Patents by Inventor Evan P. DONOGHUE
Evan P. DONOGHUE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11905590Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.Type: GrantFiled: May 28, 2021Date of Patent: February 20, 2024Assignee: eMagin CorporationInventors: Evan P. Donoghue, Fridrich Vazan, Kerry Tice, Ilyas I. Khayrullin, Tariq Ali, Qi Wang, Laurie Sziklas, Amalkumar P. Ghosh
-
Publication number: 20240028162Abstract: An electronic display may include a touch sensing system configured to perform touch sensing in an active area of the electronic display and display driver circuitry configured to program display pixels of the active area to emit light. The electronic display may also include the active area. The active area may include a first portion and a second portion that are at least partially electrically separated. The display driver circuitry may program the display pixels in the first portion while the touch sensing circuitry may perform touch sensing in the second portion.Type: ApplicationFiled: June 22, 2023Publication date: January 25, 2024Inventors: Jason N Gomez, Hyunwoo Nho, Jason C Hu, Kwang Soon Park, Kyung Wook Kim, James E Brown, Jie Won Ryu, Myungjoon Choi, Yao Shi, ByoungSuk Kim, Vehbi Calayir, Peng Li, Evan P Donoghue
-
Patent number: 11313033Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor pressType: GrantFiled: September 16, 2020Date of Patent: April 26, 2022Assignee: eMagin CorporationInventors: Tariq Ali, Ilyas I. Khayrullin, Amalkumar P. Ghosh, Evan P. Donoghue, Qi Wang, Fridrich Vazan, Kerry Tice, Laurie Sziklas
-
Patent number: 11152573Abstract: A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.Type: GrantFiled: May 1, 2018Date of Patent: October 19, 2021Assignee: eMagin CorporationInventors: Fridrich Vazan, Evan P. Donoghue, Ilyas I. Khayrullin, Tariq Ali, Kerry Tice, Amalkumar P. Ghosh
-
Publication number: 20210285087Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.Type: ApplicationFiled: May 28, 2021Publication date: September 16, 2021Inventors: Evan P. DONOGHUE, Fridrich VAZAN, Kerry TICE, Ilyas I. KHAYRULLIN, Tariq ALI, Qi WANG, Laurie SZIKLAS, Amalkumar P. GHOSH
-
Patent number: 11121321Abstract: Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.Type: GrantFiled: November 1, 2018Date of Patent: September 14, 2021Assignee: eMagin CorporationInventors: Evan P. Donoghue, Ilyas I. Khayrullin, Kerry Tice, Tariq Ali, Qi Wang, Fridrich Vazan, Amalkumar P. Ghosh
-
Patent number: 11035033Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.Type: GrantFiled: October 24, 2018Date of Patent: June 15, 2021Assignee: eMagin CorporationInventors: Evan P. Donoghue, Fridrich Vazan, Kerry Tice, Ilyas I. Khayrullin, Tariq Ali, Qi Wang, Laurie Sziklas, Amalkumar P. Ghosh
-
Publication number: 20200407839Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor pressType: ApplicationFiled: September 16, 2020Publication date: December 31, 2020Inventors: Tariq ALI, Ilyas I. KHAYRULLIN, Amalkumar P. GHOSH, Evan P. DONOGHUE, Qi WANG, Fridrich VAZAN, Kerry TICE, Laurie SZIKLAS
-
Patent number: 10815563Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor pressType: GrantFiled: September 7, 2018Date of Patent: October 27, 2020Assignee: eMagin CorporationInventors: Tariq Ali, Ilyas I. Khayrullin, Amalkumar P. Ghosh, Evan P. Donoghue, Qi Wang, Fridrich Vazan, Kerry Tice, Laurie Sziklas
-
Publication number: 20200131617Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.Type: ApplicationFiled: October 24, 2018Publication date: April 30, 2020Inventors: Evan P. DONOGHUE, Fridrich VAZAN, Kerry TICE, Ilyas I. KHAYRULLIN, Tariq ALI, Qi WANG, Laurie SZIKLAS, Amalkumar P. GHOSH
-
Patent number: 10636969Abstract: An apparatus and method for performing material deposition on an active-matrix organic light emitting diode (AMOLED) display array on a substrate, includes aligning a shadow mask to a first position relative to the substrate; initially depositing a first material through the shadow mask onto the substrate at a first material deposition position relative to the first position of the aligned shadow mask and at a first deposition height; incrementing the position the shadow mask to a second position relative to the first material deposition position; and subsequently depositing one of the first material or a second material through the shadow mask onto the substrate at a second material deposition position relative to the first material deposition position, wherein the second material deposition position having an identical deposition pattern as the first material deposition position on account of the shadow mask.Type: GrantFiled: May 1, 2018Date of Patent: April 28, 2020Assignee: eMagin CorporationInventors: Evan P. Donoghue, Kerry Tice, Ilyas I. Khayrullin, Fridrich Vazan, Tariq Ali, Laurie Sziklas, Amalkumar P. Ghosh
-
Patent number: 10522794Abstract: A method of active alignment of a shadow mask to a substrate includes a first alignment by moving the shadow mask and the substrate a first distance in a vertical direction, capturing a first alignment image, determining at least one of a first correction distance and a first rotational correction angle, and aligning the shadow mask and the substrate by moving the first correction distance and rotating the first rotational correction angle. The method further includes performing a first material deposition process on the substrate and continuously capturing a first series of alignment images during the generation of the first material deposition flow. During the generation of the first material deposition flow the first series of alignment images are analyzed to determine a second correction distance and a second rotational correction angle and determining whether second distance and/or rotational correction angle is greater than or equal to a predetermined value to cause a second alignment process to occur.Type: GrantFiled: November 1, 2018Date of Patent: December 31, 2019Assignee: eMagin CorporationInventors: Ilyas I. Khayrullin, Evan P. Donoghue, Kerry Tice, Tariq Ali, Qi Wang, Fridrich Vazan, Amalkumar P. Ghosh
-
Patent number: 10483478Abstract: A tandem Organic Light Emitting Diode (OLED) apparatus and method of fabricating the same, where the tandem OLED apparatus includes a buffer assisted charge generation layer having a junction of a p-type doped semiconductor layer and an n-type doped semiconductor layer, where a hole buffer layer and an electron buffer layer pair surrounding the junction of the p-type and n-type doped semiconductor layers. The OLED apparatus further includes a first OLED emissive layer and a second OLED emissive layer pair surrounding the buffer assisted charge generation layer, and a cathode and anode layer pair further surrounding the first and second OLED emissive layer pair.Type: GrantFiled: February 28, 2018Date of Patent: November 19, 2019Assignee: eMagin CorporationInventors: Qi Wang, Evan P. Donoghue, Ilyas I. Khayrullin, Tariq Ali, Kerry Tice, Amalkumar P. Ghosh
-
Publication number: 20190131590Abstract: A method of active alignment of a shadow mask to a substrate includes a first alignment by moving the shadow mask and the substrate a first distance in a vertical direction, capturing a first alignment image, determining at least one of a first correction distance and a first rotational correction angle, and aligning the shadow mask and the substrate by moving the first correction distance and rotating the first rotational correction angle. The method further includes performing a first material deposition process on the substrate and continuously capturing a first series of alignment images during the generation of the first material deposition flow. During the generation of the first material deposition flow the first series of alignment images are analyzed to determine a second correction distance and a second rotational correction angle and determining whether second distance and/or rotational correction angle is greater than or equal to a predetermined value to cause a second alignment process to occur.Type: ApplicationFiled: November 1, 2018Publication date: May 2, 2019Inventors: Ilyas I. KHAYRULLIN, Evan P. DONOGHUE, Kerry TICE, Tariq ALI, Qi WANG, Fridrich VAZAN, Amalkumar P. GHOSH
-
Publication number: 20190131528Abstract: Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.Type: ApplicationFiled: November 1, 2018Publication date: May 2, 2019Inventors: Evan P. DONOGHUE, Ilyas I. KHAYRULLIN, Kerry TICE, Tariq ALI, Qi WANG, Fridrich VAZAN, Amalkumar P. GHOSH
-
Publication number: 20190106782Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor pressType: ApplicationFiled: September 7, 2018Publication date: April 11, 2019Inventors: Tariq ALI, Ilyas I. KHAYRULLIN, Amalkumar P. GHOSH, Evan P. DONOGHUE, Qi WANG, Fridrich VAZAN, Kerry TICE, Laurie SZIKLAS
-
Publication number: 20180340252Abstract: A system and method for reducing attractive forces between a deposition mask and a substrate is provided that enables high-resolution direct deposition of a patterned layer of material on a substrate using electrostatic chucks for holding the substrate and the shadow mask. A charge-dissipating shadow mask is utilized that comprises a thin conductive layer on the surface of the membrane of the shadow mask. The conductive layer helps to dissipate the charge that accumulates on the membrane of the shadow mask, thereby reducing the attractive forces between the substrate and the shadow mask. As a result, the shadow mask and substrate can be placed in closer proximity to each other than would be possible without the charge-dissipating shadow mask, thereby reducing feathering effects and enabling higher resolution direct deposition.Type: ApplicationFiled: May 24, 2018Publication date: November 29, 2018Inventors: Fridrich VAZAN, Evan P. DONOGHUE, Kerry TICE, Ilyas I. KHAYRULLIN, Tariq ALI, Qi WANG, Amalkumar P. GHOSH
-
Publication number: 20180315925Abstract: A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.Type: ApplicationFiled: May 1, 2018Publication date: November 1, 2018Inventors: Fridrich VAZAN, Evan P. DONOGHUE, Ilyas I. KHAYRULLIN, Tariq ALI, Kerry TICE, Amalkumar P. GHOSH
-
Publication number: 20180315926Abstract: An apparatus and method for performing material deposition on an active-matrix organic light emitting diode (AMOLED) display array on a substrate, includes aligning a shadow mask to a first position relative to the substrate; initially depositing a first material through the shadow mask onto the substrate at a first material deposition position relative to the first position of the aligned shadow mask and at a first deposition height; incrementing the position the shadow mask to a second position relative to the first material deposition position; and subsequently depositing one of the first material or a second material through the shadow mask onto the substrate at a second material deposition position relative to the first material deposition position, wherein the second material deposition position having an identical deposition pattern as the first material deposition position on account of the shadow mask.Type: ApplicationFiled: May 1, 2018Publication date: November 1, 2018Inventors: Evan P. DONOGHUE, Kerry TICE, Ilyas I. KHAYRULLIN, Fridrich VAZAN, Tariq ALI, Laurie SZIKLAS, Amalkumar P. GHOSH
-
Publication number: 20180269260Abstract: An active matrix OLED apparatus comprises a plurality of pixels each including a layer of three sub-pixel anodes, a transparent cathode layer, and a layer of three sub-pixel OLED emitters disposed between the layer of three sub-pixel anodes and the cathode layer. Each of the plurality of pixels further includes a quantum dot semiconductor nanocrystal layer disposed above the transparent cathode layer, the quantum dot layer comprising a first quantum dot sub-pixel layer having a photoluminescent emission in a first red color wavelength range substantially between 780 to 622 nm, wherein the first quantum dot sub-pixel layer being disposed over one of the three sub-pixel OLED emitters having a light emission wavelength in the first red color wavelength range. The OLED apparatus further includes a controller configured to independently address each of the three sub-pixel OLED emitters via the transparent cathode layer and each of the three sub-pixel anodes.Type: ApplicationFiled: May 22, 2018Publication date: September 20, 2018Inventors: Amalkumar P. GHOSH, Evan P. DONOGHUE, Ilyas I. KHAYRULLIN, Qi WANG, Tariq ALI