Patents by Inventor Eun-Kyoung Jung

Eun-Kyoung Jung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100121791
    Abstract: The present invention relates to the system, method and program for the pharmacokinetic parameter prediction of peptide sequence by the mathematical model. The present invention is comprising the steps of acquiring a variety of peptide sequence having specific features by the experimental technique; acquiring, on the basis of the sequence, a variety of peptide sequences lacking the specific features; storing the acquired peptide sequences as each set respectively, followed by randomly extracting peptide sequences in the constant ratio to divide into a training set and a test set of mathematical model; allowing individual peptide sequence descriptor values and an activity value; training the set of training peptide by mathematical model; predicting pharmacokinetic parameter of the set of test peptide by the trained mathematical model; and validating the trained mathematical model.
    Type: Application
    Filed: May 28, 2007
    Publication date: May 13, 2010
    Applicant: INSILICOTECH CO., LTD.
    Inventors: Sang-Kee Kang, Min-Kyung Kim, Min-Kook Kim, Jun-Hyoung Kim, Jae-Min Shin, Cheol-Heui Yun, Ho-Kyoung Rhee, Dong-Hyun Jung, Eun-Kyoung Jung, Seung-Hoon Choi, Yun-Jaie Choi, Jin-Huk Choi
  • Patent number: 7355176
    Abstract: A method of forming a protection layer on a specimen for TEM inspection and a method of forming a specimen for TEM inspection are provided. The method of forming a protection layer on a specimen for TEM inspection generally comprises coating a wafer slice comprising an inspection point with a protection material and compressing the protection material to the wafer slice. The method of forming a specimen for TEM inspection generally comprises cutting a wafer slice comprising an inspection point from a wafer, forming a protection layer on the wafer slice, forming a first preliminary specimen by cutting the wafer slice, forming a second preliminary specimen by grinding the first preliminary specimen, and forming a TEM specimen by etching portions of the second preliminary specimen.
    Type: Grant
    Filed: September 8, 2005
    Date of Patent: April 8, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hang-Ja Kim, Eun-Kyoung Jung
  • Publication number: 20060054820
    Abstract: A method of forming a protection layer on a specimen for TEM inspection and a method of forming a specimen for TEM inspection are provided. The method of forming a protection layer on a specimen for TEM inspection generally comprises coating a wafer slice comprising an inspection point with a protection material and compressing the protection material to the wafer slice. The method of forming a specimen for TEM inspection generally comprises cutting a wafer slice comprising an inspection point from a wafer, forming a protection layer on the wafer slice, forming a first preliminary specimen by cutting the wafer slice, forming a second preliminary specimen by grinding the first preliminary specimen, and forming a TEM specimen by etching portions of the second preliminary specimen.
    Type: Application
    Filed: September 8, 2005
    Publication date: March 16, 2006
    Inventors: Hang-Ja Kim, Eun-Kyoung Jung