Abstract: Disclosed is a radiation emitting diode in which a first layer of N-type GaAs and a second layer of N-type GaAlAs are formed on an N-type GaAs substrate. A localized zinc diffused region extends through the second layer and partially into the first layer to form a buried junction. Because of the higher bandgap energy of GaAlAs than of GaAs, the current density in the GaAlAs portion of the p-n junction is greatly reduced compared to that in the GaAs portion and the non-radiative surface components of current are greatly reduced. This results in a buried junction structure in which the radiation emitting region is removed from the surface. The buried junction structure provides devices having improved linearity of the radiant output power versus current characteristics and reduced degradation of radiant output power at constant current with time.