Patents by Inventor Eun Sol Kim
Eun Sol Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250147499Abstract: A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.Type: ApplicationFiled: November 25, 2024Publication date: May 8, 2025Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Andrew Sundstrom, Damas Limoge, Vadim Pinskiy, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Publication number: 20250104274Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: ApplicationFiled: December 9, 2024Publication date: March 27, 2025Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Publication number: 20250093853Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: ApplicationFiled: November 25, 2024Publication date: March 20, 2025Applicant: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Damas Limoge, Eun-Sol Kim, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12165353Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: March 9, 2021Date of Patent: December 10, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Patent number: 12153414Abstract: A computing system identifies a trajectory example generated by a human operator. The trajectory example includes trajectory information of the human operator while performing a task to be learned by a control system of the computing system. Based on the trajectory example, the computing system trains the control system to perform the task exemplified in the trajectory example. Training the control system includes generating an output trajectory of a robot performing the task. The computing system identifies an updated trajectory example generated by the human operator based on the trajectory example and the output trajectory of the robot performing the task. Based on the updated trajectory example, the computing system continues to train the control system to perform the task exemplified in the updated trajectory example.Type: GrantFiled: February 25, 2022Date of Patent: November 26, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Andrew Sundstrom, Damas Limoge, Vadim Pinskiy, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Patent number: 12153401Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: November 6, 2020Date of Patent: November 26, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Damas Limoge, Eun-Sol Kim, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12153408Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: June 18, 2021Date of Patent: November 26, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Eun-Sol Kim, Damas Limoge, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12140926Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.Type: GrantFiled: July 17, 2023Date of Patent: November 12, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
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Patent number: 12125236Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: March 9, 2021Date of Patent: October 22, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Patent number: 12117799Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: November 6, 2020Date of Patent: October 15, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Damas Limoge, Eun-Sol Kim, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12117812Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: June 18, 2021Date of Patent: October 15, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Eun-Sol Kim, Damas Limoge, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12073584Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: March 9, 2021Date of Patent: August 27, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Patent number: 12066818Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: June 18, 2021Date of Patent: August 20, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Andrew Sundstrom, Eun-Sol Kim, Damas Limoge, Vadim Pinskiy, Matthew C. Putman
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Patent number: 12039750Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: March 9, 2021Date of Patent: July 16, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Publication number: 20240070492Abstract: Disclosed herein are a reasoning method based on a structural attention mechanism for knowledge-based question answering and a computing apparatus for performing the reasoning method. The reasoning method includes: recognizing one or more entities in a query including content and a question, and linking the recognized entities to a knowledge base; constructing a question hypergraph and a query-aware knowledge hypergraph by performing a multi-hop graph walk on a question graph and the knowledge base; and inferring a correct answer to the question by applying as attention mechanism to a query hyperedge and a knowledge hyperedge included in the question hypergraph and the query-aware knowledge hypergraph, respectively.Type: ApplicationFiled: December 16, 2022Publication date: February 29, 2024Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATIONInventors: Byoung-Tak ZHANG, Yu-Jung HEO, Eun-Sol KIM, Woo Suk CHOI
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Publication number: 20230359163Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.Type: ApplicationFiled: July 17, 2023Publication date: November 9, 2023Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
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Publication number: 20230324874Abstract: Aspects of the disclosed technology provide an Artificial Intelligence Process Control (AIPC) for automatically detecting errors in a manufacturing workflow of an assembly line process, and performing error mitigation through the update of instructions or guidance given to assembly operators at various stations. In some implementations, the disclosed technology utilizes one or more machine-learning models to perform error detection and/or propagate instructions/assembly modifications necessary to rectify detected errors or to improve the product of manufacture.Type: ApplicationFiled: June 12, 2023Publication date: October 12, 2023Applicant: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
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Publication number: 20230242888Abstract: The present invention relates to a method for mass-producing vaccinia virus using suspended cells. Although methods for producing vaccinia virus using adherent cells in the related art have limitations that are not suitable for mass production of viruses due to the characteristics of adherent cells, the present inventors have developed a technique capable of producing viruses even in a bioreactor using a low appropriate cell number, MOI, culture FBS concentration, and a medium while using suspended cells, and it was also confirmed that the present invention has high virus productivity similar to that in the case of using adherent cells. Accordingly, the technique of producing vaccinia virus using suspended cells according to the present invention enables mass production of vaccinia virus with high productivity.Type: ApplicationFiled: June 22, 2021Publication date: August 3, 2023Inventors: Sung Jin KIM, Sang Yong KIM, Eun Sol KIM, Ka Ul KIM, Sujeong KIM
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Patent number: 11703824Abstract: Aspects of the disclosed technology provide a computational model that utilizes machine learning for detecting errors during a manual assembly process and determining a sequence of steps to complete the manual assembly process in order to mitigate the detected errors. In some implementations, the disclosed technology evaluates a target object at a step of an assembly process where an error is detected to a nominal object to obtain a comparison. Based on this comparison, a sequence of steps for completion of the assembly process of the target object is obtained. The assembly instructions for creating the target object are adjusted based on this sequence of steps.Type: GrantFiled: December 27, 2021Date of Patent: July 18, 2023Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Eun-Sol Kim, Andrew Sundstrom
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Publication number: 20230213860Abstract: The present invention relates to a positive-type photosensitive resin composition and to a cured film prepared therefrom. The positive-type photosensitive resin composition may have excellent storage stability as it comprises an orthoester, and a cured film prepared therefrom may have excellent adhesion and chemical resistance.Type: ApplicationFiled: December 5, 2022Publication date: July 6, 2023Inventors: Jin Kyu IM, Ju-Young JUNG, Eun Sol KIM, Yeonok KIM