Patents by Inventor Etsuo Tobita
Etsuo Tobita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9133121Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.Type: GrantFiled: September 13, 2012Date of Patent: September 15, 2015Inventors: Yoshinori Negishi, Takashi Ayabe, Etsuo Tobita
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Publication number: 20130023611Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.Type: ApplicationFiled: September 13, 2012Publication date: January 24, 2013Applicant: ADEKA CORPORATIONInventors: Yoshinori NEGISHI, Takashi AYABE, Etsuo TOBITA
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Patent number: 8329787Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.Type: GrantFiled: April 2, 2010Date of Patent: December 11, 2012Assignee: Adeka CorporationInventors: Yoshinori Negishi, Takashi Ayabe, Etsuo Tobita
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Patent number: 8154571Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.Type: GrantFiled: December 25, 2008Date of Patent: April 10, 2012Assignee: Adeka CorporationInventors: Etsuo Tobita, Koichi Shigeno, Satoru Kanda, Ryozo Arata, Yamahiko Egami
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Patent number: 8017678Abstract: The present invention provides a polyester resin composition having an excellent crystallization rate. The polyester resin composition includes (a) a polyester resin containing (b) a sulfonamide compound metal salt which has a structure represented by the following general formula (1): (in the formula (1), R and R? each independently represent a hydrogen atom, a halogen atom, an alkali metal atom, an amino group, an alkyl group which has 1 to 10 carbon atoms and which may be branched or substituted, an alkoxy group which has 1 to 10 carbon atoms and which may be branched or substituted, or a cyclic group which has 3 to 30 carbon atoms and which may be substituted; R and R? may be bonded together to form a cyclic group; n represents a number of 1 or 2).Type: GrantFiled: April 13, 2007Date of Patent: September 13, 2011Assignee: Adeka CorporationInventors: Takahiro Horikoshi, Kazukiyo Nomura, Naoshi Kawamoto, Etsuo Tobita
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Patent number: 7910643Abstract: A polylactic acid resin composition in which polylactic acid is blended with dibasic acid bis(benzoylhydrazide) represented by general formula (I) below; and a process for producing heat-resistant polylactic acid resin moldings, wherein after the polylactic acid resin composition is melted, the polylactic acid resin composition melted is filled in a die of a molding machine and molded accompanied with crystallization, in which the temperature of the die has been set in a range not higher than the initiation temperature of crystallization and not lower than the glass transition temperature determined with a differential scanning calorimeter (DSC).Type: GrantFiled: September 2, 2005Date of Patent: March 22, 2011Assignee: Adeka CorporationInventors: Etsuo Tobita, Naoshi Kawamoto, Tsuyoshi Urushihara, Hitoshi Saito, Hisashi Okuyama, Naomi Okuyama, legal representative, Takeshi Kanamori, Mitsuru Nakano, Hirotaka Okamoto
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Publication number: 20100305327Abstract: The following compound, inhibitor, and composition are provided: a compound having low volatility, high nitroxyl group concentration, and high polymerization inhibitory activity; a polymerization inhibitor using the compound; and a polymerization inhibitor composition using the compound.Type: ApplicationFiled: December 6, 2006Publication date: December 2, 2010Applicant: ADEKA CORPORATIONInventors: Yoshinori Negishi, Etsuo Tobita, Takashi Ayabe
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Patent number: 7842744Abstract: The present invention provides an optical film, which is excellent in ultraviolet absorption capability at 380 nm with little bleed-out, comprising a resin containing a triazine compound represented by the following general formula (I). (In the formula, R1-R6 may be a hydrogen atom; hydroxyl group; or an organic group selected from among an alkyl group, alkoxy group, dialkyl amino group, alkyl carbonyloxy group, aryl group, arylated alkyl group, aryloxy group, arylated alkyloxy group and an aryl carbonyloxy group having 18 or less carbon atoms, independently. However, the alkyl part of these organic groups may be substituted by a hydroxyl group, halogen atom, cyano group or nitro group, interrupted by an oxygen atom, sulfur atom, carbonyl group, ester group, amide group or imino group, or have a double bond, and these substitutions, interruptions and double bonds may be combined).Type: GrantFiled: March 10, 2009Date of Patent: November 30, 2010Assignee: Adeka CorporationInventors: Yoshinori Negishi, Shinichi Ishikawa, Etsuo Tobita, Takashi Ayabe
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Publication number: 20100249466Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.Type: ApplicationFiled: December 25, 2008Publication date: September 30, 2010Applicant: ADEKA CORPORATIONInventors: Etsuo Tobita, Koichi Shigeno, Satoru Kanda, Ryozo Arata, Yamahiko Egami
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Publication number: 20100190898Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.Type: ApplicationFiled: April 2, 2010Publication date: July 29, 2010Inventors: Yoshinori Negishi, Takashi Ayabe, Etsuo Tobita
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Publication number: 20100174015Abstract: [Object] To provide a polymeric material composition having high heat resistance, excellent compatibility, and greatly improved weatherability. [Solving Means] A polymeric material composition containing: a polymeric material and a triazine compound having the general formula (I): wherein R1 to R3 denote an alkyl group, a cycloalkyl group, an alkenyl group, an aryl group, an alkylaryl group, or an arylalkyl group, these groups being optionally substituted by a hydroxy group, a halogen atom, a cyano group, a nitro group, an alkyl group, or an alkoxy group, and/or being optionally interrupted by an oxygen atom, a sulfur atom, a carbonyl group, an ester group, an amide group, or an imino group; R4 to R6 denote an alkyl group or an alkenyl group; and R7 to R9 denote a hydrogen atom, a halogen atom, an alkyl group, or an alkenyl group.Type: ApplicationFiled: March 27, 2007Publication date: July 8, 2010Applicant: Adeka CorporationInventors: Yoshinori Negishi, Takashi Ayabe, Masato Suzuki, Etsuo Tobita
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Publication number: 20100174017Abstract: A polylactic acid resin composition in which polylactic acid is blended with dibasic acid bis(benzoylhydrazide) represented by general formula (I) below; and a process for producing heat-resistant polylactic acid resin moldings, wherein after the polylactic acid resin composition is melted, the polylactic acid resin composition melted is filled in a die of a molding machine and molded accompanied with crystallization, in which the temperature of the die has been set in a range not higher than the initiation temperature of crystallization and not lower than the glass transition temperature determined with a differential scanning calorimeter (DSC).Type: ApplicationFiled: September 2, 2005Publication date: July 8, 2010Applicant: ADEKA CORPORATIONInventors: Etsuo Tobita, Naoshi Kawamoto, Tsuyoshi Urushihara, Hitoshi Saito, Hisashi Okuyama, Naomi Okuyama, Takeshi Kanamori, Mitsuru Nakano, Hirotaka Okamoto
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Patent number: 7714046Abstract: The present invention provides a process for producing a crystal nucleator composition comprising; a first step pulverizing 95% by mass or more of a crystal nucleator ingredient containing one or two or more kinds of specific compounds to a primary particle diameter of 0.8 ?m or smaller with a dry medium-stirring type pulverizer; and a second step mixing and pulverizing the pulverized crystal nucleator ingredient obtained in the previous step and a metal aliphatic carboxylate ingredient containing one or two or more kinds of specific metal aliphatic carboxylates.Type: GrantFiled: August 24, 2006Date of Patent: May 11, 2010Assignee: Adeka CorporationInventors: Manabu Ishii, Naoshi Kawamoto, Etsuo Tobita
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Patent number: 7662893Abstract: A method for producing a stabilized polymer comprising adding at least one kind of a phenolic antioxidant masked with an organic aluminum and represented by general formula (I) in a catalyst system or a polymerization system, before or during polymerization, on gas-phase polymerization of a monomer having an ethylenic unsaturated bonding, wherein R1 and R2, each is independently a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, a cycloalkyl group or an arylalkyl group; X is an alkylene group having 1 to 8 carbon atoms; R3 is a hydrogen atom or an alkyl group having 1 to 8 carbon atoms; and R4 is an alkyl group having 1 to 30 carbon atoms.Type: GrantFiled: March 6, 2006Date of Patent: February 16, 2010Assignee: Adeka CorporationInventors: Etsuo Tobita, Naoshi Kawamoto, Takahiro Horikoshi
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Publication number: 20090258976Abstract: The present invention provides an optical film, which is excellent in ultraviolet absorption capability at 380 nm with little bleed-out, comprising a resin containing a triazine compound represented by the following general formula (I). (In the formula, R1-R6 may be a hydrogen atom; hydroxyl group; or an organic group selected from among an alkyl group, alkoxy group, dialkyl amino group, alkyl carbonyloxy group, aryl group, arylated alkyl group, aryloxy group, arylated alkyloxy group and an aryl carbonyloxy group having 18 or less carbon atoms, independently. However, the alkyl part of these organic groups may be substituted by a hydroxyl group, halogen atom, cyano group or nitro group, interrupted by an oxygen atom, sulfur atom, carbonyl group, ester group, amide group or imino group, or have a double bond, and these substitutions, interruptions and double bonds may be combined).Type: ApplicationFiled: March 10, 2009Publication date: October 15, 2009Inventors: Yoshinori NEGISHI, Shinichi Ishikawa, Etsuo Tobita, Takashi Ayabe
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Publication number: 20090176913Abstract: The present invention provides a polyester resin composition having an excellent crystallization rate. The polyester resin composition includes (a) a polyester resin containing (b) a sulfonamide compound metal salt which has a structure represented by the following general formula (1): (in the formula (1), R and R? each independently represent a hydrogen atom, a halogen atom, an alkali metal atom, an amino group, an alkyl group which has 1 to 10 carbon atoms and which may be branched or substituted, an alkoxy group which has 1 to 10 carbon atoms and which may be branched or substituted, or a cyclic group which has 3 to 30 carbon atoms and which may be substituted; R and R? may be bonded together to form a cyclic group; n represents a number of 1 or 2).Type: ApplicationFiled: April 13, 2007Publication date: July 9, 2009Applicant: ADEKA CORPORATIONInventors: Takahiro Horikoshi, Kazukiyo Nomura, Naoshi Kawamoto, Etsuo Tobita
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Patent number: 7553892Abstract: The present invention provides an optical film, which is excellent in ultraviolet absorption capability at 380 nm with little bleed-out, comprising a resin containing a triazine compound represented by the following general formula (I). (In the formula, R1-R6 may be a hydrogen atom; hydroxyl group; or an organic group selected from among an alkyl group, alkoxy group, dialkyl amino group, alkyl carbonyloxy group, aryl group, arylated alkyl group, aryloxy group, arylated alkyloxy group and an aryl carbonyloxy group having 18 or less carbon atoms, independently. However, the alkyl part of these organic groups may be substituted by a hydroxyl group, halogen atom, cyano group or nitro group, interrupted by an oxygen atom, sulfur atom, carbonyl group, ester group, amide group or imino group, or have a double bond, and these substitutions, interruptions and double bonds may be combined).Type: GrantFiled: April 26, 2005Date of Patent: June 30, 2009Assignee: Adeka CorporationInventors: Yoshinori Negishi, Shinichi Ishikawa, Etsuo Tobita, Takashi Ayabe
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Publication number: 20090156744Abstract: The present invention provides a process for producing a crystal nucleator composition comprising; a first step pulverizing 95% by mass or more of a crystal nucleator ingredient containing one or two or more kinds of specific compounds to a primary particle diameter of 0.8 ?m or smaller with a dry medium-stirring type pulverizer; and a second step mixing and pulverizing the pulverized crystal nucleator ingredient obtained in the previous step and a metal aliphatic carboxylate ingredient containing one or two or more kinds of specific metal aliphatic carboxylates.Type: ApplicationFiled: August 24, 2006Publication date: June 18, 2009Inventors: Manabu Ishii, Naoshi Kawamoto, Etsuo Tobita
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Publication number: 20090111699Abstract: Hindered amines represented by the general formula (I): (wherein R is an alkyl or hydroxyalkyl group having 1 to 30 carbon atoms or alkenyl having 2 to 30 carbon atoms; n is an integer of 1 to 4; when n is 1, R1 is alkyl having 1 to 22 carbon atoms, alkenyl having 2 to 22 carbon atoms, or a group represented by the general formula (III): (R is as defined above), while when n is 2 to 4, R1 is an n-valent organic group having 2 to 20 carbon atoms). When added to synthetic resins or coating materials, the amines can impart long-period stabilizing effect to the resins or the materials and exhibit excellent resistance to extraction with acid rain or chemicals.Type: ApplicationFiled: February 28, 2005Publication date: April 30, 2009Applicant: ADEKA CORPORATIONInventors: Yoshinori Negishi, Takashi Ayabe, Etsuo Tobita
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Patent number: 7442735Abstract: A crystal nucleating agent composition comprising 100 mass parts of a crystal nucleating agent compound represented by the following general formula (I), -50 mass parts of a lithium salt of an organic fatty acid represented by the following general formula (II), and 5-50 mass parts of a metal salt of an organic fatty acid represented by the following general formula (III): (in the formula R1 and R2 are alkyl groups having 1-4 carbon atoms, R3 is a hydrogen atom or an alkyl group having 1-4 carbon atoms, R4, R5 are groups derived from an organic fatty acid having 10-30 carbon atoms, and M is a divalent metal atom).Type: GrantFiled: July 30, 2004Date of Patent: October 28, 2008Assignee: Asahi Denka Co., Ltd.Inventors: Etsuo Tobita, Kazukiyo Nomura, Naoshi Kawamoto