Abstract: The present disclosure relates to a polishing pad, a method of manufacturing the polishing pad, and a method of manufacturing a semiconductor device using the same. In the polishing pad, an unexpanded solid-phase blowing agent is included in a polishing composition when a polishing layer is manufactured, and the unexpanded solid-phase blowing agent is expanded during a curing process to form a plurality of uniform pores in the polishing layer, such that defects occurring on a surface of the semiconductor substrate may be prevented. In addition, the present disclosure may provide a method of manufacturing a semiconductor device to which the polishing pad is applied.

Abstract: A corner structure of a liquefied gas storage tank is provided, wherein the corner structure is installed at a corner of the storage tank for storing liquefied gas to support sealing walls. The corner structure includes: a stationary member secured to an inner surface of a hull structure wall; a movable member disposed on the stationary member such that the sealing walls are joined thereto; and an insulating member interposed between the sealing walls and the hull structure wall. The stationary member includes a stationary member body bent at a curved portion thereof in an opposite direction to the movable member, and the movable member includes a movable member body bent at a bent portion thereof in an opposite direction to the stationary member. The stationary member and the movable member are coupled to each other by a fastening member that penetrates the curved portion and the bent portion.

Abstract: The present invention provides a polishing pad whose crosslinking density is adjusted to enhance the performance of the CMP process such as polishing rate and cut pad rate. In addition, in the process for preparing a polishing pad according to the embodiment, it is possible to implement such a crosslinking density by a simple method of controlling the preheating temperature of the mold for curing. Thus, the polishing pad may be applied to a process of preparing a semiconductor device, which comprises a CMP process, to provide a semiconductor device such as a wafer of excellent quality.

Abstract: Disclosed herein are a system and method which can control the generation rate of boil-off gas from liquefied hydrogen and can maintain the liquefied hydrogen storage tank at a low pressure. The method for controlling boil-off gas from liquefied hydrogen according to the present invention includes: at least two storage tanks storing liquefied hydrogen and each operated in a high-temperature mode or in a low-temperature mode, wherein the low-temperature mode includes: maintaining at least a portion of liquefied hydrogen stored in the storage tank at a first temperature being a densification temperature, and the high-temperature mode includes: maintaining at least a portion of liquefied hydrogen stored in the storage tank at a second temperature being a temperature exceeding a triple point of liquefied hydrogen through recovery of cold heat from liquefied hydrogen stored in the storage tank.

Abstract: Disclosed are a liquefied hydrogen storage tank which is applicable to a storage facility storing a large amount of hydrogen in a liquefied state or a vehicle transporting liquefied hydrogen and a liquefied hydrogen storage tank, and a method for controlling the temperature of the liquefied hydrogen storage tank which can control the generation rate of boil-off gas from liquefied hydrogen and can maintain the liquefied hydrogen storage tank at a low pressure. The liquefied hydrogen storage tank is a storage container storing liquefied hydrogen, has an inner space including a lower space in which liquefied hydrogen is stored and an upper space in which a gas is stored, and includes a heat inflow prevention unit disposed in the upper space or at an interface between the upper space and the lower space and preventing inflow of thermal energy into the lower space through the upper space.

Abstract: Disclosed is a corner structure of a liquefied gas storage tank, wherein the corner structure is installed at a corner of the storage tank for storing liquefied gas to support sealing walls. The corner structure includes: a stationary member secured to an inner surface of a hull structure wall; a movable member disposed on the stationary member such that the sealing walls are joined thereto; and an insulating member interposed between the sealing walls and the hull structure wall. The stationary member includes a stationary member body bent at a curved portion thereof in an opposite direction to the movable member, and the movable member includes a movable member body bent at a bent portion thereof in an opposite direction to the stationary member. The stationary member and the movable member are coupled to each other by a fastening member that penetrates the curved portion and the bent portion.

Abstract: Disclosed is a display panel in which a black matrix is formed on an upper substrate, which is disposed so as to face a lower substrate, so as to delimit each pixel area, a plurality of light control partitions is provided in the pixel area of the upper substrate, a color filter is provided in the pixel area of the upper substrate, and an overcoat layer is provided over the entire surface of the upper substrate. The light control partitions are formed in the pixel area simultaneously with the formation of the black matrix, which enables the omission of an existing light control film. Thereby, a narrow viewing angle is realized without increasing the thickness or manufacturing cost of a product.

Abstract: Disclosed is a display panel in which a black matrix is formed on an upper substrate, which is disposed so as to face a lower substrate, so as to delimit each pixel area, a plurality of light control partitions is provided in the pixel area of the upper substrate, a color filter is provided in the pixel area of the upper substrate, and an overcoat layer is provided over the entire surface of the upper substrate. The light control partitions are formed in the pixel area simultaneously with the formation of the black matrix, which enables the omission of an existing light control film. Thereby, a narrow viewing angle is realized without increasing the thickness or manufacturing cost of a product.