Patents by Inventor Eun Beom JEON

Eun Beom JEON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • APPARATUS AND METHOD FOR REDUCING RESIDUAL STRESS OF SEMICONDUCTOR
    Publication number: 20140193984
    Abstract: An apparatus for reducing residual stress of a semiconductor includes a stage configured to support a semiconductor wafer having the residual stress generated by a semiconductor manufacturing process. The apparatus includes an intense pulsed light (IPL) irradiation unit configured to irradiate IPL to the semiconductor wafer to reduce the residual stress of the semiconductor wafer, the IPL radiation unit being separated from the stage. The apparatus further includes at least one alignment unit configured to adjust relative positions of the stage and the IPL irradiation unit.
    Type: Application
    Filed: December 30, 2013
    Publication date: July 10, 2014
    Applicants: Industry-University Cooperation Foundation Hanyang University, SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jae Dong PARK, Hak Sung KIM, Jeong Sam LEE, Eun Beom JEON, Ho-Tae JIN