent system, applying direct electric potential between the electrodes provided in the solvent system and thus electrodepositing the powder material on a substrate connected to the cathode, an improvement wherein a mixed solvent comprising an alcohol or alcohols, a methyl-group-containing ketone or ketones and nitorcellulose is disclosed. By this process thick films of solid electrolytes can be economically formed.
    Type: Grant
    Filed: July 20, 1989
    Date of Patent: March 26, 1991
    Assignee: Mitsubishi Metal Corporation
    Inventors: Hiroyoshi Tanabe, Seitaro Fukushima, Etsuji Kimura
  • Patent number: 4980603
    Abstract: A cathode for an electron tube comprises a base (1) including nickel as a major element and including at least silicon as a reducing element, and it further comprises an electron-emissive layer (5) coated on the base, including not only alkaline earth metal oxide (8) containing at least barium but also scandium oxide. The scandium oxide (4) is in the form of dodecahedral or prismatic polyhedral crystals and dispersed in the electron-emissive layer in the range from 0.1 to 20 wt. %.
    Type: Grant
    Filed: June 10, 1988
    Date of Patent: December 25, 1990
    Assignees: Mitsubishi Kinzoku Kabushiki Kaisha, Mitsubishi Denki Kabushiki Kaisha
    Inventors: Etsuji Kimura, Hisao Nakanishi
  • Patent number: 4980141
    Abstract: Hexagonal-bipyramid crystalline scandium oxide powder and a process for preparing the same are disclosed. The process comprises forming scandium oxalate from an acid aqueous solution containing scandium in the presence of chloride ions and ammonium ions, collecting the precipitate and heating the collected precipitate. Hexagonal-bipyramid crystalline scandium oxide is useful for making electron gun for cathode ray tubes.
    Type: Grant
    Filed: May 25, 1988
    Date of Patent: December 25, 1990
    Assignees: Mitsubishi Kinzoku Kabushiki Kaisha, Mitsubishi Denki Kabushiki Kaisha
    Inventors: Etsuji Kimura, Hisao Nakanishi
  • Patent number: 4956159
    Abstract: Gallium-containing waste is chlorinated in the presence of gallium trichloride from the beginning. By this procedure, gallium is more efficiently chlorinated and gallium trichloride is more easily separated from other chlorides and recovered.
    Type: Grant
    Filed: August 15, 1989
    Date of Patent: September 11, 1990
    Assignee: Mitsubishi Kinzoku Kabushiki Kaisha
    Inventors: Takeyoshi Shibasaki, Etsuji Kimura, Yutaka Nishiyama
  • Patent number: 4956340
    Abstract: A process for preparing compound metal oxides, superconductive compound oxides, is disclosed. The process comprises preparing an aqueous solution containing a predetermined content ratio of chloride, nitrate or acetate of a rare earth metal, an alkaline earth metal and copper, said content ration corresponding to the composition of the object compound metal oxide, adjusting the pH of the solution to 1.5-2.0, adding oxalic acid in an amount such that the concentration of the residual oxalic acid becomes 0.05 M/l-0.1 M/l, collecting the thus formed precipitate and firing it.
    Type: Grant
    Filed: November 3, 1989
    Date of Patent: September 11, 1990
    Assignee: Mitsubishi Kinzoku Kabsuhiki Kaisha
    Inventors: Etsuji Kimura, Nozomu Hasegawa, Yutaka Nishiyama
  • Patent number: 4886777
    Abstract: A process for preparing compound metal oxides, a superconductive compound oxides for instance, is disclosed. The process comprises preparing an aqueous solution containing a predetermined content ratio of chloride, nitrate or acetate of a rare earth metal, an alkaline earth metal and copper, slightly basifying the solution to form hydroxides of the rare earth metal and copper and then introducing carbon dioxide to form carbonate of the alkaline earth metal, collecting the thus formed mixed precipitate of hydroxides and carbonate and firing it.
    Type: Grant
    Filed: August 1, 1988
    Date of Patent: December 12, 1989
    Assignee: Mitsubishi Kinzoku Kabushiki Kaisha
    Inventors: Etsuji Kimura, Nozomu Hasegawa, Yutaka Nishiyama
  • Patent number: 4746971
    Abstract: A comb-shape filter which comprises an ultrasonic delay device, a branch line adapted to apply a part of an input for the ultrasonic delay device to its output terminal without passing through the ultrasonic delay device and a band elimination filter provided in the branch line.
    Type: Grant
    Filed: June 26, 1986
    Date of Patent: May 24, 1988
    Assignee: Asahi Glass Company Ltd.
    Inventors: Etsuji Kimura, Nobuhiro Yokoo, Shigeru Ueno
  • Patent number: 4512557
    Abstract: An improved apparatus for preparation of high-melting-point high-toughness metals comprising a reaction chamber in which a halide of said metal is reacted with an active metal and the remaining active metal and the produced active metal halide are vaporized and a condensation chamber in which vapors of the remaining active metal and the active metal halide are condensed is disclosed. The apparatus comprises a reaction chamber and a condensation chamber as described above both of which are provided with a neck having a passage-closing means of the seal pot structure, and the two chambers are placed in parallel in the upright position and are connected with a horizontal connecting duct.
    Type: Grant
    Filed: July 8, 1983
    Date of Patent: April 23, 1985
    Assignee: Mitsubishi Kinzoku Kabushiki Kaisha
    Inventors: Etsuji Kimura, Katsumi Ogi, Kazusuke Sato, Mayuki Hashimoto
  • Patent number: 4508322
    Abstract: A hermetically closable and evacuable apparatus for preparing high melting point high toughness metals by reduction of a chloride of said metals comprising a heatable reaction chamber and a coolable condensation chamber provided above the reaction chamber which chambers communicate with each other through an intermediate connecting section, wherein the intermediate connecting section is provided with a seal pot closing means comprising a funnel body and a pan which can be opened to form a wide gas passage, is disclosed.
    Type: Grant
    Filed: February 16, 1984
    Date of Patent: April 2, 1985
    Assignee: Mitsubishi Kinzoku Kabushiki Kaisha
    Inventors: Etsuji Kimura, Katsumi Ogi, Kazusuke Sato
  • Patent number: 4447045
    Abstract: In an apparatus for preparation of high-melting-point high-toughness metals by reduction of chlorides thereof with an active metal which comprises a heatable and tightly closable reaction chamber, an evacuable and coolable condensation chamber for separating the unreacted active metal and the formed chloride of the active metal from the formed object metal and an intermediate connecting section for communicating and cutting off the two chambers, the improved apparatus which is characterized in that it comprises a seal pot closing means having a funnel and a pot which is closed by introducing a melt of a fusible and vaporizable material and solidifying it therein, is disclosed.
    Type: Grant
    Filed: April 14, 1983
    Date of Patent: May 8, 1984
    Assignee: Mitsubishi Kinzoku Kabushiki Kaisha
    Inventors: Etsuji Kimura, Katsumi Ogi, Kazusuke Sato, Mayuki Hashimoto