Patents by Inventor Etsuo Okaue

Etsuo Okaue has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7045179
    Abstract: A protecting film for covering a recording face of a recording medium includes a support, a first protective layer formed of thermoplastic resin and formed on the support, and a second protective layer formed of thermoplastic resin, and laminated on the first protective layer. An image is formed on the recording face by a thermal transfer type overcoat process.
    Type: Grant
    Filed: December 13, 2004
    Date of Patent: May 16, 2006
    Assignee: Seiko Epson Corporation
    Inventors: Hajime Mizutani, Hiroyuki Onishi, Teruaki Kaieda, Masahiro Hanmura, Koichi Terao, Etsuo Okaue
  • Publication number: 20050233119
    Abstract: A protecting film for covering a recording face of a recording medium includes a support, a first protective layer formed of thermoplastic resin and formed on the support, and a second protective layer formed of thermoplastic resin, and laminated on the first protective layer. An image is formed on the recording face by a thermal transfer type overcoat process.
    Type: Application
    Filed: December 13, 2004
    Publication date: October 20, 2005
    Inventors: Hajime Mizutani, Hiroyuki Onishi, Teruaki Kaieda, Masahiro Hanmura, Koichi Terao, Etsuo Okaue
  • Publication number: 20040101660
    Abstract: The invention provides an image protective film used for lamination on a recoding surface of a recording medium by a heat transfer type overcoat system after the formation of an image on the recording surface, which comprises a support having laminated thereon a first protective layer and a second protective layer in this order, each of which is formed of a thermoplastic resin.
    Type: Application
    Filed: March 19, 2003
    Publication date: May 27, 2004
    Applicant: SEIKO EPSON CORPORATION
    Inventors: Teruaki Kaieda, Hiroyuki Onishi, Masahiro Hanmura, Koichi Terao, Etsuo Okaue
  • Patent number: 5783299
    Abstract: A polarizer plate including a polarizer substrate formed of a polarizer layer and supporting layers disposed on opposite surfaces of the polarizer layer; an undercoat layer disposed on one surface of the polarizer substrate; an anti-reflection layer disposed on the undercoat layer; and an anti-staining layer including a fluorine-containing silane compound disposed on said anti-reflection layer. The undercoat layer preferably has a specular glossiness according to JIS Z 8741 of from 10 to 40 and a haze according to JIS K 6900 of from 5 to 30%.
    Type: Grant
    Filed: October 14, 1994
    Date of Patent: July 21, 1998
    Assignee: Seiko Epson Corporation
    Inventors: Satoru Miyashita, Kogo Endo, Etsuo Okaue, Mikito Nakajima, Takao Mogami, Satoshi Kubota
  • Patent number: 5759643
    Abstract: A polarizer plate including a polarizer substrate formed of a polarizer layer and supporting layers disposed on opposite surfaces of the polarizer layer; an undercoat layer disposed on one surface of the polarizer substrate; an anti-reflection layer disposed on the undercoat layer; and an anti-staining layer including a fluorine-containing silane compound disposed on said anti-reflection layer. The undercoat layer preferably has a specular glossiness according to JIS Z 8741 of from 10 to 40 and a haze according to JIS K 6900 of from 5 to 30%.
    Type: Grant
    Filed: December 13, 1995
    Date of Patent: June 2, 1998
    Assignee: Seiko Epson Corporation
    Inventors: Satoru Miyashita, Kogo Endo, Etsuo Okaue, Mikito Nakajima, Takao Mogami, Satoshi Kubota
  • Patent number: 5622784
    Abstract: An inorganic coating film having improved water repellency is provided. The improved surface is provided by treating an inorganic coating film with a material that is reached or adsorbed on the surface of the inorganic coat to increase water repellency. The inorganic coating to be treated may be a silicon dioxide film. The materials used to treat the film include: (1) halogenated silane compounds; (2) silane compounds having a structure including at least one bond selected from Si--H, Si--OH, Si--OR, Si--SH and Si--SR, wherein R is an organic group; (3) silane compounds having a structure including at least one of ##STR1## wherein R1, R2 and R3 are hydrogen or an organic group and (4) reactive organic compounds having a fluorine substituting group, hydrogen fluoride or a metal fluoride.
    Type: Grant
    Filed: January 18, 1994
    Date of Patent: April 22, 1997
    Assignee: Seiko Epson Corporation
    Inventors: Etsuo Okaue, Mikito Nakajima, Satoshi Kubota, Takao Mogami
  • Patent number: 5015086
    Abstract: Electronic sunglasses of the transmittance-varying type including liquid crystal panels employing the electro-optical effect and a solar cell used as a power source. The electronic sunglasses include a voltage detecting circuit having such a hysteresis characteristic so as to output a signal for changing transmittance of the liquid crystal panel from a high mode to a low mode at at least high predetermined voltage or illumination, and changing transmittance from a low mode to a high mode at at least a low voltage or illumination. The sunglasses also include a first switch which operates at at least two switch positions, one switch position having a first stage of illumination at less than 20,000 Lux and a second stage of illumination at 20,000 Lux or greater at which transmittance is changed from a high mode and another switch position disabling the voltage detecting circuit.
    Type: Grant
    Filed: April 16, 1990
    Date of Patent: May 14, 1991
    Assignee: Seiko Epson Corporation
    Inventors: Etsuo Okaue, Masaru Egawa, Yoshihiko Kasai, Norio Horaguchi