Patents by Inventor Eun-Kyung Son

Eun-Kyung Son has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same
    Patent number: 7419761
    Abstract: A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB (Post Exposure Baking) temperature sensitivity.
    Type: Grant
    Filed: September 15, 2005
    Date of Patent: September 2, 2008
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Jae-Woo Lee, Jung-Youl Lee, Deog-Bae Kim, Jae-Hyun Kim, Eun-Kyung Son
  • Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same
    Patent number: 7344820
    Abstract: The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: March 18, 2008
    Assignee: DongJin Semichem Co., Ltd.
    Inventors: Eun-Kyung Son, Jae-Hyun Kang, Deog-Bae Kim, Jae-Hyun Kim
  • Photoresist monomer having spiro cyclic ketal goup, polymer thereof and photoresit composition including the same
    Publication number: 20060057494
    Abstract: A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB(Post Exposure Baking) temperature sensitivity.
    Type: Application
    Filed: September 15, 2005
    Publication date: March 16, 2006
    Inventors: Jae-Woo Lee, Jung-Youl Lee, Deog-Bae Kim, Jae-Hyun Kim, Eun-Kyung Son
  • Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same
    Publication number: 20060019192
    Abstract: The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.
    Type: Application
    Filed: November 19, 2002
    Publication date: January 26, 2006
    Inventors: Eun-Kyung SON, Jae-Hyun Kang, Deog-Bae Kim, Jae-Hyun Kim