Patents by Inventor Evan Hicks

Evan Hicks has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fluorinated photoresists prepared, deposited, developed and removed in carbon dioxide
    Publication number: 20050170277
    Abstract: The present invention provides a compound that is a terpolymer of: (a) at least one ethylenically unsaturated linear or branched compound that has at least one fluorine atom covalently coupled thereto; (b) at least one ethylenically unsaturated precursor of a cyclic or polycyclic compound that has at least one fluorine atom covalently coupled thereto forming a cyclic or polycyclic decrystallizing monomer in said terpolymer; and (c) at least one ethylenically unsaturated functional compound which as a monomer in said terpolymer changes solubility upon exposure to an acid or base.
    Type: Application
    Filed: October 19, 2004
    Publication date: August 4, 2005
    Inventors: Luke Zannoni, Joseph DeSimone, Evan Hicks, Colin Wood