Patents by Inventor Eui-gyu Kim

Eui-gyu Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7987812
    Abstract: A mask assembly configured to prevent the mask from being thermally transformed and to maintain gaps between a plurality of divided pattern masks is disclosed. According to one embodiment, the mask assembly comprises: an open mask that has a plurality of first openings arranged in rows and columns; and a pattern mask that comprises a plurality of unit pattern masks. In some embodiments, the ends of the unit pattern masks may be fixed with respect to the open mask, and the unit pattern mask includes a plurality of mask pattern units configured to align with the plurality of first openings of the open mask. In some embodiments, a tensile force is applied to the unit pattern mask(s).
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: August 2, 2011
    Assignee: Samsung Mobile Display Co., Ltd.
    Inventors: Eui-Gyu Kim, Tae-Hyung Kim
  • Patent number: 7572338
    Abstract: A mask for depositing a thin film of a flat panel display and a method of fabricating the mask are disclosed. Embodiments of the mask can improve position accuracy and prevent problems caused by thermal expansion of the mask by attaching a reinforcing member and mask pattern units arranged on openings of the reinforcing member using a buffer member. The mask includes a reinforcing member including a plurality of first openings; mask pattern units arranged corresponding to the first openings of the reinforcing member and supported by the reinforcing member; and a buffer member including a plurality of second openings corresponding to the first openings of the reinforcing member, and attaching the reinforcing member to the mask pattern units to support the reinforcing member and the mask pattern units.
    Type: Grant
    Filed: November 17, 2005
    Date of Patent: August 11, 2009
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Eui-Gyu Kim, Tae-Hyung Kim
  • Publication number: 20080157084
    Abstract: A mask device, a method of fabricating the mask device with improved reliability, a method of manufacturing a large-sized division mask device by forming a striped aperture parallel to the roll direction, and a method of fabricating an organic light emitting display device (OLED) using the mask device. The mask device includes: at least one mask alignment mark formed on a mask; a blocking region formed on the mask and blocking a deposition material; and an aperture region formed on the mask and through which the deposition material passes, wherein the at least one mask alignment mark is formed outside the aperture region, the aperture region has a stripe pattern, and the roll direction of the mask substrate is parallel to the longitudinal direction of the stripe pattern.
    Type: Application
    Filed: December 26, 2007
    Publication date: July 3, 2008
    Applicant: Samsung SDI Co., Ltd.
    Inventors: Eui-Gyu Kim, Tac-Hyung Kim, Wook Han
  • Publication number: 20060110663
    Abstract: A mask for depositing a thin film of a flat panel display and a method of fabricating the mask are disclosed. Embodiments of the mask can improve position accuracy and prevent problems caused by thermal expansion of the mask by attaching a reinforcing member and mask pattern units arranged on openings of the reinforcing member using a buffer member. The mask includes a reinforcing member including a plurality of first openings; mask pattern units arranged corresponding to the first openings of the reinforcing member and supported by the reinforcing member; and a buffer member including a plurality of second openings corresponding to the first openings of the reinforcing member, and attaching the reinforcing member to the mask pattern units to support the reinforcing member and the mask pattern units.
    Type: Application
    Filed: November 17, 2005
    Publication date: May 25, 2006
    Inventors: Eui-Gyu Kim, Tae-Hyung Kim
  • Publication number: 20060103289
    Abstract: A mask assembly configured to prevent the mask from being thermally transformed and to maintain gaps between a plurality of divided pattern masks is disclosed. According to one embodiment, the mask assembly comprises: an open mask that has a plurality of first openings arranged in rows and columns; and a pattern mask that comprises a plurality of unit pattern masks. In some embodiments, the ends of the unit pattern masks may be fixed with respect to the open mask, and the unit pattern mask includes a plurality of mask pattern units configured to align with the plurality of first openings of the open mask. In some embodiments, a tensile force is applied to the unit pattern mask(s).
    Type: Application
    Filed: November 16, 2005
    Publication date: May 18, 2006
    Inventors: Eui-Gyu Kim, Tae-Hyung Kim
  • Publication number: 20060102194
    Abstract: Provided is a method of descaling a mask that quickly and effectively removes a material attached to the mask. The method includes: directing a laser beam onto a material attached to the mask; and removing the material attached to the mask.
    Type: Application
    Filed: November 15, 2005
    Publication date: May 18, 2006
    Inventors: Eui-Gyu Kim, Tae-Hyung Kim
  • Patent number: 6282321
    Abstract: A context generation circuit for a small screen, and a method therefor, are provided. The circuit can generate a context with respect to an image that is larger than the horizontal size of a context using two-line and three-line templates, and also combine the position of a modified two-line template or modified three-line template overlapping an input image with the corresponding space in a register. Also, the circuit generates a context by inserting an arithmetic “0” into the position of the modified two-line template or modified three-line template which does not overlap the image. Therefore, an image having a small horizontal size can be effectively processed, and the circuit operates at high speed, and is reliable.
    Type: Grant
    Filed: December 8, 1998
    Date of Patent: August 28, 2001
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Eui-gyu Kim
  • Patent number: 6072543
    Abstract: A priority order processing circuit is disclosed for an MPEG system adapted to determine the priority order of events generated from a multiprocessor of a decoding system utilizing MPEG1 and MPEG2 schemes while controlling operations of the system.
    Type: Grant
    Filed: April 21, 1997
    Date of Patent: June 6, 2000
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Eui-Gyu Kim
  • Patent number: 5694178
    Abstract: A circuit for restoring an image signal using motion compensation is disclosed, which includes an index address generator for storing and selectively generating a start address for each image, an adder for adding the start address generated by the index address generator to an address of a current macroblock to be processed and generating a pseudo address, an address calculator for calculating an address displacement from a motion compensation vector, and an address generator for adding said pseudo address to the address displacement to generate start and end addresses.
    Type: Grant
    Filed: April 30, 1996
    Date of Patent: December 2, 1997
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Eui-Gyu Kim