Patents by Inventor Eun-Sun Lee

Eun-Sun Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11967267
    Abstract: Provided is a display device including a display panel, an optical sensor, a timing controller, a scan driver, a data driver, and an image controller. The timing controller controls an image refresh rate of the display panel based on a refresh rate control signal. Thus, the display device provides improved visibility.
    Type: Grant
    Filed: May 2, 2023
    Date of Patent: April 23, 2024
    Assignees: Samsung Display Co., Ltd., UNIST (Ulsan National Institute Of Science and Technology)
    Inventors: Hyo Sun Kim, Oh Sang Kwon, Seong Gyu Choe, Chang Yeong Han, Min Kyung Kim, You Ra Kim, Eun Jung Lee, Hyung Suk Hwang
  • Publication number: 20240116920
    Abstract: Provided is a novel JAK-specific inhibitor compound and a method for preparing the same. The compound of the provided can exhibit therapeutic effects on a variety of diseases, for example, inflammatory diseases, autoimmune diseases, myeloproliferative diseases, and human cancers due to its ability to regulate signal transduction at the level of JAK kinases. In particular, due to its high selectivity for JAK1, the compound of the provided can exhibit better therapeutic effects on inflammatory diseases and autoimmune diseases at a low dose and with fewer side effects and can be expected to be effective in preventing and treating liver fibrosis.
    Type: Application
    Filed: November 29, 2021
    Publication date: April 11, 2024
    Inventors: Soo Sung KANG, Eun Sun PARK, Eun Hee PARK, Sun Joo LEE, Seung Hee HAN
  • Publication number: 20240098048
    Abstract: A method for displaying a message in a messenger service by a user terminal is proposed. The method may include receiving the message from a server. The method may also include receiving a mask command for the message from the server when text information extracted from the message satisfies a preset condition. The method may further include displaying a mask message corresponding to the message in a chat room of the messenger service based on the mask command.
    Type: Application
    Filed: September 8, 2023
    Publication date: March 21, 2024
    Inventors: Dae Won YOON, Ki Yong SHIM, Eun Jung KO, Doo Won LEE, Ji Sun LEE
  • Patent number: 11915880
    Abstract: A multilayer electronic component includes a body including a plurality of dielectric layers, side margin portions disposed on the body, and external electrodes disposed on the body. The reliability of the multilayer electronic component is improved by controlling the contents of Si for each position of the dielectric layer and the side margin portion.
    Type: Grant
    Filed: October 12, 2021
    Date of Patent: February 27, 2024
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Hee Sun Chun, Hyoung Uk Kim, Jae Sung Park, Hyeg Soon An, Ku Tak Lee, Eun Ha Jang
  • Patent number: 11912690
    Abstract: The present invention relates to a pidolate salt and malate salt of a compound represented by a formula 1 with an excellent liquid-phase stability, solid-phase stability, water solubility, precipitation stability and hygroscopicity all together as a compound for preventing and treating diseases mediated by an acid pump antagonistic activity, as well as a method for preparing the same.
    Type: Grant
    Filed: November 21, 2022
    Date of Patent: February 27, 2024
    Assignee: HK INNO.N CORPORATION
    Inventors: Eun Sun Kim, Min Kyoung Lee, Sung Ah Lee, Kwang Do Choi, Jae Sun Kim, Hyung Chul Yoo
  • Patent number: 11389411
    Abstract: The present disclosure relates to a pharmaceutical composition for suppressing cancer metastasis containing, as an active ingredient, an activator compound of the cancer metastasis inhibitor Nm23, a stereoisomer thereof, or a pharmaceutically acceptable salt thereof. The compound according to the present disclosure may suppress the metastasis of cancer cells by promoting the activity of Nm23 associated with cancer metastasis, and thus may be useful as a pharmaceutical composition for suppressing cancer metastasis.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: July 19, 2022
    Assignee: EWHA UNIVERSITY—INDUSTRY COLLABORATION FOUNDATION
    Inventors: Kong Joo Lee, Hee-Yoon Lee, Je Jin Lee, Eun-Kyoung Seo, Eun Sun Lee, Hwang Suk Kim, Hongsoo Lee
  • Publication number: 20200078319
    Abstract: The present disclosure relates to a pharmaceutical composition for suppressing cancer metastasis containing, as an active ingredient, an activator compound of the cancer metastasis inhibitor Nm23, a stereoisomer thereof, or a pharmaceutically acceptable salt thereof. The compound according to the present disclosure may suppress the metastasis of cancer cells by promoting the activity of Nm23 associated with cancer metastasis, and thus may be useful as a pharmaceutical composition for suppressing cancer metastasis.
    Type: Application
    Filed: April 30, 2018
    Publication date: March 12, 2020
    Applicant: EWHA UNIVERSITY - INDUSTRY COLLABORATION FOUNDATION
    Inventors: Kong Joo LEE, Hee-Yoon LEE, Je Jin LEE, Eun-Kyoung SEO, Eun Sun LEE, Hwang Suk KIM, Hongsoo LEE
  • Patent number: 9842841
    Abstract: A method of fabricating a semiconductor device, the method including etching a portion of a substrate including a first region and a second region to form a device isolation trench; forming a device isolation layer defining active regions by sequentially stacking a first insulating layer, a second insulating layer, and a third insulating layer on an inner surface of the device isolation trench; forming word lines buried in the substrate of the first region, the word lines extending in a first direction to intersect the active region of the first region, the word lines being spaced apart from each other; forming a first mask layer covering the word lines on the substrate of the first region, the first mask layer exposing the substrate of the second region; forming a channel layer on the substrate of the second region; and forming a gate electrode on the channel layer.
    Type: Grant
    Filed: September 10, 2015
    Date of Patent: December 12, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Ji Hun Kim, Ilgweon Kim, Junhwa Song, Jeonghoon Oh, WonSeok Yoo, Eun-Sun Lee
  • Patent number: 9484409
    Abstract: A semiconductor device includes a semiconductor substrate including a well dopant layer having a first conductivity type, a gate electrode on the well dopant layer, a channel dopant layer in the well dopant layer and spaced apart from a top surface of the semiconductor substrate, a channel region between the gate electrode and the channel dopant layer, and source/drain regions in the well dopant layer at both sides of the gate electrode. The channel dopant layer and the channel region have the first conductivity type. The source/drain regions have a second conductivity type. A concentration of dopants having the first conductivity type in the channel dopant layer is higher than a concentration of dopants having the first conductivity type in the channel region. The semiconductor device may be used in a sense amplifier of a memory device.
    Type: Grant
    Filed: September 4, 2015
    Date of Patent: November 1, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun-Sun Lee, Junhwa Song, Ji Hun Kim, Jeonghoon Oh
  • Publication number: 20160141367
    Abstract: A semiconductor device includes a semiconductor substrate including a well dopant layer having a first conductivity type, a gate electrode on the well dopant layer, a channel dopant layer in the well dopant layer and spaced apart from a top surface of the semiconductor substrate, a channel region between the gate electrode and the channel dopant layer, and source/drain regions in the well dopant layer at both sides of the gate electrode. The channel dopant layer and the channel region have the first conductivity type. The source/drain regions have a second conductivity type. A concentration of dopants having the first conductivity type in the channel dopant layer is higher than a concentration of dopants having the first conductivity type in the channel region. The semiconductor device may be used in a sense amplifier of a memory device.
    Type: Application
    Filed: September 4, 2015
    Publication date: May 19, 2016
    Inventors: EUN-SUN LEE, JUNHWA SONG, JI HUN KIM, JEONGHOON OH
  • Publication number: 20160079246
    Abstract: A method of fabricating a semiconductor device, the method including etching a portion of a substrate including a first region and a second region to form a device isolation trench; forming a device isolation layer defining active regions by sequentially stacking a first insulating layer, a second insulating layer, and a third insulating layer on an inner surface of the device isolation trench; forming word lines buried in the substrate of the first region, the word lines extending in a first direction to intersect the active region of the first region, the word lines being spaced apart from each other; forming a first mask layer covering the word lines on the substrate of the first region, the first mask layer exposing the substrate of the second region; forming a channel layer on the substrate of the second region; and forming a gate electrode on the channel layer.
    Type: Application
    Filed: September 10, 2015
    Publication date: March 17, 2016
    Inventors: Ji Hun KIM, Ilgweon KIM, Junhwa SONG, Jeonghoon OH, WonSeok YOO, Eun-Sun LEE
  • Patent number: 7952907
    Abstract: An FRAM device includes first ferroelectric capacitors, second ferroelectric capacitors, first plate lines and second plate lines. The first ferroelectric capacitors can be connected between word lines and bit lines. The second ferroelectric capacitors can be connected between the word lines and bit line bars. The first plate lines can be connected to upper electrodes of the first ferroelectric capacitors. The second plate lines can be connected to upper electrodes of the second ferroelectric capacitors. Thus, the first ferroelectric capacitors connected to the bit lines and the second ferroelectric capacitors connected to the bit line bars can be connected to the different plate lines, so that data can be output from any one of the bit line and the bit line bar. As a result, a layout of a core region can be simplified.
    Type: Grant
    Filed: February 19, 2009
    Date of Patent: May 31, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Eun-Sun Lee, Young-Min Kang
  • Publication number: 20090213637
    Abstract: An FRAM device can includes first ferroelectric capacitors, second ferroelectric capacitors, first plate lines and second plate lines. The first ferroelectric capacitors can be connected between word lines and bit lines. The second ferroelectric capacitors can be connected between the word lines and bit line bars. The first plate lines can be connected to upper electrodes of the first ferroelectric capacitors. The second plate lines can be connected to upper electrodes of the second ferroelectric capacitors. Thus, the first ferroelectric capacitors connected to the bit lines and the second ferroelectric capacitors connected to the bit line bars can be connected to the different plate lines, so that data can be output from any one of the bit line and the bit line bar. As a result, a layout of a core region can be simplified.
    Type: Application
    Filed: February 19, 2009
    Publication date: August 27, 2009
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Eun-Sun Lee, Young-Min Kang