Abstract: An optical assembly has an optical element for influencing the beam path in a projection exposure apparatus and an actuator device for deforming the optical element. The actuator device has at least one photostrictive component and at least one light source. The photostrictive component is mechanically coupled to the optical element for the transmission of a tensile and/or compressive force in order to deform the optical element. The light source is configured for targeted illumination of the photostrictive component in order to induce the tensile and/or compressive force in the photostrictive component.

Abstract: An optical assembly has an optical element for influencing the beam path in a projection exposure apparatus and an actuator device for deforming the optical element. The actuator device has at least one photostrictive component and at least one light source. The photostrictive component is mechanically coupled to the optical element for the transmission of a tensile and/or compressive force in order to deform the optical element. The light source is configured for targeted illumination of the photostrictive component in order to induce the tensile and/or compressive force in the photostrictive component.

Abstract: A measuring system (MS) configured to measure a projection radiation property representing an aberration level at a plurality of spaced apart measuring points distributed in the image field; and an operating control system with at least one manipulator operatively connected to an optical element of a projection exposure system to modify imaging properties of the projection exposure system based on measurement results generated by the measuring system. In a measuring point distribution calculation (MPDC), a measuring point distribution defining a number and positions of measuring points is used. The MPDC is performed under boundary conditions representing at least: (i) manipulation capacities of the operating control system; (ii) measuring capacities of the measuring system; and (iii) predefined use case scenarios defining a set of representative use cases. Each use case corresponds to a specific aberration pattern generated by the projection exposure system under a predefined set of use conditions.

Abstract: A method and a device determine the heating state of an optical element in an optical system, for example in a microlithographic projection exposure system. Electromagnetic radiation hits an incidence surface of the optical element during operation of the optical system. Using a calibration parameter, an average temperature at the incidence surface is estimated on the basis of a temperature measurement carried out via at least one temperature sensor located a distance from the incidence surface. The calibration parameter is selected differently in accordance with the illumination setting which is set in the optical system.

Abstract: Disclosed are an optical system, in particular for microlithography, and a method for operating an optical system. According to one disclosed aspect, the optical system includes at least one mirror (100, 500, 600) having an optical effective surface (101, 501, 601) and a mirror substrate (110, 510, 610), wherein at least one cooling channel (115, 515, 615) in which a cooling fluid is configured to flow is arranged in the mirror substrate, for dissipating heat that is generated in the mirror substrate due to absorption of electromagnetic radiation incident from a light source on the optical effective surface, and a unit (135, 535, 635) to adjust the temperature and/or the flow rate of the cooling fluid either dependent on a measured quantity that characterizes the thermal load in the mirror substrate or dependent on an estimated/expected thermal load in the mirror substrate for a given power of the light source.

Abstract: A beam guiding magnet includes a first and second coil system, which are designed such that the dipole moments of the first and second coil systems point in opposite directions. Since the dipole moments of the first and second coil systems point in opposite directions, the two dipole moments at least partially compensate for one another. The resultant dipole moment of the beam guiding magnet may be reduced. The beam guiding magnet may take into account that the remote field of a beam guiding magnet can be lowered by a reduction in the dipole moment of the beam guiding magnet. The dipole moment decreases with the cube of the distance from the beam guiding magnet. A quadruple moment, which on attenuation of the dipole moment represents the next strongest field component, decreases with the fifth power of that distance.

Abstract: A beam guiding magnet includes a first and second coil system, which are designed such that the dipole moments of the first and second coil systems point in opposite directions. Since the dipole moments of the first and second coil systems point in opposite directions, the two dipole moments at least partially compensate for one another. The resultant dipole moment of the beam guiding magnet may be reduced. The beam guiding magnet may take into account that the remote field of a beam guiding magnet can be lowered by a reduction in the dipole moment of the beam guiding magnet. The dipole moment decreases with the cube of the distance from the beam guiding magnet. A quadruple moment, which on attenuation of the dipole moment represents the next strongest field component, decreases with the fifth power of that distance.

Abstract: A radiation treatment system with a beam control magnet for deflecting a beam of electrically charged particles along a curved particle path. The beam control magnet is subdivided along a parting plane perpendicular to the direction of the particle path into a first region and a second region. The quadrupole moments of the beam control magnet have different signs in the first region and the second region.

Abstract: A beam guidance magnet for deflecting a beam of electrically charged particles along a curved particle path is provided. The beam guidance magnet includes a coil system that does not include a ferromagnetic material affecting the beam guidance and has curved coils stretched out along the particle path, the coils being arranged in pairs in mirror symmetry to the beam guidance plane. The coil system includes two primary coils and two substantially flat secondary coils. The two primary coils include primary coil sides and primary coil end parts bent upward relative to the beam guidance plane. The two substantially flat secondary coils are disposed between the primary coil end parts. Supplementary coils are disposed in the field range of the respective curved secondary coil end parts.