Patents by Inventor Eunjeong Youn

Eunjeong Youn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11991897
    Abstract: A display apparatus includes a substrate including a first area, and a second area adjacent to the first area; first to third light-emitting diodes that are arranged in the first area and include a color emission layer; an encapsulation layer overlapping the first to third light-emitting diodes, and including an inorganic layer and an organic layer; a first light shielding wall portion disposed on the encapsulation layer, the first light shielding wall portion including a 1-1-th opening portion, a 1-2-th opening portion, and a 1-3-th opening portion corresponding to the first to third light-emitting diodes, respectively; and a second light shielding wall portion disposed on the encapsulation layer and overlapping the second area. The first light shielding wall portion and the second light shielding wall portion are spaced apart from each other in a plan view.
    Type: Grant
    Filed: June 2, 2021
    Date of Patent: May 21, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Kyunghae Park, Minhee Kim, Dokyung Youn, Minjae Kim, Taehoon Kim, Eunjeong Na, Joonhyung Park, Danbi Yang, Hanjun Yu, Simbum Yuk, Changhun Lee, Kangseob Jeong
  • Publication number: 20230178682
    Abstract: A structure including quantum dots formed in a surface control region, a method of forming a structure including quantum dots in a surface control region, a surface-controlled substrate provided with the structure including quantum dots, and a photoelectronic element using the same. The method includes forming multiple surface control layers that differ in etch resistance on a substrate, securing a surface control region on the substrate by forming control patterns having respectively different sizes in the respective surface control layers depending on the etch resistance values through an exposure process, forming the structure including quantum dots in the surface control region by using the plurality of surface control layers as masks, and removing the surface control layers.
    Type: Application
    Filed: August 4, 2021
    Publication date: June 8, 2023
    Inventors: Hyeong Ho Park, Eunjeong Youn, Hae-Yong Jeong, Sang Hyun Jung, Yu Min Ko, Chan Soo Shin, Shin Keun Kim