Patents by Inventor Eun-Kyung YOON

Eun-Kyung YOON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220033405
    Abstract: The present invention relates to a pharmaceutical composition for preventing, treating or alleviating cancer, containing a PLK1 inhibitor as an active ingredient, and a compound according to the present invention selectively binds to PBD of PLK1, thereby having advantages of high selectivity and binding affinity for PLK1 and low toxicity. Therefore, a PLK inhibitor compound according to the present invention can be effectively used as an anticancer agent by inhibiting the growth of various cancer cells, and can be expected to exhibit synergistic effects with existing developed anticancer agents through co-administration, in addition to individual administration thereof.
    Type: Application
    Filed: November 29, 2018
    Publication date: February 3, 2022
    Applicants: NATIONAL CANCER CENTER, KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY
    Inventors: Kyungtae KIM, Byung Il LEE, Joong-Won PARK, Eun Sook LEE, Sang Jin LEE, Seoung Min BONG, Jin Sook KIM, Minji PARK, Eun-Kyung YOON, Joo-Youn LEE, Su-Hyung LEE
  • Publication number: 20220026415
    Abstract: The present invention relates to a method of screening for a cancer therapeutic agent using Cyclin B1, Cyclin-dependent kinase 1 (CDK1), and retinoic acid receptor responder 1 (RARRES1), and a composition for diagnosing cancer or predicting a prognosis using the same. As a result of having conducted intensive studies to discover molecular mechanisms for diagnosing cancer and predicting a prognosis, the inventors of the present invention confirmed that in cancer-derived samples, according to the degree of mutual binding between RARRES1 and CDK1 or Cyclin B1, the mitosis of cancer cells was arrested, the formation of CDK1-Cyclin B1 complexes was suppressed, and the degradation of these proteins was promoted, and thus RARRES1 was a crucial factor in the diagnosis of cancer, prognosis prediction, and the treatment of cancer.
    Type: Application
    Filed: December 31, 2018
    Publication date: January 27, 2022
    Applicant: NATIONAL CANCER CENTER
    Inventors: Kyungtae KIM, Hyoun Sook KIM, Charny PARK, Doyeong YU, Eun-Kyung YOON, Su-Hyung LEE, Ho LEE
  • Patent number: 9256118
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: February 9, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jong-Hwa Lee, Hyun-Yong Cho, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Chung-Beom Hong, Eun-Ha Hwang
  • Patent number: 9040213
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: May 26, 2015
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Yong Cho, Sang-Soo Kim, Eun-Kyung Yoon, Jong-Hwa Lee, Jun-Ho Lee, Eun-Ha Hwang, Ji-Yun Kwon, Jin-Young Lee
  • Patent number: 8921019
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: December 30, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Eun-Kyung Yoon, Jong-Hwa Lee, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Hyun-Yong Cho, Chung-Beom Hong, Eun-Ha Hwang
  • Patent number: 8815489
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1 and a repeating unit represented by the following Chemical Formula 2, and having a thermally polymerizable functional group at at least one of the terminal end; (B) a dissolution controlling agent including a novolac resin including a repeating unit represented by the following Chemical Formula 4; (C) a photosensitive diazoquinone compound; (D) a silane compound; (E) an acid generator; and (F) a solvent, a photosensitive resin film prepared using the same, and a semiconductor device including the photosensitive resin film.
    Type: Grant
    Filed: August 21, 2012
    Date of Patent: August 26, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Young Jeong, Jin-Young Lee, Jong-Hwa Lee, Hyun-Yong Cho, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Myoung-Hwan Cha, Eun-Ha Hwang
  • Publication number: 20140170562
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.
    Type: Application
    Filed: July 17, 2012
    Publication date: June 19, 2014
    Inventors: Ji-Yun Kwon, Jong-Hwa Lee, Hyun-Yong Cho, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Chung-Beom Hong, Eun-Ha Hwang
  • Patent number: 8735029
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: May 27, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Eun-Kyung Yoon, Eun-Ha Hwang, Jong-Hwa Lee, Ji-Yun Kwon, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Jun-Ho Lee, Jin-Young Lee, Hyun-Yong Cho, Chung-Beom Hong
  • Publication number: 20130171568
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
    Type: Application
    Filed: September 5, 2012
    Publication date: July 4, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ji-Yun KWON, Jin-Hee KANG, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Kyun KIM, Sang-Soo KIM, Kun-Bae NOH, Eun-Kyung YOON, Jong-Hwa LEE, Jun-Ho LEE, Jin-Young LEE, Hwan-Sung CHEON, Hyun-Yong CHO, Chung-Beom HONG, Eun-Ha HWANG
  • Publication number: 20130171564
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Application
    Filed: September 5, 2012
    Publication date: July 4, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Eun-Kyung YOON, Eun-Ha HWANG, Jong-Hwa LEE, Ji-Yun KWON, Dae-Yun KIM, Sang-Kyeon KIM, Sang-Kyun KIM, Sang-Soo KIM, Kun-Bae NOH, Jun-Ho LEE, Jin-Young LEE, Hyun-Yong CHO, Chung-Beom HONG
  • Publication number: 20130164682
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin prepared by a phosphorous-containing diamine represented by the following Chemical Formula 1, (B) a photosensitive diazoquinone compound, and (C) a solvent. A photosensitive resin film prepared using the same and a semiconductor device including the photosensitive resin film are also disclosed. In Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: September 5, 2012
    Publication date: June 27, 2013
    Applicant: Cheil Industries Inc.
    Inventors: Hyun-Yong CHO, Sang-Soo KIM, Eun-Kyung YOON, Jong-Hwa LEE, Jun-Ho LEE, Eun-Ha HWANG, Ji-Yun KWON, Jin-Young LEE
  • Publication number: 20130137036
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) a polybenzoxazole precursor including a first polybenzoxazole precursor including a repeating unit represented by the following Chemical Formula 1 and a repeating unit represented by the following Chemical Formula 2, and having a thermally polymerizable functional group at at least one of the terminal end; (B) a dissolution controlling agent including a novolac resin including a repeating unit represented by the following Chemical Formula 4; (C) a photosensitive diazoquinone compound; (D) a silane compound; (E) an acid generator; and (F) a solvent, a photosensitive resin film prepared using the same, and a semiconductor device including the photosensitive resin film.
    Type: Application
    Filed: August 21, 2012
    Publication date: May 30, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ji-Young JEONG, Jin-Young LEE, Jong-Hwa LEE, Hyun-Yong CHO, Sang-Soo KIM, Eun-Kyung YOON, Jun-Ho LEE, Myoung-Hwan CHA, Eun-Ha HWANG