Patents by Inventor Eun-Ha Hu

Eun-Ha Hu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer for photosensitive resin composition and method for making the same
    Patent number: 6160062
    Abstract: A PDMA polymer for a photosensitive resin composition. The PDMA polymer is obtained by polymerizing an acrylamide, N,N-dimetylacrylamide monomer, and a vinyl-type silane. The PDMA polymer having a molecular weight of 1,000,000.about.
    Type: Grant
    Filed: January 13, 1999
    Date of Patent: December 12, 2000
    Assignee: Samsung Display Devices Co., Ltd.
    Inventors: Chang-wook Kim, Eak-Cheol Eam, Seung-Jun You, Eun-Ha Hu, Gi-Wook Kang