Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component including a polymeric compound containing a structural unit having an acid decomposable group, the amount of the structural unit having an acid decomposable group, based on the combined total of all structural units contained in the base component being 51 mol % to 59 mol %, and the structural unit having an acid decomposable group includes a structural unit represented by general formula (a1-1) shown below (in which R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Z represents a single bond or an alkyl group; and Cp is a group represented by general formula (Cp-1) shown below).

Abstract: A resist composition including a base material component whose solubility in a developing solution is changed due to an action of an acid, an acid generator component which generates an acid upon light exposure, an acid diffusion control agent component, and a vinyl group-containing compound represented by Formula (e-1), in which the base material component has a mass average molecular weight of 8000 to 18000, and the resist composition has a solid content concentration of 25% by mass or greater (in the formulae, R27 represents a linear or branched alkylene group having 1 to 10 carbon atoms or a group represented by Formula (e-2), each R28?s independently represent a linear or branched alkylene group having 1 to 10 carbon atoms, the alkylene group may have an ether bond in a main chain, and each c's independently represent 0 or 1)

Abstract: A thick film photoresist composition for forming a thick film photoresist layer on a support, the photoresist composition including: a resin which exhibits changed solubility in a developing solution by the action of acid, an acid generator which generates acid by exposure, an additive, and a solvent, the additive including a compound having at least one polar group selected from the group consisting of a hydroxy group, an amino group, a mercapto group, a carboxy group and a sulfonic acid group, and the amount of the additive, relative to 100 parts by weight of the solvent being 5 to 30 parts by weight.

Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component including a polymeric compound containing a structural unit having an acid decomposable group, the amount of the structural unit having an acid decomposable group, based on the combined total of all structural units contained in the base component being 51 mol % to 59 mol %, and the structural unit having an acid decomposable group includes a structural unit represented by general formula (a1-1) shown below (in which R represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Z represents a single bond or an alkyl group; and Cp is a group represented by general formula (Cp-1) shown below).