Patents by Inventor Eugene C. Baryschpolec

Eugene C. Baryschpolec has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wet clean compositions for CoWP and porous dielectrics
    Patent number: 8361237
    Abstract: The present invention is a formulation for wet clean removal of post etch and ash residue from a semiconductor substrate having a CoWP feature, comprising; Deionized water; Organic acid; Amine and/or quaternary ammonium hydroxide; wherein the formulation is compatible with the CoWP feature and either (a) the molar ratio of amine and/or quaternary ammonium hydroxide to organic acid provides a pH in the range of 7-14; or (b) the formulation includes a corrosion inhibitor. A method of using the formulation is also described.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: January 29, 2013
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Aiping Wu, Madhukar Bhaskara Rao, Eugene C. Baryschpolec
  • Wet Clean Compositions for CoWP and Porous Dielectrics
    Publication number: 20100152086
    Abstract: The present invention is a formulation for wet clean removal of post etch and ash residue from a semiconductor substrate having a CoWP feature, comprising; Deionized water; Organic acid; Amine and/or quaternary ammonium hydroxide; wherein the formulation is compatible with the CoWP feature and either (a) the molar ratio of amine and/or quaternary ammonium hydroxide to organic acid provides a pH in the range of 7-14; or (b) the formulation includes a corrosion inhibitor. A method of using the formulation is also described.
    Type: Application
    Filed: November 24, 2009
    Publication date: June 17, 2010
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Aiping Wu, Madhukar Bhaskara Rao, Eugene C. Baryschpolec