Abstract: A method of forming fine patterns includes the steps of forming a conductive layer on a base part, forming a sacrificial layer including an adhesive material on the conductive layer, the adhesive material including a catechol group, forming resist patterns on the sacrificial layer, and forming fine patterns by patterning the conductive layer using the resist patterns as a mask.

Abstract: A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.

Abstract: A method of manufacturing a wire grid pattern includes providing a laminate having a base member, a metal layer disposed on the base member, a mask layer disposed on the metal layer and containing a metal oxide, an adhesive layer disposed on the mask layer, and a patterned resin layer disposed on the adhesive layer and formed by irradiation of first light; and irradiating the laminate with second light. The adhesive layer may comprise a silane coupling agent.

Abstract: A wire grid polarizer includes a substrate, and a plurality of wire patterns which is arranged on the substrate at periodic intervals, where the wire patterns include first wire patterns, which are disposed on the substrate, and one or more second wire patterns, which are disposed on one or more of the first wire patterns each of the second wire patterns including at least one of a neutral pattern, a surface treatment pattern and first and second monomer block patterns.

Abstract: A wire grid polarizer includes a substrate, and a plurality of wire patterns which is arranged on the substrate at periodic intervals, where the wire patterns include first wire patterns, which are disposed on the substrate, and one or more second wire patterns, which are disposed on one or more of the first wire patterns each of the second wire patterns including at least one of a neutral pattern, a surface treatment pattern and first and second monomer block patterns.

Abstract: A method of fabricating a wire grid polarizer includes sequentially forming a conductive layer, a guide layer, and a surface treatment protection layer on a substrate, patterning the surface treatment protection layer and the guide layer, forming a surface treatment film on side surfaces and upper surfaces of the first and second patterns, removing the first and second surface treatment protection patterns from the respective first and second patterns on which the surface treatment film is formed, to expose upper surfaces of the first and second guide patterns and providing a block copolymer of two monomers having mutually different etch rates into a space defined by the conductive layer and the first and second guide patterns, wherein a transfer layer which is hydrophobic to the block copolymer of two monomers is formed on the upper surfaces of the first and second guide patterns.

Abstract: A method of manufacturing a wire grid polarizer is provided. The method includes: forming an electrical conductive layer on a substrate; forming a guide pattern layer on the electrical conductive layer, wherein the guide pattern layer includes two or more linear structures separated from one another; forming a fluorocarbon surface modification layer on each of the linear structures using a fluorine-based gas plasma treatment; and forming a neutral layer on the electrical conductive layer, wherein the neutral layer has a nonselective affinity with repeating units of a block copolymer.

Abstract: A method of fabricating a wire grid polarizer includes sequentially depositing a conductive wire pattern layer, and a plurality of guide patterns which forms one or more trenches therebetween on the conductive wire pattern layer, hydrophobically treating surfaces of the conductive wire pattern layer exposed in the trenches, and the guide patterns, coating the hydrophobically treated conductive wire pattern layer in the trenches with a neutral layer to partially fill the trenches, filling a remainder of the trenches with a block copolymer of two monomers with different etching rates, aligning the block copolymer filled in the trenches, selectively removing blocks of one monomer among the two monomers from the aligned block copolymer, and patterning the conductive wire pattern layer by using blocks of the other monomer among the two monomers remaining in the trenches and the guide patterns as a mask.

Abstract: A pattering method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.

Abstract: An approach is provided for manufacturing a nanostructure. A first thin film including a first block copolymer is formed on a substrate. A guide pattern is formed on the first thin film. A second thin film including a second block copolymer is formed between portions of the guide pattern. The second thin film is cured. The first block copolymer is a cylinder-type and the second block copolymer is a lamella-type.

Abstract: A display apparatus includes a first display panel with a plurality of first pixels, a second display panel facing the first display panel and having a plurality of second pixels, a light reflective polarizer, and a backlight unit. The light reflective polarizer is interposed between the first and second display panels to transmit light polarized in a first direction, and reflect light polarized in a second direction substantially perpendicular to the first direction. The backlight unit is arranged proximate to the second display panel to supply light to the first and second display panels. The first display panel displays an image by using reflected ambient light, and the second display panel displays an image by using light from the backlight unit.

Abstract: A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.

Abstract: A random copolymer having a structure represented by the following Formula 1: wherein R is phosphonic acid, Me is a methyl group, x is a number of styrene units, and y is a number of methyl methacrylate units.

Abstract: A random copolymer having a structure represented by the following Formula 1: wherein R is phosphonic acid, Me is a methyl group, x is a number of styrene units, and y is a number of methyl methacrylate units.

Abstract: A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.

Abstract: A display apparatus includes a first display panel with a plurality of first pixels, a second display panel facing the first display panel and having a plurality of second pixels, a light reflective polarizer, and a backlight unit. The light reflective polarizer is interposed between the first and second display panels to transmit light polarized in a first direction, and reflect light polarized in a second direction substantially perpendicular to the first direction. The backlight unit is arranged proximate to the second display panel to supply light to the first and second display panels. The first display panel displays an image by using reflected ambient light, and the second display panel displays an image by using light from the backlight unit.