Patents by Inventor Eun Hee Hong

Eun Hee Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11982705
    Abstract: A substrate analysis apparatus is provided. The substrate analysis includes: an interlayer conveying module configured to transport a first FOUP; an exchange module which is connected to the interlayer conveying module, and configured to transfer a wafer from the first FOUP to a second FOUP; a pre-processing module configured to form a test wafer piece using the wafer inside the second FOUP; an analysis module configured to analyze the test wafer piece; and a transfer rail configured to transport the second FOUP containing the wafer and a tray containing the test wafer piece. The wafer includes a first identifier indicating information corresponding to the wafer, the test wafer piece includes a second identifier indicating information generated by the pre-processing module which corresponds to the test wafer piece, and the analysis module is configured to analyze the first identifier and the second identifier in connection with each other.
    Type: Grant
    Filed: March 9, 2022
    Date of Patent: May 14, 2024
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Youn Gon Oh, Ji Hun Kim, Sae Yun Ko, Gil Ho Gu, Dong Su Kim, Eun Hee Lee, Ho Chan Lee, Seong Sil Jeong, Seong Pyo Hong
  • Patent number: 11923145
    Abstract: A multilayer capacitor includes a body including a multilayer structure in which a plurality of dielectric layers are stacked in a first direction and a plurality of internal electrodes stacked with the dielectric layer interposed therebetween and external electrodes formed outside the body and connected to the internal electrodes. The body includes an active portion and a side margin portion covering the active portion and opposing each other in a second direction, and 1<A2/M1?1.5 and A2<A1 in which A1 is an average grain size of the dielectric layers in a central region of the active portion, A2 is an average grain size of the dielectric layers at an active boundary part of the active portion adjacent to the side margin portion, and M1 is an average grain size of the dielectric layers in a central region of the side margin portion.
    Type: Grant
    Filed: September 2, 2021
    Date of Patent: March 5, 2024
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Je Hee Lee, Seung In Baik, Ji Su Hong, Eun Ha Jang, Hyoung Uk Kim, Jae Sung Park
  • Publication number: 20240034646
    Abstract: Provided is a UV reaction apparatus for treating waste liquid caused by system decontamination in a nuclear power plant. The UV reaction apparatus comprises a UV irradiation unit for irradiating UV light as a bar-shaped body; and a transit unit accommodating the UV irradiation unit therein, and for passing organic waste liquid to be irradiated with the UV light, wherein the transit unit comprises, an input unit, into which the organic waste liquid is input a discharge unit, through which the organic waste liquid is discharged, and an intermediate unit located between the input unit and the discharge unit, and in which the UV irradiation unit is located.
    Type: Application
    Filed: March 4, 2022
    Publication date: February 1, 2024
    Applicant: KOREA HYDRO & NUCLEAR POWER CO., LTD
    Inventors: Cho Rong KIM, Hak Soo KIM, Jeong Ju KIM, Sang Ho LEE, Eun Hee HONG, Ji Eun PARK, Ka Hee JEONG
  • Patent number: 10301596
    Abstract: The present invention relates to a method for inhibiting an inflammatory response in chondrocytes, and dedifferentiation or destruction of chondrocytes by irradiating damaged chondrocytes with low-dose radiation, and a method of treating a disease of cartilage by irradiating damaged chondrocytes with low-dose radiation.
    Type: Grant
    Filed: December 24, 2014
    Date of Patent: May 28, 2019
    Assignee: KOREA INSTITUTE OF RADIOLOGICAL & MEDICAL SCIENCES
    Inventors: Sang Gu Hwang, Eun Hee Hong
  • Publication number: 20160362660
    Abstract: The present invention relates to a method for inhibiting an inflammatory response in chondrocytes, and dedifferentiation or destruction of chondrocytes by irradiating damaged chondrocytes with low-dose radiation, and a method of treating a disease of cartilage by irradiating damaged chondrocytes with low-dose radiation.
    Type: Application
    Filed: December 24, 2014
    Publication date: December 15, 2016
    Inventors: Sang Gu Hwang, Eun Hee Hong