Patents by Inventor Eun Sol Choi

Eun Sol Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11942018
    Abstract: A display device is described including a display panel for displaying an image and an input sensing unit disposed on the display panel for sensing a user input. The input sensing unit includes: an electrode unit including first electrodes and second electrodes which intersect each other and a control unit for determining the proximity of an object or the shape of the object, based on capacitance change values of the first electrodes and the second electrodes. In a first mode the input sensing unit is driven using a self-capacitance method. The control unit may merge the capacitance change values, and determine the proximity of the object based on the merged value. In a second mode based on mutual capacitance, the control unit may determine the shape of the object.
    Type: Grant
    Filed: October 4, 2022
    Date of Patent: March 26, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jae Woo Choi, Tae Joon Kim, Eun Sol Seo, Hyun Wook Cho
  • Publication number: 20240070492
    Abstract: Disclosed herein are a reasoning method based on a structural attention mechanism for knowledge-based question answering and a computing apparatus for performing the reasoning method. The reasoning method includes: recognizing one or more entities in a query including content and a question, and linking the recognized entities to a knowledge base; constructing a question hypergraph and a query-aware knowledge hypergraph by performing a multi-hop graph walk on a question graph and the knowledge base; and inferring a correct answer to the question by applying as attention mechanism to a query hyperedge and a knowledge hyperedge included in the question hypergraph and the query-aware knowledge hypergraph, respectively.
    Type: Application
    Filed: December 16, 2022
    Publication date: February 29, 2024
    Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION
    Inventors: Byoung-Tak ZHANG, Yu-Jung HEO, Eun-Sol KIM, Woo Suk CHOI
  • Patent number: 10573633
    Abstract: A semiconductor device includes a first overlay group and a second overlay group disposed on a semiconductor substrate. The first overlay group includes first lower overlay patterns which extend in a first direction, first upper overlay patterns overlapping the first lower overlay patterns, and first via overlay patterns interposed between the first lower overlay patterns and the first upper overlay patterns. The second overlay group includes second lower overlay patterns which extend in a second direction, second upper overlay patterns overlapping the second lower overlay patterns, and second via overlay patterns interposed between the second lower overlay patterns and the second upper overlay patterns. The second lower overlay patterns include end portions adjacent to and spaced apart from the first overlay group.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: February 25, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae Sun Kim, Hyun Jae Kang, Tae Hoi Park, Jin Seong Lee, Eun Sol Choi, Min Keun Kwak, Byung Kap Kim, Sung Won Choi
  • Publication number: 20180175016
    Abstract: A semiconductor device includes a first overlay group and a second overlay group disposed on a semiconductor substrate. The first overlay group includes first lower overlay patterns which extend in a first direction, first upper overlay patterns overlapping the first lower overlay patterns, and first via overlay patterns interposed between the first lower overlay patterns and the first upper overlay patterns. The second overlay group includes second lower overlay patterns which extend in a second direction, second upper overlay patterns overlapping the second lower overlay patterns, and second via overlay patterns interposed between the second lower overlay patterns and the second upper overlay patterns. The second lower overlay patterns include end portions adjacent to and spaced apart from the first overlay group.
    Type: Application
    Filed: December 4, 2017
    Publication date: June 21, 2018
    Inventors: Tae Sun Kim, Hyun Jae Kang, Tae Hoi Park, Jin Seong Lee, Eun Sol Choi, Min Keun Kwak, Byung Kap Kim, Sung Won Choi