Patents by Inventor Eui-chul Kang

Eui-chul Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10435509
    Abstract: A hetero type monodispersed polyethylene glycol containing a compound represented by the following formula (1): NH2—(CH2CH2O)a—CH2CH2COOH??(1) (in the formula (1), a represents an integer from 6 to 40); wherein any of (A) a chromatogram detected by a differential refractometer when the hetero type monodispersed polyethylene glycol is separated using reverse phase chromatography, (B) a chromatogram detected by a differential refractometer when the hetero type monodispersed polyethylene glycol is separated using cation exchange chromatography, and (C) a chromatogram detected by a differential refractometer when the hetero type monodispersed polyethylene glycol containing a compound represented by the formula (1) shown above is derivatized and separated using anion exchange chromatography satisfy specific relational expressions, respectively.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 8, 2019
    Assignees: TOHOKU TECHNO ARCH CO., LTD., NOF CORPORATION
    Inventors: Kazushi Kinbara, Takahiro Muraoka, Adam Marcin Wawro, Tomoyuki Ohtake, Eui-chul Kang, Tomoki Uruga, Ryutaro Imamura
  • Patent number: 10017655
    Abstract: Provided are a silver element containing silver acetonedicarboxylate with high silver content, and capable of providing a silver element with excellent electrical conductivity, flatness, and adhesivity through heating even for a short time at a low temperature of below the decomposition temperature of the silver salt, and having excellent storage stability, as well as a substrate having a silver element formed thereon with the composition. The composition is characterized by a particular ratio of silver compound (A) represented by formula (1) and amine compound (B) represented by formula (2): (R1: H, —(CY2)a-CH3, —((CH2)b-O—CHZ)c-CH3; R2: —(CY2)d-CH3, —((CH2)e-O—CHZ)f-CH3, Y: H, —(CH2)g-CH3; Z: H, —(CH2)h-CH3; a: 0-8; b: 1-4; c: 1-3; d: 1-8; e: 1-4; f: 1-3; g: 1-3; h: 1-2).
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: July 10, 2018
    Assignee: NOF CORPORATION
    Inventors: Koichi Aoki, Eui-Chul Kang, Tatsuya Kozu, Toshinobu Fujimura
  • Publication number: 20180186931
    Abstract: A hetero type monodispersed polyethylene glycol containing a compound represented by the following formula (1): NH2—(CH2CH2O)a—CH2CH2COOH??(1) (in the formula (1), a represents an integer from 6 to 40); wherein any of (A) a chromatogram detected by a differential refractometer when the hetero type monodispersed polyethylene glycol is separated using reverse phase chromatography, (B) a chromatogram detected by a differential refractometer when the hetero type monodispersed polyethylene glycol is separated using cation exchange chromatography, and (C) a chromatogram detected by a differential refractometer when the hetero type monodispersed polyethylene glycol containing a compound represented by the formula (1) shown above is derivatized and separated using anion exchange chromatography satisfy specific relational expressions, respectively.
    Type: Application
    Filed: June 29, 2016
    Publication date: July 5, 2018
    Applicants: TOHOKU TECHNO ARCH CO., LTD., NOF CORPORATION
    Inventors: Kazushi KINBARA, Takahiro MURAOKA, Marcin Adam WAWRO, Tomoyuki OHTAKE, Eui-chul KANG, Tomoki URUGA, Ryutaro IMAMURA
  • Patent number: 9496069
    Abstract: Provided are silver nanoparticles having excellent dispersion stability and capable of forming on a substrate a silver element, such as a silver film or line, having excellent electrical conductivity and adhesivity through heating. A method for producing the silver nanoparticles, its dispersion liquid, and a substrate having a silver element formed thereon using the dispersion liquid are disclosed. The silver nanoparticles contain silver compound (A) of formula (1): amine compound (B) having a primary amino group; and polymer (C) obtained by polymerization of a monomer composition containing diol (meth)acrylate compound (c1) having a urethane bond of formula (2): (R1: hydrogen atom or methyl group; R2: —(CH2)n-; n: 1 to 4), and at least one monomer (c2) selected from (meth)acrylate monomers, acrylamide monomers, vinyl monomers, vinyl ether monomers, or monomers having an epoxy group.
    Type: Grant
    Filed: May 29, 2013
    Date of Patent: November 15, 2016
    Assignee: NOF CORPORATION
    Inventors: Tatsuya Kozu, Masaya Hikita, Eui-chul Kang
  • Patent number: 9157004
    Abstract: A composition for copper patterning and a method of copper patterning using the composition are provided, which composition is excellently safe in copper patterning, sintering at lower temperatures, and capable of forming a highly conducive copper pattern of a desired shape even on a plastic substrate. The composition contains Component A: a copper ?-ketocarboxylate compound of formula (1): (R1, R2: H or C1-C6 straight- or C3-C6 branched-hydrocarbon group, etc.); and based on 1 mol of this compound, Component B: an amine compound having a boiling point of not higher than 250° C. at 0.1 to 500 mol; and Component C-1: an organic acid having pKa of not more than 4 at 0.01 to 20 mol, and/or Component C-2: an organic copper compound composed of copper and an organic acid having pKa of not more than 4 at 0.01 to 100 mol. The composition is useful in the field of electronics.
    Type: Grant
    Filed: October 23, 2012
    Date of Patent: October 13, 2015
    Assignees: NOF CORPORATION, OSAKA UNIVERSITY
    Inventors: Eui-chul Kang, Tomoyuki Ohtake, Katsuaki Suganuma, Masaya Nogi, Natsuki Komoda
  • Publication number: 20150206618
    Abstract: Provided are silver nanoparticles having excellent dispersion stability and capable of forming on a substrate a silver element, such as a silver film or line, having excellent electrical conductivity and adhesivity through heating. A method for producing the silver nanoparticles, its dispersion liquid, and a substrate having a silver element formed thereon using the dispersion liquid are disclosed. The silver nanoparticles contain silver compound (A) of formula (1): amine compound (B) having a primary amino group; and polymer (C) obtained by polymerization of a monomer composition containing diol (meth)acrylate compound (c1) having a urethane bond of formula (2): (R1: hydrogen atom or methyl group; R2: —(CH2)n-; n: 1 to 4), and at least one monomer (c2) selected from (meth)acrylate monomers, acrylamide monomers, vinyl monomers, vinyl ether monomers, or monomers having an epoxy group.
    Type: Application
    Filed: May 29, 2013
    Publication date: July 23, 2015
    Applicant: NOF CORPORATION
    Inventors: Tatsuya Kozu, Masaya Hikita, Eui-chul Kang
  • Publication number: 20150203699
    Abstract: Provided are a silver element containing silver acetonedicarboxylate with high silver content, and capable of providing a silver element with excellent electrical conductivity, flatness, and adhesivity through heating even for a short time at a low temperature of below the decomposition temperature of the silver salt, and having excellent storage stability, as well as a substrate having a silver element formed thereon with the composition. The composition is characterized by a particular ratio of silver compound (A) represented by formula (1) and amine compound (B) represented by formula (2): (R1: H, —(CY2)a-CH3, —((CH2)b-O—CHZ)c-CH3; R2: —(CY2)d-CH3, —((CH2)e-O—CHZ)f-CH3, Y: H, —(CH2)g-CH3; Z: H, —(CH2)h-CH3; a: 0-8; b: 1-4; c: 1-3; d: 1-8; e: 1-4; f: 1-3; g: 1-3; h: 1-2).
    Type: Application
    Filed: July 17, 2012
    Publication date: July 23, 2015
    Applicant: NOF CORPORATION
    Inventors: Koichi Aoki, Eui-chul Kang, Tatsuya Kozu, Toshinobu Fujimura
  • Publication number: 20140305684
    Abstract: A composition for copper patterning and a method of copper patterning using the composition are provided, which composition is excellently safe in copper patterning, sintering at lower temperatures, and capable of forming a highly conducive copper pattern of a desired shape even on a plastic substrate. The composition contains Component A: a copper ?-ketocarboxylate compound of formula (1): (R1, R2: H or C1-C6 straight- or C3-C6 branched-hydrocarbon group, etc.); and based on 1 mol of this compound, Component B: an amine compound having a boiling point of not higher than 250° C. at 0.1 to 500 mol; and Component C-1: an organic acid having pKa of not more than 4 at 0.01 to 20 mol, and/or Component C-2: an organic copper compound composed of copper and an organic acid having pKa of not more than 4 at 0.01 to 100 mol. The composition is useful in the field of electronics.
    Type: Application
    Filed: October 23, 2012
    Publication date: October 16, 2014
    Applicants: OSAKA UNIVERSITY, NOF CORPORATION
    Inventors: Eui-chul Kang, Tomoyuki Ohtake, Katsuaki Suganuma, Masaya Nogi, Natsuki Komoda
  • Patent number: 8399558
    Abstract: The present disclosure provides an inorganic-organic hybrid film which is excellent in transparency, adhesion, heat resistance, weatherability, and anti-rust property, whose refractive index may be controlled easily, and which is also excellent in hardness. Also provided are an inorganic-organic hybrid composition as a starting material for the film, and a hard coating material, an optical material, an anti-rust coating material, and a conductive coating material, all utilizing the composition. The composition is characterized by containing organic component (A) composed of monomer component (a1) containing a particular diol (meth)acrylate compound (U) having a urethane bond, or polymer component (a2) containing polymer (P) obtained by polymerization of monomer component (a1), and inorganic component (B), wherein the ratio of the organic component (A) to the inorganic component (B) is 1:99 to 99:1 by mass.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: March 19, 2013
    Assignee: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Kenji Ito
  • Publication number: 20120276179
    Abstract: The invention provides a cosmetic product which has a good texture and allows full expression of the inherent functions of ceramide as an intercellular lipid, such as skin barrier function and hair protection effect, as well as nanoparticles for cosmetics and powder for cosmetics which may be used in the above cosmetic product, exhibit good skin barrier function and hair protection effect, and are easy to incorporate into the above cosmetic product. The cosmetic product, the nanoparticles, and the powder for cosmetics according to the present invention contain a polymer obtained by polymerization of a monomer material containing a glycerol(meth)acrylate monomer represented by the formula (1): (R1: —H, —CH3; R2: —(CH2)n-; n is an integer of 1 to 4).
    Type: Application
    Filed: June 29, 2012
    Publication date: November 1, 2012
    Applicant: NOF CORPORATION
    Inventors: Hiroki Fukui, Yoshimi Sekine, Daisuke Kayaba, Eui-chul Kang, Atsuhiko Ogura, Kenshiro Shuto
  • Patent number: 7763694
    Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: July 27, 2010
    Assignee: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
  • Patent number: 7763695
    Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: July 27, 2010
    Assignee: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
  • Publication number: 20100081779
    Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n—; R3: —(CH2)m—; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).
    Type: Application
    Filed: December 4, 2009
    Publication date: April 1, 2010
    Applicant: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
  • Publication number: 20100081780
    Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).
    Type: Application
    Filed: December 4, 2009
    Publication date: April 1, 2010
    Applicant: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
  • Publication number: 20100040697
    Abstract: The invention provides a cosmetic product which has a good texture and allows full expression of the inherent functions of ceramide as an intercellular lipid, such as skin barrier function and hair protection effect, as well as nanoparticles for cosmetics and powder for cosmetics which may be used in the above cosmetic product, exhibit good skin barrier function and hair protection effect, and are easy to incorporate into the above cosmetic product. The cosmetic product, the nanoparticles, and the powder for cosmetics according to the present invention contain a polymer obtained by polymerization of a monomer material containing a glycerol (meth)acrylate monomer represented by the formula (1): (R1: —H, —CH3; R2: —(CH2)n-; n is an integer of 1 to 4).
    Type: Application
    Filed: October 19, 2009
    Publication date: February 18, 2010
    Applicant: NOF CORPORATION
    Inventors: Hiroki Fukui, Yoshimi Sekine, Daisuke Kayaba, Eui-chul Kang, Atsuhiko Ogura, Kenshiro Shuto
  • Patent number: 7649106
    Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: January 19, 2010
    Assignee: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
  • Patent number: 7649105
    Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: January 19, 2010
    Assignee: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
  • Publication number: 20090247718
    Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).
    Type: Application
    Filed: June 4, 2009
    Publication date: October 1, 2009
    Applicant: NOF Corporation
    Inventors: Eui-chul KANG, Atsuhiko OGURA, Shingo KATAOKA, Takashi IWATA
  • Publication number: 20090240015
    Abstract: The present invention provides compounds having in their molecule a structure contributing to high hydrophilicity, and having high photopolymerizability, as well as polymers of such compounds, and a method for producing the compound. The compounds are diol (meth)acrylate having a urethane bond represented by the formula (1), and cyclic ketal (meth)acrylate having a urethane bond represented by the formula (2): (R1: H, —CH3; R2: —(CH2)n-; R3: —(CH2)m-; n: 1-4; m: 1-8; (AO): C2-C4 oxyalkylene group; x: 0-1000; R4, R5: H, —CH3, —C2H5).
    Type: Application
    Filed: June 4, 2009
    Publication date: September 24, 2009
    Applicant: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Takashi Iwata
  • Publication number: 20090208719
    Abstract: The present disclosure provides an inorganic-organic hybrid film which is excellent in transparency, adhesion, heat resistance, weatherability, and anti-rust property, whose refractive index may be controlled easily, and which is also excellent in hardness. Also provided are an inorganic-organic hybrid composition as a starting material for the film, and a hard coating material, an optical material, an anti-rust coating material, and a conductive coating material, all utilizing the composition. The composition is characterized by containing organic component (A) composed of monomer component (a1) containing a particular diol (meth)acrylate compound (U) having a urethane bond, or polymer component (a2) containing polymer (P) obtained by polymerization of monomer component (a1), and inorganic component (B), wherein the ratio of the organic component (A) to the inorganic component (B) is 1:99 to 99:1 by mass.
    Type: Application
    Filed: June 19, 2007
    Publication date: August 20, 2009
    Applicant: NOF Corporation
    Inventors: Eui-chul Kang, Atsuhiko Ogura, Shingo Kataoka, Kenji Ito