Patents by Inventor Etsuo Hatano

Etsuo Hatano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pellicle for lithography
    Patent number: 5234742
    Abstract: A pellicle for lithography based on the exposure method especially adapted for lithographic lights having wave lengths of 500 nm or smaller, characterized in that the pellicle film is made of a high polymer organic silicon compound, preferably of a general molecular formula: ##STR1## where R.sup.1, R.sup.2, and R.sup.3 are the same or different alkyl groups having one to eight carbon atoms, and n is an integer between 100 and 40,000.
    Type: Grant
    Filed: June 19, 1992
    Date of Patent: August 10, 1993
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Etsuo Hatano, Yoshihiro Kubota, Akira Yamamoto, Toyohisa Sakurada, Masaaki Iguchi