Patents by Inventor Eun-Ha Kim

Eun-Ha Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11923145
    Abstract: A multilayer capacitor includes a body including a multilayer structure in which a plurality of dielectric layers are stacked in a first direction and a plurality of internal electrodes stacked with the dielectric layer interposed therebetween and external electrodes formed outside the body and connected to the internal electrodes. The body includes an active portion and a side margin portion covering the active portion and opposing each other in a second direction, and 1<A2/M1?1.5 and A2<A1 in which A1 is an average grain size of the dielectric layers in a central region of the active portion, A2 is an average grain size of the dielectric layers at an active boundary part of the active portion adjacent to the side margin portion, and M1 is an average grain size of the dielectric layers in a central region of the side margin portion.
    Type: Grant
    Filed: September 2, 2021
    Date of Patent: March 5, 2024
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Je Hee Lee, Seung In Baik, Ji Su Hong, Eun Ha Jang, Hyoung Uk Kim, Jae Sung Park
  • Patent number: 11915684
    Abstract: A method and an electronic device for translating a speech signal between a first language and a second language with minimized translation delay by translating fewer than all words of the speech signal according to a level of understanding of the second language by a user that receives the translation.
    Type: Grant
    Filed: January 26, 2022
    Date of Patent: February 27, 2024
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji-sang Yu, Sang-ha Kim, Jong-youb Ryu, Yoon-jung Choi, Eun-kyoung Kim, Jae-won Lee
  • Patent number: 11915880
    Abstract: A multilayer electronic component includes a body including a plurality of dielectric layers, side margin portions disposed on the body, and external electrodes disposed on the body. The reliability of the multilayer electronic component is improved by controlling the contents of Si for each position of the dielectric layer and the side margin portion.
    Type: Grant
    Filed: October 12, 2021
    Date of Patent: February 27, 2024
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Hee Sun Chun, Hyoung Uk Kim, Jae Sung Park, Hyeg Soon An, Ku Tak Lee, Eun Ha Jang
  • Publication number: 20240062188
    Abstract: Disclosed is a method for displaying a gift card, and the method includes: receiving the gift card and gift information corresponding to the gift card from a server, wherein the gift card is associated with content information corresponding to at least one of a photo type, a video type, and a voice type; displaying a message comprising a first area and a second area separate from each other, wherein the gift information is displayed in the first area and a type of the content information is displayed in the second area; receiving an interaction for viewing the content information; displaying an output layout according to the gift information and the type of the content information; and outputting the content information through the output layout.
    Type: Application
    Filed: January 3, 2023
    Publication date: February 22, 2024
    Inventors: EUN HA KIM, SU YEON NA, SEO HYUNG CHO, DONG HWAN KIM, HYUN JI OH, LIM AH LEE
  • Publication number: 20230178662
    Abstract: Silicon carbide junction barrier Schottky diode disclosed. Silicon carbide junction barrier Schottky diode includes a first conductivity-type substrate, a first conductivity-type epitaxial layer, being formed by epitaxial growth of silicon carbide doped with a first conductivity-type impurity on the first conductivity-type substrate, a charge injection region, being formed on the first conductivity-type epitaxial layer and doped at a concentration of the first conductivity-type impurity higher than that of the first conductivity-type epitaxial layer, a second conductivity-type junction region, being formed on the first conductivity-type epitaxial layer so as to contact the charge injection region, a Schottky metal layer, being formed on the charge injection region and the second conductivity-type junction region, an anode electrode, being formed on the Schottky metal layer, and a cathode electrode, being formed under the first conductivity-type substrate.
    Type: Application
    Filed: May 6, 2021
    Publication date: June 8, 2023
    Inventors: Sin Su KYOUNG, Tae Jin NAM, Eun Ha KIM, Jeong Yun SEO, Tai Young KANG
  • Patent number: 10787607
    Abstract: The present invention provides a fluorescent resveratrone [(E)-4-(6,8-dihydroxynaphthalen-2-yl)but-3-en-2-one] and its derivatives having Formula 1 and a method for preparing the same by a photochemical reaction of resveratrol and its derivatives which are not fluorescent having Formula 7 or Formula 8. The new fluorescent compounds of the present invention has single-photon absorptive characteristics and/or two-photon absorptive characteristics as well as no or little toxicity according to a cytotoxicity test and can be usefully utilized in the field of organic fluorescent element, display element, spectrometer, two-photon absorptive storing device, laser micro processing apparatus, photo dynamic therapy apparatus and the like.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: September 29, 2020
    Assignee: SNU R&DB FOUNDATION
    Inventors: Seong Keun Kim, Seung Bum Park, Il Seung Yang, II, Eun Ha Kim, Jun Hee Kang
  • Publication number: 20190330524
    Abstract: The present invention provides a fluorescent resveratrone [(E)-4-(6,8-dihydroxynaphthalen-2-yl)but-3-en-2-one] and its derivatives having Formula 1 and a method for preparing the same by a photochemical reaction of resveratrol and its derivatives which are not fluorescent having Formula 7 or Formula 8. The new fluorescent compounds of the present invention has single-photon absorptive characteristics and/or two-photon absorptive characteristics as well as no or little toxicity according to a cytotoxicity test and can be usefully utilized in the field of organic fluorescent element, display element, spectrometer, two-photon absorptive storing device, laser micro processing apparatus, photo dynamic therapy apparatus and the like.
    Type: Application
    Filed: September 5, 2012
    Publication date: October 31, 2019
    Applicant: SUN R&DB FOUNDATION
    Inventors: Seong Keun Kim, Seung Bum Park, Il Seung Yang, Eun Ha KIM, Jun Hee Kang
  • Patent number: 9230727
    Abstract: Disclosed herein is a common mode filter including an internal electrode manufactured in a coil electrode form and provided with a simultaneous coil pattern in which two coil electrodes are overlapped with each other in a single layer in a direction in which a coil is wound, wherein a height of a second insulating layer formed on the internal electrode is higher than an interval between the coils. Therefore, a portion at which a parasitic capacitance is generated may be basically blocked, and a self resonant frequency (SRF) may be increased while filtering performance as the common mode filter is maintained.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: January 5, 2016
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Young Seuck Yoo, Kang Heon Hur, Sung Kwon Wi, Ho Jin Yun, Jong Yun Lee, Ju Hwan Yang, Jin Hyuck Yang, Young Do Kweon, Eun Ha Kim
  • Publication number: 20140145483
    Abstract: The present invention relates to a column unit for a chair, wherein the column unit for a chair is compact and can improve durability against lateral forces. The present invention relates to a column unit for a chair, in which the height thereof is controlled by upward and downward movements of a spindle assembly, wherein the column unit comprises: an outer pipe comprising an inclined portion of which the diameter gradually becomes larger as it approaches a front end thereof; an inner pipe which is inserted into the outer pipe to form a space portion between the inclined portion and the inner pipe; and a spindle guide which is inserted into the inner pipe to guide the upward and downward movements of the spindle assembly.
    Type: Application
    Filed: April 25, 2012
    Publication date: May 29, 2014
    Applicant: SAMHONGSA CO., LTD.
    Inventors: Eun Ha Kim, Ki Cheol Lee
  • Publication number: 20140062644
    Abstract: Disclosed herein is a common mode filter including an internal electrode manufactured in a coil electrode form and provided with a simultaneous coil pattern in which two coil electrodes are overlapped with each other in a single layer in a direction in which a coil is wound, wherein a height of a second insulating layer formed on the internal electrode is higher than an interval between the coils. Therefore, a portion at which a parasitic capacitance is generated may be basically blocked, and a self resonant frequency (SRF) may be increased while filtering performance as the common mode filter is maintained.
    Type: Application
    Filed: March 14, 2013
    Publication date: March 6, 2014
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Young Seuck Yoo, Kang Heon Hur, Sung Kwon Wi, Ho Jin Yun, Jong Yun Lee, Ju Hwan Yang, Jin Hyuck Yang, Young Do Kweon, Eun Ha Kim
  • Patent number: 8623515
    Abstract: Disclosed is a liquid crystal alignment agent that includes a polymer including polyamic acid including a repeating unit represented by the following Chemical Formula 1, polyimide including a repeating unit represented by the following Chemical Formula 2, or a combination thereof. In Chemical Formulae 1 and 2, X1, X2, Y1 and Y2 are the same as defined in the detailed description.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: January 7, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Jae-Deuk Yang, Eun-Ha Kim, Myoung-Youp Shin, Yong-Sik Yoo, Guk-Pyo Jo, Jung-Gon Choi
  • Patent number: 8557928
    Abstract: A liquid crystal alignment agent is provided that includes a polymer including polyamic acid including a repeating unit represented by the following Chemical Formula 1, polyimide including a repeating unit represented by the following Chemical Formula 2, or a combination thereof. In Chemical Formulae 1 and 2, each X1, X2, Y1 and Y2 is the same as in the detailed description.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: October 15, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Eun-Ha Kim, Myoung-Youp Shin, Jae-Deuk Yang, Yong-Sik Yoo, Guk-Pyo Jo, Jung-Gon Choi
  • Patent number: 8487069
    Abstract: Disclosed is a liquid crystal photo-alignment agent including polyamic acid or a polyimide including a first structural unit derived from a photo-diamine represented by the following Chemical Formula 1, a second structural unit represented by the following Chemical Formula 2 or a polymer compound combination thereof, and a solvent. In Chemical Formulae 1 and 2, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: July 16, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Jae-Deuk Yang, Hee-Young Oh, Myoung-Youp Shin, Mi-Ra Im, Guk-Pyo Jo, Eun-Ha Kim
  • Patent number: 8470412
    Abstract: Disclosed is a liquid crystal alignment agent that includes a polymer comprising polyamic acid including a repeating unit represented by the following Chemical Formula 1, polyimide including a repeating unit represented by the following Chemical Formula 2, or a combination thereof. In Chemical Formulae 1 and 2, X1, X2, Y1 and Y2 are the same in the detailed description.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: June 25, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Myoung-Youp Shin, Eun-Ha Kim, Jae-Deuk Yang, Yong-Sik Yoo, Guk-Pyo Jo, Jung-Gon Choi
  • Publication number: 20120287390
    Abstract: Disclosed is a liquid crystal alignment agent that includes a polymer comprising polyamic acid including a structural unit represented by the following Chemical Formula 1, polyimide including a structural unit represented by the following Chemical Formula 2, or a combination thereof. In Chemical Formulas 1 and 2, each X1, X2, Y1 and Y2 is the same as in the detailed description.
    Type: Application
    Filed: January 19, 2012
    Publication date: November 15, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Eun-Ha KIM, Jae-Deuk YANG, Yong-Sik YOO, Myoung-Youp SHIN, Guk-Pyo JO
  • Publication number: 20120190801
    Abstract: A liquid crystal alignment agent is provided that includes a polymer including polyamic acid including a repeating unit represented by the following Chemical Formula 1, polyimide including a repeating unit represented by the following Chemical Formula 2, or a combination thereof. In Chemical Formulae 1 and 2, each X1, X2, Y1 and Y2 is the same as in the detailed description.
    Type: Application
    Filed: September 23, 2011
    Publication date: July 26, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Eun-Ha KIM, Myoung-Youp SHIN, Jae-Deuk YANG, Yong-Sik YOO, Guk-Pyo JO, Jung-Gon CHOI
  • Publication number: 20120172540
    Abstract: Disclosed is a liquid crystal alignment agent that includes a polymer including polyamic acid including a repeating unit represented by the following Chemical Formula 1, polyimide including a repeating unit represented by the following Chemical Formula 2, or a combination thereof. In Chemical Formulae 1 and 2, X1, X2, Y1 and Y2 are the same as defined in the detailed description.
    Type: Application
    Filed: September 21, 2011
    Publication date: July 5, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Jae-Deuk YANG, Eun-Ha KIM, Myoung-Youp SHIN, Yong-Sik YOO, Guk-Pyo JO, Jung-Gon CHOI
  • Publication number: 20120172522
    Abstract: Disclosed is a liquid crystal alignment agent that includes a polymer comprising polyamic acid including a repeating unit represented by the following Chemical Formula 1, polyimide including a repeating unit represented by the following Chemical Formula 2, or a combination thereof. In Chemical Formulae 1 and 2, X1, X2, Y1 and Y2 are the same in the detailed description.
    Type: Application
    Filed: September 21, 2011
    Publication date: July 5, 2012
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Myoung-Youp SHIN, Eun-Ha KIM, Jae-Deuk YANG, Yong-Sik YOO, Guk-Pyo JO, Jung-Gon CHOI
  • Publication number: 20110144299
    Abstract: Disclosed is a liquid crystal photo-alignment agent including polyamic acid or a polyimide including a first structural unit derived from a photo-diamine represented by the following Chemical Formula 1, a second structural unit represented by the following Chemical Formula 2 or a polymer compound combination thereof, and a solvent. In Chemical Formulae 1 and 2, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: September 1, 2010
    Publication date: June 16, 2011
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Jae-Deuk YANG, Hee-Young OH, Myoung-Youp SHIN, Mi-Ra IM, Guk-Pyo JO, Eun-Ha KIM
  • Patent number: 7795124
    Abstract: Methods for reducing contact resistance in semiconductor devices are provided in the present invention. In one embodiment, the method includes providing a substrate having semiconductor device formed thereon, wherein the device has source and drain regions and a gate structure formed therein, performing a silicidation process on the substrate by a thermal annealing process, and performing a laser anneal process on the substrate. In another embodiment, the method includes providing a substrate having implanted dopants, performing a silicidation process on the substrate by a thermal annealing process, and activating the dopants by a laser anneal process.
    Type: Grant
    Filed: June 23, 2006
    Date of Patent: September 14, 2010
    Assignee: Applied Materials, Inc.
    Inventors: Faran Nouri, Eun-Ha Kim, Sunderraj Thirupapuliyur, Vijay Parihar