Abstract: In a process for the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides, a bis-o-aminophenol or a bis-o-aminothiophenol is reacted with a dicarboxylic acid derivative of the following structure: ##STR1## with D=O, S, or NH and where R* is the parent body of the dicarboxylic acid and at least one of the groups R.sup.1 and R.sup.2 is CN or NO.sub.2.

Abstract: A method for producing poly-o-hydroxy amides by conversion of an activated dicarboxylic acid derivative with a bis-o-aminophenol. A solution of the activated dicarboxylic acid derivative is added to a solution of the bis-o-aminophenol in a lactone, and a tertiary amine is added to the resulting mixture, wherein the lactone has the following structure: ##STR1## where A is--(CR.sup.1 R.sup.2).sub.m --or--(CR.sup.3 R.sup.4).sub.n --NR.sup.5 --,R.sup.1 to R.sup.5 are independent of one anotherR.sup.1 and R.sup.2 are hydrogen, alkyl with 1 to 7 carbon atoms (linear or branched), --CO(CH.sub.2).sub.p CH.sub.3, or --COO(CH.sub.2).sub.p CH.sub.3, with p=0 or 1,R.sup.3 and R.sup.4 are hydrogen or alkyl with 1 to 3 carbon atoms (linear or branched),R.sup.5 is hydrogen or methyl,m is a whole number from 2 to 11, andn is a whole number from 1 to 3.

Abstract: Premixed polymers which can serve as base polymers for high-resolution resists are structured from 40 to 99 mole % of a tert. butyl ester of an unsaturated carboxylic acid and 1 to 60 mole % of an anhydride of an unsaturated carboxylic acid.

Abstract: Methods for producing solutions of polybenzoxazol precursors that are soluble in alkali and resist solutions based on such precursors. A dicarboxylic acid halogenide is reacted with a bis-(o-aminophenol) in an organic solvent and in the presence of a polymer with a tertiary N atom, which is insoluble in the solvent. Excess polymer and hydrohalogenide are separated from the reaction solution. The reaction solution is optionally mixed with a photoactive component.

Abstract: New mixed polymers which can serve as base polymers for high-resolution resists are structured from 40 to 99 mole % of a tert. butyl ester of an unsaturated carboxylic acid and 1 to 60 mole % of an anhydride of an unsaturated carboxylic acid.

Abstract: High resolution resist structures with steep edges are obtained using standard equipment, with high sensitivity, particularly in the deep UV range. A photoresist layer consisting of a polymer having anhydride groups and blocked imide- or phenolic hydroxyl groups and of a photoactive component which forms a strong acid during irradiation is first deposited on a substrate, followed by irradiation with a patterned image. The irradiated photoresist layer is then treated with a water-based or a water-alcohol-based solution of a polyfunctional amino- or hydroxy-siloxane, and is etched in an oxygen-containing plasma.

Abstract: High resolution resist structures with steep edges are obtained using standard equipment, even in cases involving critical contact-hole planes. First, a photoresist layer containing a polymer with chemically reactive groups and a photoactive component based on diazoketone or quinone diazide is deposited on a substrate. The photoresist layer is then irradiated with a patterned image and treated with a polyfunctional organic compound having functional groups that can chemically react with the reactive groups of the polymer. This step is followed by a maskless flood exposure. The photoresist layer irradiated in this manner is then treated with a metal-containing organic compound having at least one functional group capable of chemical reaction with the reactive groups of the polymer, followed by etching in an oxygen-containing plasma.

Abstract: The invention provides a radiation-curable liquid resin useful as a secondary coating of lightwave guides. The resin is a reaction product of (meth)acrylic acid or glyceroldi(meth)acrylate or pentaerythritoltri(meth)acrylate with a 2:1 addition compound of a diepoxide and an .alpha.,.omega. -diol with a mean molecular weight between 600 and 3000, or, a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a conversion product of the 2:1 addition compound and a low-molecular monovalent alcohol C.sub.1 to C.sub.10), a low-molecular bivalent alcohol (C.sub.2 to C.sub.4) or water, where the diepoxide is an aromatic diglycidylether and the .alpha.,.omega. -diol is an .alpha.,.omega.-hydroxy-terminated polyoxyalkylene, an .alpha.,.omega. -hydroxy-terminated polyester, an .alpha.,.omega. -hydroxy-terminated polybutadiene or an .alpha.,.omega. -hydroxy-terminated organo-functional polysiloxane.

Abstract: The invention provides a radiation-curable liquid resin useful as a secondary coating of lightwave guides. The resin is a reaction product of (meth)acrylic acid or glyceroldi (meth)acrylate or Pentaerythritoltri(meth)acrylate with a 2:1 addition compound of a diepoxide and an .alpha., .omega.-diol with a mean molecular weight between 600 and 3000, or, a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a conversion product of the 2:1 addition compound and a low-molecular monovalent alcohol (C.sub.1 to C.sub.10), a low-molecular bivalent alcohol (C.sub.2 to C.sub.4) or water, where the diepoxide is an aromatic diglycidylether and the .alpha.,.omega.-diol is an .alpha., .omega.-hydroxy-terminated polyoxyalkylene, an .alpha., .omega.-hydroxy-terminated polyester, an .alpha.,.omega.-hydroxy-terminated polybutadiene or an .alpha.,.omega.-hydroxy-terminated organo-functional polysiloxane.

Abstract: The invention provides a radiation-curable liquid resin for use as a secondary coating of lightwave guides which is a reaction product of (meth)acrylic acid or -acid chloride or isocyanatoalkyl-(meth)acrylate with a 1:2 addition compound of a diepoxide with a mean molecular weight.ltoreq.1000 and a short-chain .alpha.,.omega. -diol with a mean molecular weight.ltoreq.700 or with a 1:2 addition compound of a diepoxide with a mean molecular weight.ltoreq.400 and a monovalent aliphatic alcohol with a mean molecular weight.ltoreq.200, where the diepoxide is an aliphatic-aromatic or aromatic diglycidylether, an aliphatic or cycloaliphatic diepoxide or a silicon-organodiepoxide, and where the short-chain .alpha.,.omega. -diol is an .alpha..omega. -hydroxy-terminated polyoxyalkylene, an .alpha.,.omega. -hydroxy-terminated polyester, an .alpha.,.omega. -hydroxy-terminated polybutadiene, an .alpha.,.omega. -hydroxyterminated organo-functional polysiloxane or an .alpha.,.omega. -alkanediol with a mean molecular weight.

Abstract: The invention relates to a method for the currentless catalytic precipitation of aluminum. The surface of insulating and conductive materials (substrates) to be aluminized is (1) catalyzed, while a film-forming moisture-insensitive layer is developed, with a compound active at the boundary surfaces, by a brief immersion in a dilute solution of (a) a modified ester or acylate of titanium, zirconium or vanadium, substituted at the metal atom with short- and long-chain organic radicals or (b), a chloride of the transition metals of the IV and V secondary group of the periodic system of the elements and a water-containing metal soap of a polyvalent metal, preferably aluminum soaps; (2) is intensively rinsed with aprotic solvents, preferably having a boiling point of over 100.degree. C.; and (3) is immersed in a 1 to 4% solution of trialkylaminalanes in a solvent mixture of aromatic and highly viscous aliphatic compounds. A homogeneous and strongly adhering aluminum coating is thereby obtained.