Patents by Inventor Etsuko Nakamura

Etsuko Nakamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10031128
    Abstract: A screening method evaluates influence of a cytotoxic factor on lymphoid cells. The method includes administering or irradiating lymphoid cells with the cytotoxic factor that injures the lymphoid cells; incubating the lymphoid cells to which the cytotoxic factor is administered or irradiated for a selected time; measuring a cell size of the lymphoid cells after the incubation; and determining influence of the cytotoxic factor on the lymphoid cells based on a change of the cell size. According to this method, influence of radiation or a drug, or efficacy of radiation, a radiation-protecting agent, an antioxidant, a radiation-sensitizing agent, a drug, or ultraviolet rays can be evaluated economically and objectively in a short period of time.
    Type: Grant
    Filed: March 26, 2013
    Date of Patent: July 24, 2018
    Assignee: NATIONAL INSTITUTES FOR QUANTUM AND RADIOLOGICAL SCIENCE AND TECHNOLOGY
    Inventors: Emiko Sekine, Takashi Shimokawa, Megumi Ueno, Etsuko Nakamura, Miyako Nakawatari, Takeshi Murakami, Takashi Imai, Kazunori Anzai, Kenichiro Matsumoto, Ikuo Nakanishi
  • Patent number: 9536477
    Abstract: There is provided a display control device including a determination unit configured to determine a type of input information, and a display controller configured to switch modes of a display unit capable of being switched to a mirror surface mode and a display mode in accordance with a result of determination by the determination unit.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: January 3, 2017
    Assignee: SONY CORPORATION
    Inventors: Yoichiro Sako, Etsuko Nakamura, Tsuyoshi Ito, Hitoshi Kubota, Tsuyoshi Nagata, Akira Tange, Masashi Takeda
  • Patent number: 9436053
    Abstract: Provided is a display unit that includes: a pair of a first substrate and a second substrate that are arranged in opposition to each other; a display layer provided between the first substrate and the second substrate; and a display mode switching layer having an aperture for each pixel, and provided between the display layer and the second substrate.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: September 6, 2016
    Assignee: Joled Inc.
    Inventors: Mikihiro Yokozeki, Manabu Kodate, Shuichi Shima, Tsuyoshi Ito, Hitoshi Kubota, Etsuko Nakamura
  • Publication number: 20150212067
    Abstract: There is provided a screening method including administering or irradiating lymphoid cells with a cytotoxic factor that injures the lymphoid cells; incubating the lymphoid cells administered or irradiated with the cytotoxic factor for a predetermined time; measuring cell size of the lymphoid cells after the incubation; and determining influence of the cytotoxic factor on the lymphoid cells based on the cell size. According to this method, influence or drug efficacy of radiation, a radiation-protecting agent, an antioxidant, a radiation-sensitizing agent, a drug or ultraviolet rays can be economically and objectively determined in a short period of time.
    Type: Application
    Filed: March 26, 2013
    Publication date: July 30, 2015
    Inventors: Emiko Sekine, Takashi Shimokawa, Megumi Ueno, Etsuko Nakamura, Miyako Nakawatari, Takeshi Murakami, Takashi Imai, Kazunori Anzai, Kenichiro Matsumoto, Ikuo Nakanishi
  • Publication number: 20140362429
    Abstract: Provided is a display unit that includes: a pair of a first substrate and a second substrate that are arranged in opposition to each other; a display layer provided between the first substrate and the second substrate; and a display mode switching layer having an aperture for each pixel, and provided between the display layer and the second substrate.
    Type: Application
    Filed: May 29, 2014
    Publication date: December 11, 2014
    Applicant: Sony Corporation
    Inventors: Mikihiro YOKOZEKI, Manabu KODATE, Shuichi SHIMA, Tsuyoshi ITO, Hitoshi KUBOTA, Etsuko NAKAMURA
  • Publication number: 20140146093
    Abstract: There is provided a display control device including a determination unit configured to determine a type of input information, and a display controller configured to switch modes of a display unit capable of being switched to a mirror surface mode and a display mode in accordance with a result of determination by the determination unit.
    Type: Application
    Filed: November 20, 2013
    Publication date: May 29, 2014
    Applicant: SONY CORPORATION
    Inventors: Yoichiro Sako, Etsuko Nakamura, Tsuyoshi Ito, Hitoshi Kubota, Tsuyoshi Nagata, Akira Tange, Masashi Takeda
  • Patent number: 7238462
    Abstract: This invention provides an undercoating layer material and a filler material containing a resin component having at least a substituent group which is capable of releasing a terminal group to form a sulfonic acid residue upon application of predetermined energy, and a solvent. The resin component has at least a repeating unit represented by formula (1): wherein n is an integer of 1 or more, X represents a C1 to C10 linear or branched alkyl chain, an aromatic or alicyclic alkyl chain or an alkyl ester chain, and Y is a substituent group forming a sulfonic acid residue upon application of predetermined energy.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: July 3, 2007
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Etsuko Nakamura, Kazumasa Wakiya
  • Publication number: 20050074695
    Abstract: This invention provides an undercoating layer material and a filler material containing a resin component having at least a substituent group which is capable of releasing a terminal group to form a sulfonic acid residue upon application of predetermined energy, and a solvent. The resin component has at least a repeating unit represented by formula (1): wherein n is an integer of 1 or more, X represents a C1 to C10 linear or branched alkyl chain, an aromatic or alicyclic alkyl chain or an alkyl ester chain, and Y is a substituent group forming a sulfonic acid residue upon application of predetermined energy.
    Type: Application
    Filed: November 26, 2003
    Publication date: April 7, 2005
    Inventors: Etsuko Nakamura, Kazumasa Wakiya
  • Patent number: 6835530
    Abstract: There is provided a base material for lithography that is capable of achieving superior film formation characteristics, while maintaining good light absorption characteristics. The base material for lithography comprises (a) a cross linking agent formed from a specific nitrogen containing compound, (b) a copolymer comprising two types of (meth)acrylate ester units as represented by the general formulas (1) and (2) shown below, and (c) an organic solvent: wherein, R1 represents a hydroxyl group or a carboxyl group or the like, and X represents an alkyl chain of 1 to 4 carbon atoms; and wherein, R2 represents a hydroxyl group or a carboxyl group or the like, Y represents —SO2—, —CO— or —SO—; and n represents a number from 1 to 4.
    Type: Grant
    Filed: August 26, 2003
    Date of Patent: December 28, 2004
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Etsuko Nakamura, Jun Koshiyama, Takeshi Tanaka
  • Publication number: 20040121260
    Abstract: There is provided a base material for lithography that is capable of achieving superior film formation characteristics, while maintaining good light absorption characteristics.
    Type: Application
    Filed: August 26, 2003
    Publication date: June 24, 2004
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Etsuko Nakamura, Jun Koshiyama, Takeshi Tanaka