Patents by Inventor Eugene Telesh

Eugene Telesh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Alignment film for liquid crystals obtainable by direct particle beam deposition
    Patent number: 8767153
    Abstract: The invention relates to a process of preparing an alignment film for the alignment of liquid crystals (LCs) or reactive mesogens (RMs), by a direct particle beam deposition process, to an alignment film obtainable by said process, to the use of said alignment film for the alignment of LCs or RMs, especially in the form of thin layers, to a multilayer comprising said alignment film and one or more LC and/or RM layers, and to the use of the alignment film and multilayer in optical, electronic and electrooptical applications.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: July 1, 2014
    Assignee: Merck Patent GmbH
    Inventors: Oleg Yaroshchuk, Eugene Telesh, Aleksander Khokhlov
  • PROCESS OF FORMING INSULATING LAYER BY PARTICLES HAVING LOW ENERGY
    Publication number: 20110284801
    Abstract: The invention relates to a process of preparing functional layers, like protection, encapsulation and alignment layers, on an electronic device by a low energy particle beam deposition process, to functional layers obtainable by said process, and to electronic devices comprising such functional layers.
    Type: Application
    Filed: November 18, 2009
    Publication date: November 24, 2011
    Applicant: Merck Patent Gesellschaft Mit Beschrankter Haftung
    Inventors: Michael Coelle, Owain Llyr Parri, David Sparrowe, Oleg Yaroshchuk, Eugene Telesh
  • ALIGNMENT FILM FOR LIQUID CRYSTALS OBTAINABLE BY DIRECT PARTICLE BEAM DEPOSITION
    Publication number: 20110007255
    Abstract: The invention relates to a process of preparing an alignment film for the alignment of liquid crystals (LCs) or reactive mesogens (RMs), by a direct particle beam deposition process, to an alignment film obtainable by said process, to the use of said alignment film for the alignment of LCs or RMs, especially in the form of thin layers, to a multilayer comprising said alignment film and one or more LC and/or RM layers, and to the use of the alignment film and multilayer in optical, electronic and electrooptical applications.
    Type: Application
    Filed: February 3, 2009
    Publication date: January 13, 2011
    Applicant: MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG
    Inventors: Oleg Yaroshchuk, Eugene Telesh