Patents by Inventor Eun-Bi PARK

Eun-Bi PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10007028
    Abstract: A photosensitive resin composition includes (A) a binder resin including an epoxy resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant including a dye represented by the following Chemical Formula 1, wherein in the above Chemical Formula 1, each substituent is the same as defined in the detailed description; and (E) a solvent.
    Type: Grant
    Filed: January 9, 2015
    Date of Patent: June 26, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Se-Young Choi, Jae-Young Kwon, Eun-Bi Park, Jung-Sun Lee, Chang-Ryul Lee, Ju-Ho Jung, Mi-Jin Choi, Seung-Jib Choi, Kyung-Hee Hyung
  • Patent number: 9482943
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Grant
    Filed: May 21, 2014
    Date of Patent: November 1, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Soo Kim, Yong-Tae Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Jae-Hwan Song, Eun-Kyoung Youn, Bum-Jin Lee, Jong-Hwa Lee, Jin-Young Lee, Chung-Beum Hong, Eun-Ha Hwang, In-Chul Hwang
  • Patent number: 9405188
    Abstract: Disclosed is a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a cross-linking agent; (D) a thermal acid generator; (E) a phenol compound; and (F) an organic solvent, wherein the cross-linking agent and thermal acid generator are included in a weight ratio of about 1:50 to about 50:1.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: August 2, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jong-Hwa Lee, Ji-Yun Kwon, Sang-Soo Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Bum-Jin Lee, Sang-Haeng Lee, Eun-Ha Hwang
  • Patent number: 9323147
    Abstract: Disclosed are a photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a phenol compound; (D) a thermal acid generator; and (E) a solvent, wherein the solvent includes an organic solvent having a boiling point of less than about 160° C. under an atmospheric pressure and an organic solvent having a boiling point of greater than or equal to about 160° C. under an atmospheric pressure, wherein the organic solvent having a boiling point of less than about 160° C. is included in an amount of greater than or equal to about 90 wt % and less than about 100 wt % based on the total amount of the solvent, and the organic solvent having a boiling point of greater than or equal to about 160° C. is included in an amount of greater than about 0 wt % and less than or equal to about 10 wt % based on the total amount of the solvent, a photosensitive resin film using the same, and a display device.
    Type: Grant
    Filed: July 29, 2014
    Date of Patent: April 26, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Jong-Hwa Lee, Ji-Yun Kwon, Sang-Soo Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Yeol Baek, Bum-Jin Lee, Sang-Haeng Lee, Eun-Ha Hwang
  • Publication number: 20150331316
    Abstract: A photosensitive resin composition includes (A) a binder resin including an epoxy resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant including a dye represented by the following Chemical Formula 1, wherein in the above Chemical Formula 1, each substituent is the same as defined in the detailed description; and (E) a solvent.
    Type: Application
    Filed: January 9, 2015
    Publication date: November 19, 2015
    Inventors: Se-Young CHOI, Jae-Young KWON, Eun-Bi PARK, Jung-Sun LEE, Chang-Ryul LEE, Ju-Ho JUNG, Mi-Jin CHOI, Seung-Jib CHOI, Kyung-Hee HYUNG
  • Publication number: 20150177617
    Abstract: Disclosed is a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a cross-linking agent; (D) a thermal acid generator; (E) a phenol compound; and (F) an organic solvent, wherein the cross-linking agent and thermal acid generator are included in a weight ratio of about 1:50 to about 50:1.
    Type: Application
    Filed: July 29, 2014
    Publication date: June 25, 2015
    Inventors: Jong-Hwa LEE, Ji-Yun KWON, Sang-Soo KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Bum-Jin LEE, Sang-Haeng LEE, Eun-Ha HWANG
  • Publication number: 20150168835
    Abstract: Disclosed are a photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a phenol compound; (D) a thermal acid generator; and (E) a solvent, wherein the solvent includes an organic solvent having a boiling point of less than about 160° C. under an atmospheric pressure and an organic solvent having a boiling point of greater than or equal to about 160° C. under an atmospheric pressure, wherein the organic solvent having a boiling point of less than about 160° C. is included in an amount of greater than or equal to about 90 wt % and less than about 100 wt % based on the total amount of the solvent, and the organic solvent having a boiling point of greater than or equal to about 160° C. is included in an amount of greater than about 0 wt % and less than or equal to about 10 wt % based on the total amount of the solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: July 29, 2014
    Publication date: June 18, 2015
    Inventors: Jong-Hwa LEE, Ji-Yun KWON, Sang-Soo KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Bum-Jin LEE, Sang-Haeng LEE, Eun-Ha HWANG
  • Publication number: 20150118622
    Abstract: Disclosed are a positive photosensitive resin composition including (A) a polybenzoxazole precursor having a polydispersity of about 1 to about 1.6; (B) a photosensitive diazoquinone compound; (C) a thermal acid generator; and (D) a solvent, a photosensitive resin film using the same, and a display device.
    Type: Application
    Filed: May 22, 2014
    Publication date: April 30, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Jin-Hee KANG, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Patent number: 8987342
    Abstract: A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400 nm; and (D) a solvent. An insulating film and a display device can include the photosensitive resin composition.
    Type: Grant
    Filed: August 8, 2013
    Date of Patent: March 24, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Soo Kim, Yong-Tae Kim, Kun-Bae Noh, Eun-Bi Park, Jae-Hwan Song, Eun-Kyoung Youn, Jong-Hwa Lee, Jin-Young Lee, Chung-Beum Hong, Eun-Ha Hwang, In-Chul Hwang
  • Publication number: 20150050594
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin; (B) a photosensitive diazoquinone compound; (C) a first dissolution-controlling agent including at least one of compounds represented by the following Chemical Formula 1 or Chemical Formula 2; (D) a second dissolution-controlling agent including a compound represented by the following Chemical Formula 3; and (E) a solvent, and a photosensitive resin film and a display device using the same.
    Type: Application
    Filed: May 21, 2014
    Publication date: February 19, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Yeol BAEK, Jae-Hwan SONG, Eun-Kyoung YOUN, Bum-Jin LEE, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG
  • Publication number: 20140186768
    Abstract: A photosensitive resin composition for an insulating film of a display device includes (A) an alkali soluble resin including a polybenzoxazole precursor, polyamic acid, polyimide, or a combination thereof; (B) a photosensitive diazoquinone compound; (C) an ultraviolet (UV) absorber having a maximum absorption wavelength of about 300 to about 400 nm; and (D) a solvent. An insulating film and a display device can include the photosensitive resin composition.
    Type: Application
    Filed: August 8, 2013
    Publication date: July 3, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Soo KIM, Yong-Tae KIM, Kun-Bae NOH, Eun-Bi PARK, Jae-Hwan SONG, Eun-Kyoung YOUN, Jong-Hwa LEE, Jin-Young LEE, Chung-Beum HONG, Eun-Ha HWANG, In-Chul HWANG