Patents by Inventor Eugene Anikin

Eugene Anikin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10552565
    Abstract: Techniques are disclosed for optimizing the pattern density in the circuit layout design of a circuit layer. A layer in circuit design is analyzed to define empty regions that can be filled with fill polygons (referred to hereafter as “fill” regions). Next, a pattern of fill polygons is generated. After the fill polygons have been defined, the layout design for the layer is divided into separate areas or “windows,” and a target density for each window is determined. Once this target density for the window has been determined, the fill polygons required to most closely approach this target density are generated and added to the circuit layout design. This process may be repeated with progressively different (e.g., smaller) fill polygons, until each window meets or exceeds both the specified minimum density and complies with the specified maximum density gradient.
    Type: Grant
    Filed: November 22, 2016
    Date of Patent: February 4, 2020
    Assignee: Mentor Graphics Corporation
    Inventors: Eugene Anikin, Fedor G. Pikus, Laurence Grodd, David A. Abercrombie, John W. Stedman
  • Publication number: 20170147732
    Abstract: Techniques are disclosed for optimizing the pattern density in the circuit layout design of a circuit layer. A layer in circuit design is analyzed to define empty regions that can be filled with fill polygons (referred to hereafter as “fill” regions). Next, a pattern of fill polygons is generated. After the fill polygons have been defined, the layout design for the layer is divided into separate areas or “windows,” and a target density for each window is determined. Once this target density for the window has been determined, the fill polygons required to most closely approach this target density are generated and added to the circuit layout design. This process may be repeated with progressively different (e.g., smaller) fill polygons, until each window meets or exceeds both the specified minimum density and complies with the specified maximum density gradient.
    Type: Application
    Filed: November 22, 2016
    Publication date: May 25, 2017
    Applicant: Mentor Graphics Corporation
    Inventors: Eugene Anikin, Fedor G. Pikus, Laurence Grodd, David A. Abercrombie, John W. Stedman
  • Patent number: 9652574
    Abstract: Techniques are disclosed for optimizing the pattern density in the circuit layout design of a circuit layer. A layer in circuit design is analyzed to define empty regions that can be filled with fill polygons (referred to hereafter as “fill” regions). Next, a pattern of fill polygons is generated. After the fill polygons have been defined, the layout design for the layer is divided into separate areas or “windows,” and a target density for each window is determined. Once this target density for the window has been determined, the fill polygons required to most closely approach this target density are generated and added to the circuit layout design. This process may be repeated with progressively different (e.g., smaller) fill polygons, until each window meets or exceeds both the specified minimum density and complies with the specified maximum density gradient.
    Type: Grant
    Filed: April 25, 2011
    Date of Patent: May 16, 2017
    Assignee: Mentor Graphics Corporation
    Inventors: Eugene Anikin, Fedor G. Pikus, Laurence W. Grodd, David A. Abercrombie, John W. Stedman
  • Patent number: 9507902
    Abstract: Techniques are disclosed for optimizing the pattern density in the circuit layout design of a circuit layer. A layer in circuit design is analyzed to define empty regions that can be filled with fill polygons (referred to hereafter as “fill” regions). Next, a pattern of fill polygons is generated. After the fill polygons have been defined, the layout design for the layer is divided into separate areas or “windows,” and a target density for each window is determined. Once this target density for the window has been determined, the fill polygons required to most closely approach this target density are generated and added to the circuit layout design. This process may be repeated with progressively different (e.g., smaller) fill polygons, until each window meets or exceeds both the specified minimum density and complies with the specified maximum density gradient.
    Type: Grant
    Filed: April 25, 2011
    Date of Patent: November 29, 2016
    Assignee: Mentor Graphics Corporation
    Inventors: Eugene Anikin, Fedor G. Pikus, Laurence W. Grodd, David A. Abercrombie, John W. Stedman
  • Publication number: 20110289471
    Abstract: Techniques are disclosed for optimizing the pattern density in the circuit layout design of a circuit layer. A layer in circuit design is analyzed to define empty regions that can be filled with fill polygons (referred to hereafter as “fill” regions). Next, a pattern of fill polygons is generated. After the fill polygons have been defined, the layout design for the layer is divided into separate areas or “windows,” and a target density for each window is determined. Once this target density for the window has been determined, the fill polygons required to most closely approach this target density are generated and added to the circuit layout design. This process may be repeated with progressively different (e.g., smaller) fill polygons, until each window meets or exceeds both the specified minimum density and complies with the specified maximum density gradient.
    Type: Application
    Filed: April 25, 2011
    Publication date: November 24, 2011
    Inventors: Eugene Anikin, Fedor G. Pikus, Laurence W. Grodd, David A. Abercrombie, John W. Stedman
  • Publication number: 20090077506
    Abstract: Techniques are disclosed for optimizing the pattern density in the circuit layout design of a circuit layer. A layer in circuit design is analyzed to define empty regions that can be filled with fill polygons (referred to hereafter as “fill” regions). Next, a pattern of fill polygons is generated. After the fill polygons have been defined, the layout design for the layer is divided into separate areas or “windows,” and a target density for each window is determined. Once this target density for the window has been determined, the fill polygons required to most closely approach this target density are generated and added to the circuit layout design. This process may be repeated with progressively different (e.g., smaller) fill polygons, until each window meets or exceeds both the specified minimum density and complies with the specified maximum density gradient.
    Type: Application
    Filed: May 15, 2008
    Publication date: March 19, 2009
    Inventors: Eugene Anikin, Fedor Pikus, Laurence Grodd, David A. Abercrombie, John W. Stedman
  • Publication number: 20080034332
    Abstract: Techniques are provided for optimizing the pattern density in the circuit layout design of a circuit layer. A layer in circuit design is analyzed to define fill regions that can be filled with fill polygons A pattern of fill polygons also is generated, to fill the fill regions. The layout design for the layer then is divided into separate areas or “windows,” and a target density for each window is determined. More particularly, each window is analyzed to determine a target density for the window that will satisfy specified density constraint values, such as a minimum density constraint, a maximum density constraint, or a maximum density gradient constraint. In some implementations, the target density will be the smallest density that will comply with each of the specified density value constraints. Once the target density for the window has been determined, the fill polygons required to most closely approach this target density are selected and added to the circuit layout design.
    Type: Application
    Filed: May 1, 2007
    Publication date: February 7, 2008
    Applicant: Mentor Graphics Corporation
    Inventors: Eugene Anikin, Fedor Pikus, John Stedman, Laurence Grodd, David Abercrombie