Abstract: In a method for producing a final mask layout for a mask, a provisional auxiliary mask layout is generated in accordance with an electrical circuit diagram. The provisional mask layout includes a main structure that extends in a longitudinal direction. The provisional auxiliary mask layout is converted into a final mask layout with the aid of an OPC method. The converting includes associating at least one optically non-resolvable auxiliary structure with the main structure, wherein the at least one optically non-resolvable auxiliary structure has a longitudinal direction that extends obliquely with respect to the longitudinal direction of the main structure.

Abstract: A method for producing a final mask layout (20?) avoids imaging errors. A provisional auxiliary mask layout (110) is produced, in particular in accordance with a predefined electrical circuit diagram, and is converted into the final mask layout (20?) with the aid of an OPC method. A main structure (120, 130) of the provisional auxiliary mask layout (110) is assigned optically non-resolvable auxiliary structures (160, 320). Exclusively the optically non-resolvable auxiliary structures (160, 320) are altered in the context of the OPC method, and the main structure (120, 130) itself remains unaltered.