Patents by Inventor Evan Mapoles

Evan Mapoles has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7436503
    Abstract: Accordingly, the present invention provides methods and apparatus for performing a darkfield inspection on a specimen having periodic structures thereon while substantially reducing or eliminating the long range ringing response, which is typically produced by a traditional Fourier filter mask used to eliminate the diffraction caused by the periodic structures. In one embodiment, an apparatus for inspecting a specimen by detecting optical beams scattered from the specimen. The apparatus includes a beam generator for providing and directing an incident beam towards a specimen and an array subtraction device for substantially subtracting a periodic component from an output beam scattered from the specimen in response to the incident beam. The periodic component corresponds to at least one periodic structure on the specimen, and the subtraction is performed so as to substantially reduce or eliminate a ringing response from the output beam.
    Type: Grant
    Filed: December 10, 2004
    Date of Patent: October 14, 2008
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: Grace Hsiu-Ling Chen, Tao-Yi Fu, Evan Mapoles
  • Publication number: 20070081154
    Abstract: A dark field surface inspection tool and system are disclosed herein. The tool includes an illumination source capable of scanning a light beam onto an inspection surface. Light scattered by each inspection point is captured as image data by a photo detector array arranged at a fourier plane. The images captured are adaptively filtered to remove a portion of the bright pixels from the images to generate filtered images. The filtered images are then analyzed to detect defects in the inspection surface. Methods of the invention include using die-to-die comparison to identify bright portions of scattering patterns and generate unique image filters associated with those patterns. The associated images are then filtered to generate filtered images which are then used to detect defects. Also, data models of light scattering behavior can be used to generate filters.
    Type: Application
    Filed: December 20, 2005
    Publication date: April 12, 2007
    Inventors: Evan Mapoles, Grace Chen, Christopher Bevis, David Shortt