Patents by Inventor Etsuo Tobita

Etsuo Tobita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9133121
    Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: September 15, 2015
    Inventors: Yoshinori Negishi, Takashi Ayabe, Etsuo Tobita
  • Publication number: 20130023611
    Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.
    Type: Application
    Filed: September 13, 2012
    Publication date: January 24, 2013
    Applicant: ADEKA CORPORATION
    Inventors: Yoshinori NEGISHI, Takashi AYABE, Etsuo TOBITA
  • Patent number: 8329787
    Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.
    Type: Grant
    Filed: April 2, 2010
    Date of Patent: December 11, 2012
    Assignee: Adeka Corporation
    Inventors: Yoshinori Negishi, Takashi Ayabe, Etsuo Tobita
  • Patent number: 8154571
    Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.
    Type: Grant
    Filed: December 25, 2008
    Date of Patent: April 10, 2012
    Assignee: Adeka Corporation
    Inventors: Etsuo Tobita, Koichi Shigeno, Satoru Kanda, Ryozo Arata, Yamahiko Egami
  • Patent number: 8017678
    Abstract: The present invention provides a polyester resin composition having an excellent crystallization rate. The polyester resin composition includes (a) a polyester resin containing (b) a sulfonamide compound metal salt which has a structure represented by the following general formula (1): (in the formula (1), R and R? each independently represent a hydrogen atom, a halogen atom, an alkali metal atom, an amino group, an alkyl group which has 1 to 10 carbon atoms and which may be branched or substituted, an alkoxy group which has 1 to 10 carbon atoms and which may be branched or substituted, or a cyclic group which has 3 to 30 carbon atoms and which may be substituted; R and R? may be bonded together to form a cyclic group; n represents a number of 1 or 2).
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: September 13, 2011
    Assignee: Adeka Corporation
    Inventors: Takahiro Horikoshi, Kazukiyo Nomura, Naoshi Kawamoto, Etsuo Tobita
  • Patent number: 7910643
    Abstract: A polylactic acid resin composition in which polylactic acid is blended with dibasic acid bis(benzoylhydrazide) represented by general formula (I) below; and a process for producing heat-resistant polylactic acid resin moldings, wherein after the polylactic acid resin composition is melted, the polylactic acid resin composition melted is filled in a die of a molding machine and molded accompanied with crystallization, in which the temperature of the die has been set in a range not higher than the initiation temperature of crystallization and not lower than the glass transition temperature determined with a differential scanning calorimeter (DSC).
    Type: Grant
    Filed: September 2, 2005
    Date of Patent: March 22, 2011
    Assignee: Adeka Corporation
    Inventors: Etsuo Tobita, Naoshi Kawamoto, Tsuyoshi Urushihara, Hitoshi Saito, Hisashi Okuyama, Naomi Okuyama, legal representative, Takeshi Kanamori, Mitsuru Nakano, Hirotaka Okamoto
  • Publication number: 20100305327
    Abstract: The following compound, inhibitor, and composition are provided: a compound having low volatility, high nitroxyl group concentration, and high polymerization inhibitory activity; a polymerization inhibitor using the compound; and a polymerization inhibitor composition using the compound.
    Type: Application
    Filed: December 6, 2006
    Publication date: December 2, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Yoshinori Negishi, Etsuo Tobita, Takashi Ayabe
  • Patent number: 7842744
    Abstract: The present invention provides an optical film, which is excellent in ultraviolet absorption capability at 380 nm with little bleed-out, comprising a resin containing a triazine compound represented by the following general formula (I). (In the formula, R1-R6 may be a hydrogen atom; hydroxyl group; or an organic group selected from among an alkyl group, alkoxy group, dialkyl amino group, alkyl carbonyloxy group, aryl group, arylated alkyl group, aryloxy group, arylated alkyloxy group and an aryl carbonyloxy group having 18 or less carbon atoms, independently. However, the alkyl part of these organic groups may be substituted by a hydroxyl group, halogen atom, cyano group or nitro group, interrupted by an oxygen atom, sulfur atom, carbonyl group, ester group, amide group or imino group, or have a double bond, and these substitutions, interruptions and double bonds may be combined).
    Type: Grant
    Filed: March 10, 2009
    Date of Patent: November 30, 2010
    Assignee: Adeka Corporation
    Inventors: Yoshinori Negishi, Shinichi Ishikawa, Etsuo Tobita, Takashi Ayabe
  • Publication number: 20100249466
    Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.
    Type: Application
    Filed: December 25, 2008
    Publication date: September 30, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Etsuo Tobita, Koichi Shigeno, Satoru Kanda, Ryozo Arata, Yamahiko Egami
  • Publication number: 20100190898
    Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.
    Type: Application
    Filed: April 2, 2010
    Publication date: July 29, 2010
    Inventors: Yoshinori Negishi, Takashi Ayabe, Etsuo Tobita
  • Publication number: 20100174015
    Abstract: [Object] To provide a polymeric material composition having high heat resistance, excellent compatibility, and greatly improved weatherability. [Solving Means] A polymeric material composition containing: a polymeric material and a triazine compound having the general formula (I): wherein R1 to R3 denote an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an alkylaryl group, or an arylalkyl group, these groups being optionally substituted by a hydroxy group, a halogen atom, a cyano group, a nitro group, an alkyl group, or an alkoxy group, and/or being optionally interrupted by an oxygen atom, a sulfur atom, a carbonyl group, an ester group, an amide group, or an imino group; R4 to R6 denote an alkyl group or an alkenyl group; and R7 to R9 denote a hydrogen atom, a halogen atom, an alkyl group, or an alkenyl group.
    Type: Application
    Filed: March 27, 2007
    Publication date: July 8, 2010
    Applicant: Adeka Corporation
    Inventors: Yoshinori Negishi, Takashi Ayabe, Masato Suzuki, Etsuo Tobita
  • Publication number: 20100174017
    Abstract: A polylactic acid resin composition in which polylactic acid is blended with dibasic acid bis(benzoylhydrazide) represented by general formula (I) below; and a process for producing heat-resistant polylactic acid resin moldings, wherein after the polylactic acid resin composition is melted, the polylactic acid resin composition melted is filled in a die of a molding machine and molded accompanied with crystallization, in which the temperature of the die has been set in a range not higher than the initiation temperature of crystallization and not lower than the glass transition temperature determined with a differential scanning calorimeter (DSC).
    Type: Application
    Filed: September 2, 2005
    Publication date: July 8, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Etsuo Tobita, Naoshi Kawamoto, Tsuyoshi Urushihara, Hitoshi Saito, Hisashi Okuyama, Naomi Okuyama, Takeshi Kanamori, Mitsuru Nakano, Hirotaka Okamoto
  • Patent number: 7714046
    Abstract: The present invention provides a process for producing a crystal nucleator composition comprising; a first step pulverizing 95% by mass or more of a crystal nucleator ingredient containing one or two or more kinds of specific compounds to a primary particle diameter of 0.8 ?m or smaller with a dry medium-stirring type pulverizer; and a second step mixing and pulverizing the pulverized crystal nucleator ingredient obtained in the previous step and a metal aliphatic carboxylate ingredient containing one or two or more kinds of specific metal aliphatic carboxylates.
    Type: Grant
    Filed: August 24, 2006
    Date of Patent: May 11, 2010
    Assignee: Adeka Corporation
    Inventors: Manabu Ishii, Naoshi Kawamoto, Etsuo Tobita
  • Patent number: 7662893
    Abstract: A method for producing a stabilized polymer comprising adding at least one kind of a phenolic antioxidant masked with an organic aluminum and represented by general formula (I) in a catalyst system or a polymerization system, before or during polymerization, on gas-phase polymerization of a monomer having an ethylenic unsaturated bonding, wherein R1 and R2, each is independently a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, a cycloalkyl group or an arylalkyl group; X is an alkylene group having 1 to 8 carbon atoms; R3 is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms; and R4 is an alkyl group having 1 to 30 carbon atoms.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: February 16, 2010
    Assignee: Adeka Corporation
    Inventors: Etsuo Tobita, Naoshi Kawamoto, Takahiro Horikoshi
  • Publication number: 20090258976
    Abstract: The present invention provides an optical film, which is excellent in ultraviolet absorption capability at 380 nm with little bleed-out, comprising a resin containing a triazine compound represented by the following general formula (I). (In the formula, R1-R6 may be a hydrogen atom; hydroxyl group; or an organic group selected from among an alkyl group, alkoxy group, dialkyl amino group, alkyl carbonyloxy group, aryl group, arylated alkyl group, aryloxy group, arylated alkyloxy group and an aryl carbonyloxy group having 18 or less carbon atoms, independently. However, the alkyl part of these organic groups may be substituted by a hydroxyl group, halogen atom, cyano group or nitro group, interrupted by an oxygen atom, sulfur atom, carbonyl group, ester group, amide group or imino group, or have a double bond, and these substitutions, interruptions and double bonds may be combined).
    Type: Application
    Filed: March 10, 2009
    Publication date: October 15, 2009
    Inventors: Yoshinori NEGISHI, Shinichi Ishikawa, Etsuo Tobita, Takashi Ayabe
  • Publication number: 20090176913
    Abstract: The present invention provides a polyester resin composition having an excellent crystallization rate. The polyester resin composition includes (a) a polyester resin containing (b) a sulfonamide compound metal salt which has a structure represented by the following general formula (1): (in the formula (1), R and R? each independently represent a hydrogen atom, a halogen atom, an alkali metal atom, an amino group, an alkyl group which has 1 to 10 carbon atoms and which may be branched or substituted, an alkoxy group which has 1 to 10 carbon atoms and which may be branched or substituted, or a cyclic group which has 3 to 30 carbon atoms and which may be substituted; R and R? may be bonded together to form a cyclic group; n represents a number of 1 or 2).
    Type: Application
    Filed: April 13, 2007
    Publication date: July 9, 2009
    Applicant: ADEKA CORPORATION
    Inventors: Takahiro Horikoshi, Kazukiyo Nomura, Naoshi Kawamoto, Etsuo Tobita
  • Patent number: 7553892
    Abstract: The present invention provides an optical film, which is excellent in ultraviolet absorption capability at 380 nm with little bleed-out, comprising a resin containing a triazine compound represented by the following general formula (I). (In the formula, R1-R6 may be a hydrogen atom; hydroxyl group; or an organic group selected from among an alkyl group, alkoxy group, dialkyl amino group, alkyl carbonyloxy group, aryl group, arylated alkyl group, aryloxy group, arylated alkyloxy group and an aryl carbonyloxy group having 18 or less carbon atoms, independently. However, the alkyl part of these organic groups may be substituted by a hydroxyl group, halogen atom, cyano group or nitro group, interrupted by an oxygen atom, sulfur atom, carbonyl group, ester group, amide group or imino group, or have a double bond, and these substitutions, interruptions and double bonds may be combined).
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: June 30, 2009
    Assignee: Adeka Corporation
    Inventors: Yoshinori Negishi, Shinichi Ishikawa, Etsuo Tobita, Takashi Ayabe
  • Publication number: 20090156744
    Abstract: The present invention provides a process for producing a crystal nucleator composition comprising; a first step pulverizing 95% by mass or more of a crystal nucleator ingredient containing one or two or more kinds of specific compounds to a primary particle diameter of 0.8 ?m or smaller with a dry medium-stirring type pulverizer; and a second step mixing and pulverizing the pulverized crystal nucleator ingredient obtained in the previous step and a metal aliphatic carboxylate ingredient containing one or two or more kinds of specific metal aliphatic carboxylates.
    Type: Application
    Filed: August 24, 2006
    Publication date: June 18, 2009
    Inventors: Manabu Ishii, Naoshi Kawamoto, Etsuo Tobita
  • Publication number: 20090111699
    Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.
    Type: Application
    Filed: February 28, 2005
    Publication date: April 30, 2009
    Applicant: ADEKA CORPORATION
    Inventors: Yoshinori Negishi, Takashi Ayabe, Etsuo Tobita
  • Patent number: 7442735
    Abstract: A crystal nucleating agent composition comprising 100 mass parts of a crystal nucleating agent compound represented by the following general formula (I), -50 mass parts of a lithium salt of an organic fatty acid represented by the following general formula (II), and 5-50 mass parts of a metal salt of an organic fatty acid represented by the following general formula (III): (in the formula R1 and R2 are alkyl groups having 1-4 carbon atoms, R3 is a hydrogen atom or an alkyl group having 1-4 carbon atoms, R4, R5 are groups derived from an organic fatty acid having 10-30 carbon atoms, and M is a divalent metal atom).
    Type: Grant
    Filed: July 30, 2004
    Date of Patent: October 28, 2008
    Assignee: Asahi Denka Co., Ltd.
    Inventors: Etsuo Tobita, Kazukiyo Nomura, Naoshi Kawamoto