Abstract: A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated water. The preferred cleaning composition has a pH from 2 to 6 and comprises: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.

Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Abstract: The stability of HAN, HAN derivatives or hydroxylamine, and compositions comprising these is considerably enhanced by employing a stabilizing effective amount of a stabilizer selected from (a) a pyridine or pyridone salt, or an acid thereof; (b) a diphosphonate or methylenephosphonate salt, or an acid thereof; or (c) a mixture of two or more stabilizers, wherein at least one is selected from (a) and at least one is selected from (b). Stabilized HAN, HAN derivatives, or hydroxylamine or compositions comprising HAN, an HAN derivative or hydroxylamine, along with a process for providing these stabilized compositions is described. A stabilizer mixture having enhanced, synergistic stabilizing properties is described as well.

Abstract: Non-corrosive cleaning compositions that are useful for removing photoresist and/or plasma etch residues from a substrate. The cleaning composition comprises: (i) a hydroxy-(lower alkyl)-hydrazine, (ii) water, and (iii) at least one compound selected from the group consisting of a carboxylic acid, a water-miscible organic solvent and mixtures thereof.

Abstract: Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Abstract: A non-corrosive cleaning composition for removing plasma etching residues having a pH from 2 to 6 and comprising: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.

Abstract: Disclosed is a stabilized hydroxylammonium nitrate or hydroxylamine-containing composition comprising said hydroxylammonium nitrate or hydroxylamine and a pyridine or pyridone salt, or an acid thereof, said pyridine or pyridone salt, or acid thereof, being present in said composition in an amount of between about 0.0001% and about 2%, based upon the weight of said composition. Also disclosed is a process for preparing this composition.

Abstract: The present invention relates to a liquid or gel propellant comprising an oxidizer and a fuel, said fuel preferably having a vapor pressure not exceeding 10 millimeters of mercury at 25.degree. C. and being selected from the group consisting of hydroxy-(lower alkyl)-hydrazine, dihydroxy-(lower alkyl)hydrazine, cyanoethylhydrazine, 1-methyl-1-cyanoethylhydrazine, 1,1-dimethyl-2-cyanoethylhydrazine, and combinations thereof. Also claimed is a method of making the propellant.

Abstract: The compound 5-aminotetrazole is prepared by a process which comprises (a) reacting a hydrazine salt of a mineral acid with cyanamide to form the corresponding aminoguanidine salt, (b) diazotizing the aminoguanidine salt to the corresponding guanylazide salt, and (c) cyclizing the guanylazide salt to 5-aminotetrazole.

Abstract: The present invention relates to a novel compound which is the hydroxylammonium or lower alkyl hydroxylammonium salt of 3-nitro-1,2,4-triazol-5-one, together with processes for preparation thereof. One process comprises a two-step reaction comprising: (a) reacting 3-nitro-1,2,4-triazol-5-one with an aqueous alkali metal or alkaline earth metal hydroxide to form an aqueous solution of an alkali metal or alkaline earth metal salt of 3-nitro-1,2,4-triazol-5-one, and (b) reacting said alkali metal or alkaline earth metal salt of 3-nitro-1,2,4-triazol-5-one with an aqueous solution of hydroxylammonium salt or lower alkyl-substituted hydroxylammonium salt to form the hydroxylammonium salt of 3-nitro-1,2,4-triazol-5-one.

Abstract: The present invention relates to a novel compound which is the hydroxylammonium or lower alkyl hydroxylammonium salt of 3-nitro-1,2,4-triazol-5-one, together with processes for preparation thereof. One process comprises a two-step reaction comprising: (a) reacting 3-nitro-1,2,4-triazol-5-one with an aqueous alkali metal or alkaline earth metal hydroxide to form an aqueous solution of an alkali metal or alkaline earth metal salt of 3-nitro-1,2,4-triazol-5-one, and (b) reacting said alkali metal or alkaline earth metal salt of 3-nitro-1,2,4-triazol-5-one with an aqueous solution of hydroxylammonium salt or lower alkyl-substituted hydroxylammonium salt to form the hydroxylammonium salt of 3-nitro-1,2,4-triazol-5-one.

Abstract: The present invention relates to a continuous process for making an alkali metal azide or an alkaline earth metal azide which comprises the steps of: (a) reacting a first reaction mixture comprising an alkali metal nitrite or alkaline earth metal nitrite, a C1--C3 alkanol, and a high boiling acid in a first reactor to form a gaseous C1-C3 alkyl nitrite, (b) controllably feeding said gaseous C1-C3 alkyl nitrite into a second reactor and reacting in a controlled manner a second reaction mixture comprising said gaseous C1-C3 alkyl nitrite, hydrazine, and an alkali metal hydroxide or alkaline earth metal hydroxide, in the presence of an organic solvent, thereby producing an alkali metal azide or alkaline earth metal azide, and (c) removing said alkali metal azide or alkaline earth metal azide from said second reactor and replenishing said reaction mixture in said second reactor to provide a continuous, controlled process for producing said alkali metal azide or alkaline earth metal azide.

Abstract: A process for producing chloride ion-free 1,2,4-triazol-5-one which comprises: a) heating a mixture of hydrazodicarbonamide and formic acid to a reflux temperature for said mixture, b) refluxing said mixture at said reflux temperature for a time sufficient to cause said mixture to change its visual appearance from a cloudy mixture to a clear solution, and c) removing unreacted formic acid from said clear solution to provide the desired 1,2,4-triazol-5-one product free of chloride ion.

Abstract: The present invention relates to a process for ridding moss from an unwanted location such as lawns, walls, monuments, building foundations, tombstones, and combinations thereof which comprises contacting moss growing in said unwanted location with a mossicidal effective amount of a pyrithione salt.

Abstract: In a process for the production of Alkyl substituted 5-amidotetrazole compounds represented by the formula: ##STR1## wherein A represents NHX or NRR'X represents a lower alkyl groupR represents a lower alkyl group, andR' represents a lower alkyl group.reacts 5-aminotetrazole with an alkyl isocyanate or a dialkyl carbamoyl halide in a polar solvent.

Abstract: In a process for the production of cellular products comprising thermoplastic or rubber materials the blowing agents employed have the formula: ##STR1## wherein A represents NHX, NRR' or ORX represents H or a lower alkyl group,R represents a lower alkyl group, andR' represents a lower alkyl group.The novel blowing agents provide high gas yields and have high decomposition temperatures while forming only inert nitrogen gas. They are particularly suitable for the production of cellular products from high temperature thermoplastic materials such as polycarbonates.

Abstract: In a process for the production of cellular products comprising thermoplastic or rubber materials the blowing agents employed have the formula: ##STR1## wherein A represents NHX, NRR' or ORX represents H or a lower alkyl group,R represents a lower alkyl group, andR' represents a lower alkyl group.The novel blowing agents provide high gas yields and have high decomposition temperatures while forming only inert nitrogen gas. They are particularly suitable for the production of cellular products from high temperature thermoplastic materials such as polycarbonates.

Abstract: A package and process of assembling a package adapted for housing an electronic component. The package includes metallic base, lid and leadframe components sealed together with a thermoplastic material. The thermoplastic has an additive consisting essentially of a metal deactivator and a primary antioxidant grafted thereto without cross linking so as to maintain the thermoplastic properties.

Abstract: A process for producing triaminoguanidine nitrate, and, more specifically, a process which involves reacting hydrazine, nitric acid and cyanamide in specified molar ratios. Also claimed is the high melting point product so produced.

Abstract: A process for the production of cellular products which comprises incorporating a blowing agent into rubber or a thermoplastic material uses as the blowing agent a tetrazole compound represented by the formula: ##STR1## in which R represents an alkyl, cycloalkyl, hydroxyalkyl, polyhydroxyalkyl, aryl, alkylaryl, aralkylene, alkenyl, alkenylaryl or alkenylaralkylene group.The novel blowing agents of the present invention include compounds which are liquids which may be directly incorporated into the molten rubber or thermoplastic material. The blowing agents of this invention are especially useful, as indicated, with polymers and copolymers that have high processing temperatures as they minimize polymer degradation and provide products with increased impact strengths.