Abstract: Techniques for producing and manipulating magnetic fields. The techniques employ the mutual repulsion of magnetic fields to create uniform magnetic fields and to manipulate the uniform magnetic fields. The uniform magnetic field is created between two planar magnets. The planar magnets have cores which describe a closed curve. Like poles of the electromagnets are connected by the cores. When the electromagnets are activated, repulsion between the magnetic fields generated by the electromagnets creates a magnetic field which extends above and below the planes of the planar magnets. If the planar magnets are positioned parallel to each other and aligned so that the magnetic fields generated by the planar magnets repel each other in the space between the planar magnets, the repulsion between the fields generates a resultant field.

Abstract: Techniques for producing and manipulating magnetic fields. The techniques employ the mutual repulsion of magnetic fields to create uniform magnetic fields and to manipulate the uniform magnetic fields. The uniform magnetic field is created between two planar magnets. The planar magnets have cores which describe a closed curve. Like poles of the electromagnets are connected by the cores. When the electromagnets are activated, repulsion between the magnetic fields generated by the electromagnets creates a magnetic field which extends above and below the planes of the planar magnets. If the planar magnets are positioned parallel to each other and aligned so that the magnetic fields generated by the planar magnets repel each other in the space between the planar magnets, the repulsion between the fields generates a resultant field.

Abstract: Techniques used in systems that employ pairs of coils arranged around an axis to make a magnetic field that rotates around an axis to reduce or eliminate the effects of corners where adjacent ones of the coils meet on the uniformity of the magnetic field. The techniques are particularly useful in plasma reactors that employ magnetically-enhanced reactive ion etching technology. The techniques employ elements that are low cost and may be easily retrofitted to existing plasma reactors. The elements include magnetic shunts that are fitted to the corners of the coils to compensate for the corner effects, trim coils fitted to the corners that, when energized, compensate for the corner effects, and sets of coils that function as 180° coils and thereby reduce the corner effects. The magnetic shunts may be combined with the trim coils.

Abstract: A magnetic vacuum oven mounted in a two piece steel magnet core. The two sections of the magnet slide apart on rails to provide easy access to the interior of the machine for maintenance and repair. The magnet core includes a "safe door" that is mounted on an articulated hinge or other hinge mechanism. The safe door provides direct access for product introduction to and removal from a central chamber surrounded by an applied magnetic field. Two electromagnet elements are mounted around the central chamber. One of the electromagnet elements is mounted in the front section of the housing, and one of the electromagnet elements is mounted in the rear section. The coils are separated by a small air gap to allow vacuum evacuation of the interior of the chamber. The magnetic coils are generally rectangular, and are water cooled to maintain a stable temperature when they are drawing power in operation.