Patents by Inventor Eva Mondt
Eva Mondt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10268127Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: GrantFiled: May 8, 2017Date of Patent: April 23, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Franciscus Johannes Joseph Janssen
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Publication number: 20170242348Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: ApplicationFiled: May 8, 2017Publication date: August 24, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Michel RIEPEN, Christiaan Alexander HOOGENDAM, Paulus Martinus Maria LIEBREGTS, Ronald VAN DER HAM, Wilhelmus Franciscus Johannes SIMONS, Daniël Jozef Maria DIRECKS, Paul Petrus Joannes BERKVENS, Eva MONDT, Gert-Jan Gerardus Johannes Thomas BRANDS, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Mathieus Anna Karel VAN LIEROP, Christophe DE METSENAERE, Marcio Alexandre Cano MIRANDA, Patrick Johannes Wilhelmus SPRUYTENBURG, Joris Johan Anne-Marie VERSTRAETE, Franciscus Johannes Joseph JANSSEN
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Patent number: 9645506Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: GrantFiled: December 13, 2013Date of Patent: May 9, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Franciscus Johannes Joseph Janssen
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Patent number: 9242194Abstract: A device (1) comprises filtering means (30) for removing particles from a fluid, which have a particle collecting face (31) for collecting particles during use of the device (1), and a chamber (10) in which a fluid is present and in which the filtering means (30) are arranged. An inlet (11) of the chamber (10) comprises a spouting part (20) which serves for spouting the fluid to be filtered in a direction towards the particle collecting face (31) of the filtering means (30). An arrangement of the spouting part (20) and the particle collecting face (31) with respect to each other is adapted to generate, during operation of the device (1), a rotating flow pattern in the fluid that is present in the chamber (10) under the influence of the flow of the fluid to be filtered, whereby particles can be blown away from the particle collecting face (31).Type: GrantFiled: June 16, 2011Date of Patent: January 26, 2016Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Johannes Tseard Van Der Kool, Fokke Roelof Voorhorst, Bastian Cornelis Kleine-Doepke, Maiza Georgien Salomons, Richard Henrik Jousma, Eva Mondt
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Patent number: 9040938Abstract: A device (1) comprises a source (20) for emitting ultraviolet light, an inlet (30) for letting in fluid to the device (1), an outlet (40) for letting out fluid from the device (1), and means (51, 52) for performing a straightening action of a flow of fluid through the device (1). The flow straightening means comprise at least one flow straightening element (51, 52) having inlet openings for letting in fluid at one side and outlet openings for letting out fluid at another side, wherein each inlet opening is in communication with a plurality of outlet openings, and wherein the element (51, 52) comprises a maze of randomly arranged, interconnected holes. In such a structure, a water element that is moving from one side of the element (51, 52) to another side may take one of various paths, as a result of which variations in inlet conditions can be dampened.Type: GrantFiled: August 12, 2010Date of Patent: May 26, 2015Assignee: KONINKLIJKE PHILIPS N.V.Inventors: Paulus Cornelis Duineveld, Eva Mondt, Harko Jan Taekema, Willem Sjouke Wijma, Marc Alexander Pastoors, Wilhelmus Hendrikus Maria Bruggink
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Publication number: 20140098353Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: ApplicationFiled: December 13, 2013Publication date: April 10, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Michel RIEPEN, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniël Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
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Patent number: 8675172Abstract: A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.Type: GrantFiled: February 19, 2010Date of Patent: March 18, 2014Assignee: ASML Netherlands B.V.Inventors: Hernes Jacobs, Erik Roelof Loopstra, Michel Riepen, Eva Mondt
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Patent number: 8634053Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: GrantFiled: November 30, 2007Date of Patent: January 21, 2014Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete
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Patent number: 8634052Abstract: A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.Type: GrantFiled: November 27, 2007Date of Patent: January 21, 2014Assignee: ASML Netherlands B.V.Inventors: Suzan Leonie Auer-Jongepier, Jeroen Johannes Sophia Maria Mertens, Frank Bernhard Sperling, Teunis Cornelis Van Den Dool, Eva Mondt, Alexander Nikolov Zdravkov, Paulus Martinus Hubertus Vissers
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Patent number: 8614424Abstract: A device including a housing having an interior space for containing fluid, an inlet for letting in fluid to the housing, an outlet for letting out fluid from the housing, an element which is arranged inside the housing, and fluid guiding components which are arranged in the housing as well and which serve for guiding the fluid from the inlet side of the housing to the outlet side of the housing, around the element. The fluid guiding components may be zigzag-shaped extending along at least a portion of the element and, as a combination, providing complete coverage of the element in a circumferential direction.Type: GrantFiled: August 3, 2010Date of Patent: December 24, 2013Assignee: Koninklijke Philips N.V.Inventors: Eva Mondt, Paulus Cornelis Duineveld
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DEVICE FOR SUBJECTING A FLUID TO A DISINFECTING TREATMENT BY EXPOSING THE FLUID TO ULTRAVIOLET LIGHT
Publication number: 20130119266Abstract: A device for subjecting a fluid to a disinfecting treatment by exposing the fluid to ultraviolet light comprises a reactor (10) having an inner space (11) in which means (20) for emitting ultraviolet light are arranged, an inlet (12) for letting fluid into the inner space (11), and an outlet for letting out fluid from the inner space (11). The light emission means (20) comprise a single electrode, wherein a wall (14) encompassing the inner space (11) is adapted to function as an electrode and comprises electrically conductive material, and wherein the device further comprises means (30) which also comprise electrically conductive material, and which are arranged for locally enhancing the electrical conductivity in a space between the reactor wall (14) and the light emission means (20).Type: ApplicationFiled: July 11, 2011Publication date: May 16, 2013Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Eva Mondt, Einte Holwerda, Daiyu Hayashi, Georg Greuel -
Patent number: 8416383Abstract: A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.Type: GrantFiled: November 26, 2007Date of Patent: April 9, 2013Assignee: ASML Netherlands B.V.Inventors: Hernes Jacobs, Eva Mondt, Alexander Nikolov Zdravkov
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Publication number: 20130081224Abstract: A device (1) comprises filtering means (30) for removing particles from a fluid, which have a particle collecting face (31) for collecting particles during use of the device (1), and a chamber (10) in which a fluid is present and in which the filtering means (30) are arranged. An inlet (11) of the chamber (10) comprises a spouting part (20) which serves for spouting the fluid to be filtered in a direction towards the particle collecting face (31) of the filtering means (30). An arrangement of the spouting part (20) and the particle collecting face (31) with respect to each other is adapted to generate, during operation of the device (1), a rotating flow pattern in the fluid that is present in the chamber (10) under the influence of the flow of the fluid to be filtered, whereby particles can be blown away from the particle collecting face (31).Type: ApplicationFiled: June 16, 2011Publication date: April 4, 2013Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Johannes Tseard Van Der Kool, Fokke Roelof Voorhorst, Bastian Cornelis Kleine-Doepke, Maiza Georgien Salomons, Richard Henrik Jousma, Eva Mondt
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Patent number: 8274641Abstract: A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.Type: GrantFiled: June 1, 2009Date of Patent: September 25, 2012Assignee: ASML Netherlands B.V.Inventors: Eva Mondt, Noud Jan Gilissen, Hernes Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen
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Publication number: 20120138817Abstract: A device comprises a housing (10) having an interior space (11) for containing fluid, an inlet for letting in fluid to the housing (10), an outlet for letting out fluid from the housing (10), an element (20) which is arranged inside the housing (10), and means (31, 32) which are arranged in the housing (10) as well and which serve for guiding the fluid from the inlet side of the housing (10) to the outlet side of the housing (10), around the element (20). The fluid guiding means comprise two zigzag-shaped components (31, 32) extending along at least a portion of the element (20) and, as a combination, providing complete coverage of the element (20) in a circumferential direction, i.e. a direction around the element (20), wherein the zigzag-shaped components (31, 32) partly overlap in the circumferential direction.Type: ApplicationFiled: August 3, 2010Publication date: June 7, 2012Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Eva Mondt, Paulus Cornelis Duineveld
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Publication number: 20120138816Abstract: A device (1) comprises a source (20) for emitting ultraviolet light, an inlet (30) for letting in fluid to the device (1), an outlet (40) for letting out fluid from the device (1), and means (51, 52) for performing a straightening action of a flow of fluid through the device (1). The flow straightening means comprise at least one flow straightening element (51, 52) having inlet openings for letting in fluid at one side and outlet openings for letting out fluid at another side, wherein each inlet opening is in communication with a plurality of outlet openings, and wherein the element (51, 52) comprises a maze of randomly arranged, interconnected holes. In such a structure, a water element that is moving from one side of the element (51, 52) to another side may take one of various paths, as a result of which variations in inlet conditions can be dampened.Type: ApplicationFiled: August 12, 2010Publication date: June 7, 2012Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Paulus Cornelis Duineveld, Eva Mondt, Harko Jan Taekema, Willem Sjouke Wijma, Marc Alexander Pastoors, Wilhelmus Hendrikus Maria Bruggink
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Publication number: 20100208224Abstract: A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.Type: ApplicationFiled: February 19, 2010Publication date: August 19, 2010Applicant: ASML Netherlands B.V.Inventors: Hernes Jacobs, Erik Roelof Loopstra, Michel Riepen, Eva Mondt
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Patent number: 7692765Abstract: A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.Type: GrantFiled: February 21, 2007Date of Patent: April 6, 2010Assignee: ASML Netherlands B.V.Inventors: Hernes Jacobs, Erik Roelof Loopstra, Michel Riepen, Eva Mondt
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Publication number: 20090296056Abstract: A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.Type: ApplicationFiled: June 1, 2009Publication date: December 3, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Eva Mondt, Noud Jan Gilissen, Hernes Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen
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Publication number: 20080212046Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: ApplicationFiled: November 30, 2007Publication date: September 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Josef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete