Patents by Inventor Eun-Kyung Son

Eun-Kyung Son has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240150337
    Abstract: The present invention relates to a 6-(isooxazolidin-2-yl)-N-phenylpyrimidin-4-amine derivative, and a pharmaceutical composition for preventing or treating cancer comprising the compound as an effective component. The compound exhibits high inhibitory activity against an epidermal growth factor receptor (EGFR) variant, or wild-type or variants of one or more of ERBB2 and ERBB4, and thus may be usefully used in the treatment of cancers in which same are expressed. In particular, the compound exhibits excellent inhibitory activity on proliferation of lung cancer cell lines, and thus can be usefully used in the treatment of lung cancer.
    Type: Application
    Filed: September 25, 2023
    Publication date: May 9, 2024
    Inventors: Youn Ho LEE, Ju Hee Kang, Se In Kang, Yi Kyung Ko, Eun Hwa Ko, Hwan Geun Choi, Jung Beom Son, Nam Doo Kim
  • Patent number: 11951130
    Abstract: The present invention relates to an antigen-binding molecule comprising a heavy chain variable region comprising a heavy-chain complementarity-determining region 1 (HCDR1) comprising an amino acid sequence represented by Sequence No. 1, an HCDR2 comprising an amino acid sequence represented by Sequence No. 2, and an HCDR3 comprising an amino acid sequence represented by Sequence No. 3; a light-chain variable region comprising a light-chain complementarity-determining region 1 (LCDR1) comprising an amino acid sequence represented by Sequence No. 4, an LCDR2 comprising an amino acid sequence represented by Sequence No. 5, and an LCDR3 comprising an amino acid sequence represented by Sequence No. 6; wherein the antigen-binding molecule is a T cell receptor (TCR); and to a cell line expressing the same.
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: April 9, 2024
    Assignee: Eutilex Co., Ltd.
    Inventors: Byoung S. Kwon, Young Ho Kim, Kwang Hee Kim, Ji Won Chung, Young Gyoon Chang, Bo Rim Yi, Jung Yun Lee, Seung Hyun Lee, Sun Woo Im, Jin Kyung Choi, Hyun Tae Son, Eun Hye Yoo
  • Patent number: 7419761
    Abstract: A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB (Post Exposure Baking) temperature sensitivity.
    Type: Grant
    Filed: September 15, 2005
    Date of Patent: September 2, 2008
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Jae-Woo Lee, Jung-Youl Lee, Deog-Bae Kim, Jae-Hyun Kim, Eun-Kyung Son
  • Patent number: 7344820
    Abstract: The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: March 18, 2008
    Assignee: DongJin Semichem Co., Ltd.
    Inventors: Eun-Kyung Son, Jae-Hyun Kang, Deog-Bae Kim, Jae-Hyun Kim
  • Publication number: 20060057494
    Abstract: A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB(Post Exposure Baking) temperature sensitivity.
    Type: Application
    Filed: September 15, 2005
    Publication date: March 16, 2006
    Inventors: Jae-Woo Lee, Jung-Youl Lee, Deog-Bae Kim, Jae-Hyun Kim, Eun-Kyung Son
  • Publication number: 20060019192
    Abstract: The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.
    Type: Application
    Filed: November 19, 2002
    Publication date: January 26, 2006
    Inventors: Eun-Kyung SON, Jae-Hyun Kang, Deog-Bae Kim, Jae-Hyun Kim