Abstract: The present invention relates to a method for single-point probing of a workpiece by means of a sensor, in particular a tactile sensor, of a coordinate measuring machine, comprising the steps of providing a variable at least indirectly representing a required accuracy of the single-point probing, providing a parameter data set, wherein the parameter data set has prescriptions for regulating and/or evaluating the single-point probing with the required accuracy, and carrying out the single-point probing of the workpiece, wherein the coordinate measuring machine is regulated on the basis of the provided parameter data set and/or an evaluation is carried out on the basis of the provided parameter data set. Furthermore, a coordinate measuring machine for single-point probing of a workpiece is proposed.

Abstract: The present invention relates to a method for single-point probing of a workpiece by means of a sensor, in particular a tactile sensor, of a coordinate measuring machine, comprising the steps of providing a variable at least indirectly representing a required accuracy of the single-point probing, providing a parameter data set, wherein the parameter data set has prescriptions for regulating and/or evaluating the single-point probing with the required accuracy, and carrying out the single-point probing of the workpiece, wherein the coordinate measuring machine is regulated on the basis of the provided parameter data set and/or an evaluation is carried out on the basis of the provided parameter data set. Furthermore, a coordinate measuring machine for single-point probing of a workpiece is proposed.

Abstract: A method for operating a coordinate measuring machine or a machine tool. A movement of a machining part is controlled in such a way that, during the movement of the machine part, a predetermined maximum acceleration and/or a predetermined maximum jerk is not exceeded. The maximum acceleration and/or the maximum jerk is varied depending on the position of the machine part and/or depending on the alignment of the machine part.

Abstract: A projection exposure apparatus for microlithography includes an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter is guaranteed at every point in time of the control.

Abstract: The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.

Abstract: The invention relates to a projection exposure apparatus for microlithography comprising an optical element actuatable by a first and a second actuator. The actuators are controlled via control intervals in such a way that a minimum deflectability predefined in accordance with a preselectable parameter ? is guaranteed at every point in time of the control.

Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: A method for operating a coordinate measuring machine or a machine tool. A movement of a machining part is controlled in such a way that, during the movement of the machine part, a predetermined maximum acceleration and/or a predetermined maximum jerk is not exceeded. The maximum acceleration and/or the maximum jerk is varied depending on the position of the machine part and/or depending on the alignment of the machine part.

Abstract: The present disclosure relates to a method for the production and/or adjustment of an optical arrangement of a projection illumination system, in which at least one actuator is used to set the position of at least one optical element to be manipulated by moving the optical element incrementally with a specific increment size. The increment size of the movement increments is set as a function of the distance of the optical element from the desired position, with the distance being represented by a distance value. If the distance value is above a first threshold value, a substantially constant increment size is set, while the specific increment size decreases as the distance from the desired position decreases if the distance value is below the first threshold value. Alternatively or additionally, a pre-specified deviation from the specific increment size and/or from a pre-specified increment size change rate results in a warning signal and/or ceasing of the movement.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.

Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.

Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.

Abstract: A probe head having a probe head base and a stylus is provided for contacting a surface point on a workpiece. The stylus is moveable relative to the probe head base and has a defined rest position relative to the probe head base. For the contacting, the probe head is moved relative to the workpiece until the stylus touches the surface point with a defined contacting force. A correction data record representing a hysteresis behavior of the stylus with respect to the rest position is provided, and the contacting force is determined using the correction data record.

Abstract: In order to determine spatial coordinates of a multiplicity of measurement points along a contour of a measurement object, a probe head is provided with a probe element that is movably supported on the probe head. During movement of the probe head along the contour, position measuring values of the probe head and deflections of the probe element relative to the probe head are determined. Spatial coordinates for the measurement points along the contour are determined from the position measuring values and deflections. The probe element is kept in contact with the contour during movement of the probe head by using an actuator to produce a defined contact force. The contact force is set as a function of a differential acceleration of the probe element relative to the probe head.

Abstract: In a coordinate measuring machine or any other kind of machine having at least one translational movement axis, correction values are determined by moving the mobile head of the machine along a defined path of movement. First and second position data are recorded by means of first and second position measuring devices. The first position data originate from position measuring devices of the machine. The second position data result from a reference measurement. The correction values are determined as a function of the first and second position data. A defined number of correction values is determined for each section of the path of movement, with the defined number varying in the sections as a function of the error profile defined by the correction values.

Abstract: An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.