Patents by Inventor Etsuro Hirai

Etsuro Hirai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7881431
    Abstract: A radiotherapy apparatus includes an acceleration unit configured to generate a charged particle beam. A target is configured to generate a radiation when the charged particle beam is irradiated to the target. A sensor is configured to measure an electric current flowing through the target. A dosimeter is configured to measure a dose of the radiation. A control unit is configured to control the acceleration unit based on the measured electric current and the measured dose.
    Type: Grant
    Filed: February 5, 2009
    Date of Patent: February 1, 2011
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Tatsufumi Aoi, Ichiro Yamashita, Kazuhiro Tsukuda, Etsuro Hirai, Yuichiro Kamino
  • Publication number: 20100034352
    Abstract: A radiotherapy apparatus includes an acceleration unit configured to generate a charged particle beam. A target is configured to generate a radiation when the charged particle beam is irradiated to the target. A sensor is configured to measure an electric current flowing through the target. A dosimeter is configured to measure a dose of the radiation. A control unit is configured to control the acceleration unit based on the measured electric current and the measured dose.
    Type: Application
    Filed: February 5, 2009
    Publication date: February 11, 2010
    Applicant: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Tatsufumi AOI, Ichiro YAMASHITA, Kazuhiro TSUKUDA, Etsuro HIRAI, Yuichiro Kamino
  • Publication number: 20030079837
    Abstract: The present invention provides an apparatus for forming a semiconductor film on a flexible substrate, comprising a supply device for supplying a flexible substrate, a recovery device for recovering the flexible substrate, a first heating device arranged between the supply device and the recovery device for heating the flexible substrate, a PVD device for depositing a film on the substrate by a physical vapor deposition, a CVD device for depositing a film on the substrate by a chemical vapor deposition, a second heating device for heating the material deposited on the substrate, and an etching device for etching the material deposited on the substrate, wherein the CVD device, the second heating device and the etching device are repeatedly arranged within a casing held under a prescribed atmosphere.
    Type: Application
    Filed: July 30, 2002
    Publication date: May 1, 2003
    Inventors: Etsuro Hirai, Naohiko Matsuda
  • Patent number: 6340028
    Abstract: An acid pickling tank 11 is filled with an acid liquid L, and a lid 12 is attached to the acid pickling tank 11. A central part of the lid 12 is depressed downwards to form a covering portion 12b. The covering portion 12b is located at a lower position than the liquid level of the acid liquid L in the acid pickling tank 11 to cover a free surface of the acid liquid L. Immersion guide rolls 20a to 20e are provided on the covering portion 12b, support blocks 21a to 21e are provided at the bottom of the acid pickling tank 11, and skids 23a to 23e are provided on the support blocks 21a to 21e via a bottom plate 22. Thus, the free surface of the acid liquid L in the acid pickling tank 11 is decreased to suppress a loss of the acid, and prevent an overflow of the acid liquid L to the outside of the tank, thereby making acid pickling of the strip steel plate S efficient.
    Type: Grant
    Filed: October 13, 1999
    Date of Patent: January 22, 2002
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Etsuro Hirai, Takumi Furuya, Masato Saka, Nobuyuki Taniguchi
  • Patent number: 6305096
    Abstract: An acid pickling tank body 11 is partitioned with a partition wall 12 into a first tank 13 and a second tank 14. The first tank 13 and the second tank 14 are filled with acid liquids L1 and L2, respectively, of different concentrations. A lid 15 is attached to the top of the acid pickling tank body 11. On the lid 15, immersion guide rolls 25a to 25d, 26a to 26d are mounted. On the bottom surface of the first tank 13 and the second tank 14, skids 31a to 31e, 32a to 32d are mounted via support blocks 27a to 27e, 28a to 28d. A liquid seal 22 is provided which has a cushion nozzle 38 for jetting the acid liquids L1 and L2 toward the surface of a strip steel plate S. traveling above the partition wall 12 for the first tank 13 and the second tank 14.
    Type: Grant
    Filed: October 6, 1999
    Date of Patent: October 23, 2001
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Etsuro Hirai, Takumi Furuya, Masato Saka, Nobuyuki Taniguchi
  • Patent number: 5282485
    Abstract: A jet pickling apparatus for pickling the surfaces of continuously moving sheet material (12) has tips of the nozzle headers (41-43) for discharging a pickling fluid (19) on the surfaces of the sheet and into a pickling tank (31) formed into a slit shape (41a-43a), and the nozzles (41,42) at the entrance side are installed to eject pickling fluid in the same direction as the running direction of sheet while the nozzle (43) at the exit side ejects the pickling fluid in the direction opposite to the running direction of the sheet. Therefore, there is no gas in the pickling tank (31) and the tank is filled with the pickling fluid (19), which eliminates the problems of floating of the sheet (12) and insufficient contact of the pickling fluid (19) with the sheet surfaces, allowing thorough pickling and improving the pickling effect.
    Type: Grant
    Filed: January 16, 1992
    Date of Patent: February 1, 1994
    Assignee: Mitsubishi Jukogyo Kabushiki Kaisha
    Inventors: Etsuro Hirai, Keiji Tanizaki, Tadanori Miyamoto, Shoji Nagai, Yoshinobu Nakane, Muneki Kita, Yoshinori Matsumoto, Kiyohiro Tani