Abstract: An underwater sensing system includes a cable structure, a water surface mount coupled to the cable structure, and a processor. The cable structure is configured to be deployed in a vertical orientation underwater and includes one or more sensors along a length of the cable structure. The one or more sensors are configured to detect maritime data associated with one or more marine-based parameters in an underwater maritime region around the cable structure. The water surface mount is configured to be at least partially exposed above a surface of the underwater maritime region and includes a transmitter configured to transmit the maritime data. The processor is configured to access a maritime model comprising parameters associated with the maritime region and update the maritime model based on the maritime data. The maritime model can be used as an input, or otherwise made accessible, to a navigation system of an underwater vehicle.

Abstract: Techniques are provided for tomographic imaging with sub-beam resolution and spectral enhancement. A system implementing the techniques according to an embodiment includes a target structure comprising one or more selected materials nanopatterned on a first surface of the target structure in a selected arrangement. The system also includes a primary particle beam source to provide a particle beam incident on an area of the first surface of the target structure, the area encompassing one or more of the nanopatterned materials, such that the materials generate characteristic X-rays in response to the primary beam. The system further includes a spectral energy detector (SED) to perform individual photon counting and spectral analysis of the characteristic X-rays and estimate attenuation properties of the imaged sample. The sample is positioned both adjacent to a second surface of the target structure, opposite the first surface, and between the target structure and the SED.

Abstract: Techniques are provided for tomographic imaging with sub-beam resolution and spectral enhancement. A system implementing the techniques according to an embodiment includes a target structure comprising one or more selected materials nanopatterned on a first surface of the target structure in a selected arrangement. The system also includes a primary particle beam source to provide a particle beam incident on an area of the first surface of the target structure, the area encompassing one or more of the nanopatterned materials, such that the materials generate characteristic X-rays in response to the primary beam. The system further includes a spectral energy detector (SED) to perform individual photon counting and spectral analysis of the characteristic X-rays and estimate attenuation properties of the imaged sample. The sample is positioned both adjacent to a second surface of the target structure, opposite the first surface, and between the target structure and the SED.

Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit). The sample is placed on a motion system that moves the sample with respect to an electron beam generator that is used in imaging the sample. The motion system affords thirteen degrees-of-freedom for movement of the sample, by providing a rotation stage, a fine 6-axis piezoelectric-driven stage, and a coarse 6-axis hexapod stage. Various detectors gather information to image the sample. Interferometric and/or capacitive sensors are used to measure the position of the sample and motion system.

Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit) implements two modes of operation utilizing a common electron beam generator that produces an electron beam within a chamber. In the first mode, the electron beam interacts directly with the sample, and backscattered electrons, secondary electrons, and backward propagating fluorescent X-rays are measured. In the second mode, the electron beam interrogates the sample via X-rays generated by the electron beam within a target that is positioned between the electron beam generator and the sample. Transmitted X-rays are measured by a detector within the vacuum chamber. The sample is placed on a movable platform to precisely position the sample with respect to the electron beam. Interferometric and/or capacitive sensors are used to measure the position of the sample and movable platform to provide high accuracy metadata for performing high resolution three-dimensional sample reconstruction.

Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit) implements two modes of operation utilizing a common electron beam generator that produces an electron beam within a chamber. In the first mode, the electron beam interacts directly with the sample, and backscattered electrons, secondary electrons, and backward propagating fluorescent X-rays are measured. In the second mode, the electron beam interrogates the sample via X-rays generated by the electron beam within a target that is positioned between the electron beam generator and the sample. Transmitted X-rays are measured by a detector within the vacuum chamber. The sample is placed on a movable platform to precisely position the sample with respect to the electron beam. Interferometric and/or capacitive sensors are used to measure the position of the sample and movable platform to provide high accuracy metadata for performing high resolution three-dimensional sample reconstruction.

Abstract: A system and method for imaging a sample having a complex structure (such as an integrated circuit). The sample is placed on a motion system that moves the sample with respect to an electron beam generator that is used in imaging the sample. The motion system affords thirteen degrees-of-freedom for movement of the sample, by providing a rotation stage, a fine 6-axis piezoelectric-driven stage, and a coarse 6-axis hexapod stage. Various detectors gather information to image the sample. Interferometric and/or capacitive sensors are used to measure the position of the sample and motion system.