Patents by Inventor Eun Kyu Her

Eun Kyu Her has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11892662
    Abstract: A diffraction light guide plate, including: a first diffraction substrate; and a second diffraction substrate provided on the first diffraction substrate. The first diffraction substrate includes a first diffraction grating layer on one surface and a second diffraction grating layer on an opposite surface. The second diffraction substrate includes a third diffraction grating layer on one surface and a stress compensation layer on an opposite surface. The first diffraction grating layer separates light having a wavelength of 550 nm or more and 700 nm or less, the second diffraction grating layer separates light having a wavelength of 400 nm or more and 550 nm or less, the third diffraction grating layer separates light having a wavelength of 450 nm or more and 650 nm or less, and the stress compensation layer has stress in the same direction as a direction of stress of the third diffraction grating layer.
    Type: Grant
    Filed: October 23, 2018
    Date of Patent: February 6, 2024
    Assignee: LG CHEM LTD.
    Inventors: Jung Hwan Yoon, Bu Gon Shin, Jeong Ho Park, Eun Kyu Her, So Young Choo
  • Patent number: 11680311
    Abstract: The present invention relates to a method for forming an amorphous layer on one surface of a second substrate through a simple method of performing laser irradiation on a multilayered metal layer provided on a first substrate.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: June 20, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Jung Hwan Yoon, Bu Gon Shin, Jeong Ho Park, Eun Kyu Her, So Young Choo, Yeon Jae Yoo
  • Patent number: 11656390
    Abstract: A method of manufacturing a module having multiple pattern areas, a module having multiple pattern areas according to the method, and a method of manufacturing a diffraction grating module or a mold for a diffraction grating module. The method of manufacturing a module having multiple pattern areas comprises: disposing a first substrate having a first pattern on a first base substrate; forming a first cutting line on the first substrate; forming a second cutting line on the first substrate; removing any one of a first area defined by the first cutting line and a second area defined by the second cutting line from the first substrate to form a removed area on the first substrate; disposing a second base substrate having a second pattern different from the first pattern in the removed area; and removing the first substrate from the base substrate without removing the first and second areas.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: May 23, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Jeong Ho Park, Bu Gon Shin, Eun Kyu Her, Jung Hwan Yoon, So Young Choo
  • Patent number: 11614567
    Abstract: The present invention relates to a low refractive layer and an anti-reflective film comprising the same. The low refractive layer can exhibit excellent optical properties such as a low reflectance and a high light transmittance, and excellent mechanical properties such as high wear resistance and scratch resistance at the same time, without adversely affecting the color of the polymer resin forming the low refractive layer. In particular, due to the excellent alkali resistance, the low refractive layer can maintain excellent physical properties even after alkali treatment. Therefore, when introducing a low refractive layer to the display device, it is expected that the production process can be simplified and further the production rate and the productivity can significantly increase.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: March 28, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Boo Kyung Kim, Yeong Rae Chang, Seok Hoon Jang, Eun Kyu Her, Jin Seok Byun
  • Patent number: 11567247
    Abstract: A plasma etching method using a Faraday cage, which effectively produces a blazed grating pattern.
    Type: Grant
    Filed: November 4, 2019
    Date of Patent: January 31, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Eun Kyu Her, Jeong Ho Park, Seong Min Park, Sang Choll Han, Bu Gon Shin
  • Patent number: 11462393
    Abstract: A plasma etching method using a Faraday cage, including: providing an etch substrate in a Faraday cage, where the etch substrate includes a metal mask provided on one surface thereof, and where an upper surface of the Faraday cage is provided with a mesh portion; a first patterning step of forming a first pattern area on the etch substrate; and a second patterning step of forming a second pattern area on the etch substrate after shielding at least a part of the mesh portion with a shutter. The first pattern area includes a first groove pattern having a depth gradient of 0 to 40 nm per 5 mm, and the second pattern area includes a second groove pattern having a depth gradient of 50 to 300 nm per 5 mm.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: October 4, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Eun Kyu Her, Song Ho Jang, Chung Wan Kim, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Patent number: 11428992
    Abstract: A method for manufacturing a liquid crystal aligning film includes preparing a multilayer structure in which a substrate, a conductive layer, a liquid crystal alignment layer, and a passivation film are sequentially provided, etching one area of the liquid crystal alignment layer by irradiating a pulse laser to the multilayer structure, and exposing one area of the conductive layer by removing the passivation film, wherein the pulse laser is irradiated to the liquid crystal alignment layer from the passivation film. The method is compatible with a continuous process.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: August 30, 2022
    Inventors: Jeong Ho Park, Bu Gon Shin, Eun Kyu Her
  • Patent number: 11413794
    Abstract: The present invention relates to a method for preparing spherical cured polymer particles from a curable composition. The method comprises the steps of: dropping a curable composition onto a substrate having a water contact angle of 150° to 170° at 25° C. to form droplets of the curable composition; and curing the droplets to form the polymer particles.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: August 16, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Eun Kyu Her, Chang Sun Han, Bu Gon Shin, Jeong Ho Park, Soo Jin Lee, Taebin Ahn
  • Patent number: 11348799
    Abstract: The present invention relates to a method of manufacturing a mold for a diffraction grating light guide plate by using two mask films, the mold having first to fourth pattern portions provided on one surface thereof, and to a method of manufacturing a diffraction grating light guide plate.
    Type: Grant
    Filed: June 18, 2019
    Date of Patent: May 31, 2022
    Assignee: LG CHEM, LTD
    Inventors: Eun Kyu Her, Song Ho Jang, Chung Wan Kim, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Patent number: 11331869
    Abstract: The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: May 17, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Eun Kyu Her, Chung Wan Kim, Song Ho Jang, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Patent number: 11276561
    Abstract: A plasma etching method using a Faraday cage, comprising: providing a Faraday cage having a mesh portion on an upper surface thereof in a plasma etching apparatus; providing a quartz substrate having a metal mask with an opening provided on one surface of the metal mask in the Faraday cage; and patterning the quartz substrate with plasma etching.
    Type: Grant
    Filed: October 19, 2018
    Date of Patent: March 15, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Eun Kyu Her, Chung Wan Kim, Song Ho Jang, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Publication number: 20210311229
    Abstract: A plasma etching method using a Faraday cage, which effectively produces a blazed grating pattern.
    Type: Application
    Filed: November 4, 2019
    Publication date: October 7, 2021
    Inventors: Eun Kyu Her, Jeong Ho Park, Seong Min Park, Sang Choll Han, Bu Gon Shin
  • Publication number: 20210284808
    Abstract: The present invention relates to a method for preparing spherical cured polymer particles from a curable composition. The method comprises the steps of: dropping a curable composition onto a substrate having a water contact angle of 150° to 170° at 25° C. to form droplets of the curable composition; and curing the droplets to form the polymer particles.
    Type: Application
    Filed: December 5, 2017
    Publication date: September 16, 2021
    Inventors: Eun Kyu HER, Chang Sun HAN, Bu Gon SHIN, Jeong Ho PARK, AHN, Taebin AHN, Taebin AHN
  • Publication number: 20210063619
    Abstract: A smaller and lighter diffraction light guide plate, and a method of manufacturing the same.
    Type: Application
    Filed: September 12, 2018
    Publication date: March 4, 2021
    Inventors: Jung Hwan YOON, Bu Gon SHIN, Jeong Ho PARK, Eun Kyu HER, So Young CHOO
  • Publication number: 20200408969
    Abstract: A diffraction light guide plate, including: a first diffraction substrate; and a second diffraction substrate provided on the first diffraction substrate. The first diffraction substrate includes a first diffraction grating layer on one surface and a second diffraction grating layer on an opposite surface. The second diffraction substrate includes a third diffraction grating layer on one surface and a stress compensation layer on an opposite surface. The first diffraction grating layer separates light having a wavelength of 550 nm or more and 700 nm or less, the second diffraction grating layer separates light having a wavelength of 400 nm or more and 550 nm or less, the third diffraction grating layer separates light having a wavelength of 450 nm or more and 650 nm or less, and the stress compensation layer has stress in the same direction as a direction of stress of the third diffraction grating layer.
    Type: Application
    Filed: October 23, 2018
    Publication date: December 31, 2020
    Inventors: Jung Hwan Yoon, Bu Gon Shin, Jeong Ho Park, Eun Kyu Her, So Young Choo
  • Patent number: 10859875
    Abstract: Disclosed are a method for forming a pattern for liquid crystal orientation of a zenithal bi-stable liquid crystal panel, a liquid crystal orientation substrate including the pattern formed thereby, and a mask substrate used for forming the pattern.
    Type: Grant
    Filed: February 13, 2018
    Date of Patent: December 8, 2020
    Assignee: LG CHEM, LTD.
    Inventors: So Young Choo, Jin Soo Lee, Eun Kyu Her, Bu Gon Shin
  • Publication number: 20200368981
    Abstract: The present invention relates to a method of manufacturing a mold substrate for a diffraction lattice light guide plate, and a method of manufacturing a diffraction lattice light guide plate.
    Type: Application
    Filed: August 16, 2018
    Publication date: November 26, 2020
    Inventors: Eun Kyu HER, Chung Wan KIM, Song Ho JANG, Bu Gon SHIN, Jeong Ho PARK, Jung Hwan YOON, So Young CHOO
  • Publication number: 20200370164
    Abstract: The present invention relates to a method for forming an amorphous layer on one surface of a second substrate through a simple method of performing laser irradiation on a multilayered metal layer provided on a first substrate.
    Type: Application
    Filed: June 11, 2019
    Publication date: November 26, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Jung Hwan YOON, Bu Gon SHIN, Jeong Ho PARK, Eun Kyu HER, So Young CHOO, Yeon Jae YOO
  • Publication number: 20200365379
    Abstract: A plasma etching method using a Faraday cage, including: providing an etch substrate in a Faraday cage, where the etch substrate includes a metal mask provided on one surface thereof, and where an upper surface of the Faraday cage is provided with a mesh portion; a first patterning step of forming a first pattern area on the etch substrate; and a second patterning step of forming a second pattern area on the eth substrate after shielding at least a part of the mesh portion with a shutter. The first pattern area includes a first groove pattern having a depth gradient of 0 to 40 nm per 5 mm, and the second pattern area includes a second groove pattern having a depth gradient of 50 to 300 nm per 5 mm.
    Type: Application
    Filed: December 14, 2018
    Publication date: November 19, 2020
    Inventors: Eun Kyu Her, Song Ho Jang, Chung Wan Kim, Bu Gon Shin, Jeong Ho Park, Jung Hwan Yoon, So Young Choo
  • Publication number: 20200335347
    Abstract: The present invention relates to a method of manufacturing a mold for a diffraction grating light guide plate by using two mask films, the mold having first to fourth pattern portions provided on one surface thereof, and to a method of manufacturing a diffraction grating light guide plate.
    Type: Application
    Filed: June 18, 2019
    Publication date: October 22, 2020
    Inventors: Eun Kyu HER, Song Ho JANG, Chung Wan KIM, Bu Gon SHIN, Jeong Ho PARK, Jung Hwan YOON, So Young CHOO