Patents by Inventor Eung-Sug Lee
Eung-Sug Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 10730233Abstract: A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.Type: GrantFiled: April 14, 2017Date of Patent: August 4, 2020Assignee: ADMBIOSCIENCE INC.Inventors: Jun-ho Jeong, So Hee Jeon, Junhyuk Choi, Dae-Guen Choi, Ji Hye Lee, Joo Yun Jung, Eung-Sug Lee
-
Publication number: 20190070775Abstract: A method for manufacturing a three-dimensional structure through nano-imprinting, includes: a stamp preparation step in which a stamp formed with a convex-concave portion corresponding to a pattern of functional layers to be formed is prepared; a material formation step in which at least one material for forming the functional layers is formed to a thickness of several to dozens of nanometers on the convex-concave portion; a material stacking step in which the material formed on the convex-concave portion is stacked on a substrate; and a functional layer securing step in which the material is cured by applying pressure, heat and pressure, or light and pressure thereto such that the material can be converted into the functional layers.Type: ApplicationFiled: April 14, 2017Publication date: March 7, 2019Applicant: ADMBIOSCIENCE INC.Inventors: Jun-ho JEONG, So Hee JEON, Junhyuk CHOI, Dae-Guen CHOI, Ji Hye LEE, Joo Yun JUNG, Eung-Sug LEE
-
Patent number: 9791601Abstract: In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.Type: GrantFiled: February 28, 2014Date of Patent: October 17, 2017Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Hyuk Choi, Eung-Sug Lee, Ji-Hye Lee, Jun-ho Jeong, Joo-Yun Jung, Dae-Guen Choi, Cheol-Hyeon Kim
-
Patent number: 9692015Abstract: An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.Type: GrantFiled: January 3, 2012Date of Patent: June 27, 2017Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jong-Youp Shim, Jun-Ho Jeong, Ki-Don Kim, Dae-Geun Choi, Jun-Hyuk Choi, Eung-Sug Lee, So-Hee Jeon, Jae-R. Youn, Jang-Joo Kim
-
Patent number: 9028639Abstract: There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.Type: GrantFiled: December 26, 2012Date of Patent: May 12, 2015Assignee: Korea Institute of Machinery & MaterialsInventors: Eung-Sug Lee, Joo Yun Jung, Jun Hyuk Choi, Jae Won Hahn
-
Publication number: 20140311662Abstract: In a method for fabricating an embedded pattern using a transfer-based imprinting, an adhesive layer is formed on a substrate. The adhesive layer has a photo curable resin. A stamp having a protruded pattern is prepared. A thin-film layer is formed on an outer surface of the protruded pattern of the stamp. The stamp having the thin-film layer contact with the adhesive layer is pressed to selectively transfer the thin-film layer of the protruded pattern to the adhesive layer. Ultraviolet rays (UV) are irradiated to cure the adhesive layer. The stamp is removed.Type: ApplicationFiled: February 28, 2014Publication date: October 23, 2014Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jun-Hyuk CHOI, Eung-Sug LEE, Ji-Hye LEE, Jun-ho JEONG, Joo-Yun JUNG, Dae-Guen CHOI, Cheol-Hyeon KIM
-
Patent number: 8247962Abstract: An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.Type: GrantFiled: November 19, 2008Date of Patent: August 21, 2012Assignee: Korea Institute of Machinery & MaterialsInventors: Jong-Youp Shim, Jun-Ho Jeong, Ki-Don Kim, Dae-Geun Choi, Jun-Hyuk Choi, Eung-Sug Lee, So-Hee Jeon, Jae-R Youn, Jang-Joo Kim
-
Publication number: 20120132266Abstract: Provided is a photoelectric conversion device using a semiconductor nanomaterial, which converts light energy having photon energy into electrical energy, including: a substrate, a plurality of semiconductor nanomaterials arranged on the substrate, and a metal layer that is formed on the semiconductor nanomaterial and is joined with the semiconductor nanomaterial by a schottky junction, wherein electrical energy is generated by a rectified current generated between the semiconductor nanomaterial and the metal layer joined by the schottky junction.Type: ApplicationFiled: December 1, 2011Publication date: May 31, 2012Applicant: Korea Institute of Machinery & MaterialsInventors: Joon-Dong KIM, Chang-Soo Han, Eung-Sug Lee, Byung-Ik Choi, Kyung-Hyun Whang
-
Publication number: 20120100773Abstract: An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.Type: ApplicationFiled: January 3, 2012Publication date: April 26, 2012Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jong-Youp SHIM, Jun-Ho Jeong, Ki-Don Kim, Dae-Geun Choi, Jun-Hyuk Choi, Eung-Sug Lee, So-Hee Jeon, Jae-R. Youn, Jang-Joo Kim
-
Patent number: 8025830Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.Type: GrantFiled: November 27, 2009Date of Patent: September 27, 2011Assignee: Korea Institute of Machinery & MaterialsInventors: Jun-Ho Jeong, HyonKee Sohn, Young-Suk Sim, Young-Jae Shin, Eung-Sug Lee, Kyung-Hyun Whang
-
Patent number: 7914693Abstract: The present invention relates to a micro/nano imprint lithography technique and in particular, to a stamp that is used in an UV-micro/nano imprint lithography process or thermal micro/nano imprint lithography process and a method for fabricating the stamp. The method for fabricating a stamp for micro/nano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.Type: GrantFiled: October 18, 2006Date of Patent: March 29, 2011Assignee: Korea Institute of Machinery & MaterialsInventors: Jun-Ho Jeong, Young-Suk Sim, Ki-Don Kim, Dae-Geun Choi, Eung-Sug Lee
-
Publication number: 20100072672Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.Type: ApplicationFiled: November 27, 2009Publication date: March 25, 2010Inventors: Jun-Ho JEONG, HyonKee Sohn, Young-Suk Sim, Young-Jae Shin, Eung-Sug Lee, Kyung-Hyun Whang
-
Patent number: 7645133Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.Type: GrantFiled: February 24, 2005Date of Patent: January 12, 2010Assignee: Korea Institute of Machinery & MaterialsInventors: Jun-Ho Jeong, HyonKee Sohn, Young-Suk Sim, Young-Jae Shin, Eung-Sug Lee, Kyung-Hyun Whang
-
Publication number: 20090250102Abstract: A photoelectric conversion device using a semiconductor nanomaterial to which a rectifying action caused by a Schottky junction between semiconductor nanomaterials and metal is applied and a method of manufacturing the same are provided. The photoelectric conversion device includes a substrate, an insulating layer formed on the substrate, a nanomaterial layer made of a plurality of semiconductor nanomaterials vertically arranged between the insulating layer or horizontally arranged on the substrate, and a metal layer provided on the semiconductor nanomaterial layer to form a Schottky junction with the semiconductor nanomaterials. The electrical energy is generated by rectification generated between the semiconductor nanomaterials and the metal layer that form the Schottky junction with each other.Type: ApplicationFiled: September 12, 2008Publication date: October 8, 2009Applicant: Korea Institute of Machinery & MaterialsInventors: Joon-Dong Kim, Chang-Soo Han, Eung-Sug Lee, Byung-Ik Choi, Kyung-Hyun Whang
-
Publication number: 20090128022Abstract: An organic light emitting device having a photonic crystal structure and a manufacturing method thereof are provided. The organic light emitting device comprises: a substrate through which light passes; a photonic crystal layer formed on the substrate and having a photonic crystal structure; an intermediate layer formed on the photonic crystal layer and having a large refractive index compared with the photonic crystal layer; a first electrode layer formed on the intermediate layer; a light emitting layer formed on the first electrode layer and emitting light according to current flow; and a second electrode layer formed on the light emitting layer.Type: ApplicationFiled: November 19, 2008Publication date: May 21, 2009Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Jong-Youp SHIM, Jun-Ho Jeong, Ki-Don Kim, Dae-Geun Choi, Jun-Hyuk Choi, Eung-Sug Lee, So-Hee Jeon, Jae-R Youn, Jang-Joo Kim
-
Patent number: 7442316Abstract: A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM). The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.Type: GrantFiled: February 23, 2005Date of Patent: October 28, 2008Assignee: Korea Institute of Machinery & MaterialsInventors: Jun-Ho Jeong, HyonKee Sohn, Young-Suk Sim, Young-Jae Shin, Eung-Sug Lee, Kyung-Hyun Whang
-
Publication number: 20070158872Abstract: The present invention relates to a micro/nano imprint lithography technique and in particular, to a stamp that is used in an UV-micro/nano imprint lithography process or thermal micro/nano imprint lithography process and a method for fabricating the stamp. The method for fabricating a stamp for micro/nano imprint lithography of the present invention includes i) depositing a thin film of diamond-like carbon on a substrate, ii) applying resist on the diamond-like carbon thin film, iii) patterning the resist, iv) etching the diamond-like carbon thin film by using the resist as a protective layer, and v) removing the resist.Type: ApplicationFiled: October 18, 2006Publication date: July 12, 2007Inventors: Jun-Ho Jeong, Young-Suk Sim, Ki-Don Kim, Dae-Geun Choi, Eung-Sug Lee
-
Patent number: 7082683Abstract: The present invention relates to a method for manufacturing a probe for detecting surface signals or chemical signals through a long and slender rod-shaped nano structure such as tungsten nanowire, carbon nanotube, boron nanotube, etc., being attached to a tip end portion thereof. According to the method, a holder, acting as the probe, including a first electrode to which the rod-shaped nano structure is attached, and a second electrode at a predetermined distance from the first electrode are partially or fully immersed in a solution containing the rod-shaped structure. When a voltage is applied between two electrodes, an electrical field is generated, and the rod-shaped nano structure is attached to the holder, acting as the probe.Type: GrantFiled: August 28, 2003Date of Patent: August 1, 2006Assignee: Korea Institute of Machinery & MaterialsInventors: Chang Soo Han, Eung Sug Lee, Hyung-Woo Lee
-
Patent number: 6943117Abstract: A UV nanoimprint lithography process for forming nanostructures on a substrate. The process includes depositing a resist on a substrate; contacting a stamp having formed thereon nanostructures at areas corresponding to where nanostructures on the substrate are to be formed to an upper surface of the resist, and applying a predetermined pressure to the stamp in a direction toward the substrate, the contacting and applying being performed at room temperature and at low pressure; irradiating ultraviolet rays onto the resist; separating the stamp from the resist; and etching an upper surface of the substrate on which the resist is deposited. The stamp is an elementwise embossed stamp that comprises at least two element stamps, and grooves formed between adjacent element stamps and having a depth that is greater than a depth of the nanostructures formed on the element stamps.Type: GrantFiled: June 19, 2003Date of Patent: September 13, 2005Assignee: Korea Institute of Machinery & MaterialsInventors: Jun-Ho Jeong, HyonKee Sohn, Young-Suk Sim, Young-Jae Shin, Eung-Sug Lee, Kyung-Hyun Whang
-
Publication number: 20050186405Abstract: A microcontact printing method using an imprinted nanostructure is provided, wherein the microcontact printing is introduced to a nanoimprint lithography process to pattern a self-assembled monolayer (SAM) The method includes forming a nanostructure on a substrate by using the nanoimprint lithography process; and patterning the nanostructure with the microcontact printing method. The operation of patterning includes: depositing a metal thin film on the nanostructure; contacting a plate with the nanostructure to selectively print the SAM on the nanostructure, wherein the SAM is inked on the plate and the metal thin film is deposited on the nanostructure; selectively removing the metal thin film by using the SAM as a mask; removing the SAM from the nanostructure; and patterning the substrate by using the remaining metal thin film on the nanostructure as a mask.Type: ApplicationFiled: February 23, 2005Publication date: August 25, 2005Inventors: Jun-Ho Jeong, HyonKee Sohn, Young-Suk Sim, Young-Jae Shin, Eung-Sug Lee, Kyung-Hyun Whang