Patents by Inventor Eunseog Cho

Eunseog Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11176457
    Abstract: A method of generating a 3D microstructure using a neural network includes configuring an initial 3D microstructure; obtaining a plurality of cross-sectional images by disassembling the initial 3D microstructure in at least one direction of the initial 3D microstructure; obtaining first output feature maps with respect to at least one layer that constitutes the neural network by inputting each of the cross-sectional images to the neural network; obtaining second output feature maps with respect to at least one layer by inputting a 2D original image to the neural network; generating a 3D gradient by applying a loss value to a back-propagation algorithm after calculating the loss value by comparing the first output feature maps with the second output feature maps; and generating a final 3D microstructure based on the 2D original image by reflecting the 3D gradient to the initial 3D microstructure.
    Type: Grant
    Filed: October 4, 2019
    Date of Patent: November 16, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seungwoo Seo, Kyongmin Min, Eunseog Cho
  • Publication number: 20200134465
    Abstract: A method of generating a 3D microstructure using a neural network includes configuring an initial 3D microstructure; obtaining a plurality of cross-sectional images by disassembling the initial 3D microstructure in at least one direction of the initial 3D microstructure; obtaining first output feature maps with respect to at least one layer that constitutes the neural network by inputting each of the cross-sectional images to the neural network; obtaining second output feature maps with respect to at least one layer by inputting a 2D original image to the neural network; generating a 3D gradient by applying a loss value to a back-propagation algorithm after calculating the loss value by comparing the first output feature maps with the second output feature maps; and generating a final 3D microstructure based on the 2D original image by reflecting the 3D gradient to the initial 3D microstructure.
    Type: Application
    Filed: October 4, 2019
    Publication date: April 30, 2020
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Seungwoo SEO, Kyongmin MIN, Eunseog CHO
  • Publication number: 20190089111
    Abstract: Amplification waveguide devices and beam steering apparatuses including the same may include a first core layer through which light is directed, an active layer that amplifies light incident thereof from the first core layer to generate amplified light, and a second core layer that directs amplified light that is incident on the second core layer from the active layer therethrough.
    Type: Application
    Filed: September 18, 2018
    Publication date: March 21, 2019
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Eunkyung LEE, Byounglyong Choi, Eunseog Cho
  • Patent number: 8592528
    Abstract: Polyamic acid including structural units of the following Chemical Formulae 1 and 2 is provided: In Chemical Formulae 1 and 2, each substituent is as defined in the detailed description.
    Type: Grant
    Filed: September 3, 2010
    Date of Patent: November 26, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eunseog Cho, Youngsuk Jung, Sangmo Kim, Byung-Hee Sohn, Yooseong Yang
  • Patent number: 8178621
    Abstract: A polyimide precursor composition includes an oligomer or polymer having a substituted or unsubstituted carbonyl group only in a side chain and a diamine compound. A method of manufacturing a polyimide, and a polyimide film, are also disclosed.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: May 15, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sangmo Kim, Youngsuk Jung, Yooseong Yang, Byung-Hee Sohn, Eunseog Cho
  • Publication number: 20110196109
    Abstract: Polyamic acid including structural units of the following Chemical Formulae 1 and 2 is provided: In Chemical Formulae 1 and 2, each substituent is as defined in the detailed description.
    Type: Application
    Filed: September 3, 2010
    Publication date: August 11, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Eunseog CHO, Youngsuk JUNG, Sangmo KIM, Byung-Hee SOHN, Yooseong YANG
  • Publication number: 20110105689
    Abstract: A polyimide precursor composition includes an oligomer or polymer having a substituted or unsubstituted carbonyl group only in a side chain and a diamine compound. A method of manufacturing a polyimide, and a polyimide film, are also disclosed.
    Type: Application
    Filed: May 12, 2010
    Publication date: May 5, 2011
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sangmo KIM, Youngsuk JUNG, Yooseong YANG, Byung-Hee SOHN, Eunseog CHO