Abstract: Provided is a method for securely diversifying a generic application stored in a secure processor of a terminal, said method comprising: Generating at the request of a manager application hosted in an application processor of said terminal, at the level of a distant server, a server challenge; Sending said server challenge to said application; Generating a first message at said application, said first message being function of said server challenge, an application challenge and an unique identifier of said application; Sending said first message to a Root-Of-Trust service hosted in a secure processor of said terminal, said Root-of-Trust service generating an attestation of said first message, said attestation guaranteeing that said first message has not been modified and originates from said secure processor; and Transmitting said attestation of said first message to said distant server in an enablement request message.

Abstract: Provided is a method to implement a Virtual Primary Platform (VPP) using a Tamper Resistant Element (TRE) and an External Execution Environment (EEE).The Virtual Primary Platform (VPP) comprises a VPP Low Level Operating System (VPP LLOS) distributed across a VPP Process Execution Environment (VPEE) in the Tamper Resistant Element (TRE). The VPP Low Level Operating System (VPP LLOS) comprises VPP LLOS API stubs installed in the VPP Process Execution Environment (VPEE) and routes communications between the VPP Process Execution Environment (VPEE) and the External Execution Environment (EEE) and an external agent (EA) installed therein.

Abstract: Methods and apparatus for supplying gas in a plasma processing system that employs the single line drop approach wherein a regulator is shared among multiple mass flow controllers. In one or more embodiments, an accumulator is provided and coupled in gaseous communication with a shared manifold to reduce pressure spikes and dips. A filter, which may be replaceable or non-replaceable separate from the accumulator, is integrated with the accumulator in one or more embodiments.

Abstract: A process is designed to configure a smart card (CP) comprising a microchip (PE) capable of participating in at least two applications, a magnetic stripe (PM) capable of storing information, action means (MA) capable of acting on the magnetic stripe (PM) to modify certain stored information, a control circuit (MC) capable of controlling the microchip (PE) and the action means (MA), and selection means (MS) capable of allowing the selection of an application. This process comprises a step wherein, if one of the applications is selected, a dedicated piece of information that is representative of that selected application is stored in a location accessible to the control circuit (MC), so that if the microchip (PE) is woken up, the microchip (PE) automatically retrieves the dedicated information in order to activate the selected application represented by it.

Abstract: A method of calculating a transient flow rate of a flowed process gas comprises flowing process gas through a mass flow controller into a chamber of known volume and measuring successive data sample points which include pressure data, temperature data, and a time value for each successive data sample point. Groups of successive data sample points are identified wherein each group shares one or more successive data sample points with another group, and ratio values are calculated for each of the successive data sample points wherein each ratio value is a ratio between the pressure data and a product of temperature and gas compressibility data for each respective time value.

Abstract: A gas supply system for providing a plurality of process gases to a process chamber includes a plurality of mass flow controllers each arranged to receive a respective subset of the plurality of process gases. Each of the respective subsets includes more than one of the process gases, and at least one of the process gases is provided to more than one of the plurality of mass flow controllers. Respective valves are arranged upstream of each of the plurality of mass flow controllers to selectively provide the respective subsets to the mass flow controllers. A first quantity of the plurality of mass flow controllers is less than a total number of the plurality of process gases to be supplied to the process chamber. The first quantity is equal to a maximum number of the plurality of process gases to be used in the process chamber at any one time.

Abstract: A pairing device for establishing a secure wireless communication path between a first device having a first body-coupling communication interface and a second device having a screen.

Abstract: The communication device 1 comprises a memory M for storing a numeric key and a diversification algorithm; a calculator D for generating an identification code from at least the numeric key and the diversification algorithm; a display for displaying the identification code generated 101, 102, 103 by the calculator. The communication device further comprises a light sensor 11 for receiving a light signal 30.

Abstract: A pairing device for establishing a secure wireless communication path between a first device having a first body-coupling communication interface and a second device having a screen.

Abstract: The invention relates to a method for controlling contactless transactions of contactless applications stored on a first secure element, said contactless transactions being operated with a portable device, said portable device comprising said first secure element. The method is characterised in that it comprises a step of pairing said first secure element with a second secure element, a step of requesting to the second secure element an authorization to execute a predetermined number of contactless transactions, a step of requesting to the second secure element another authorization to execute a new predetermined number of contactless transactions when a predetermined contactless transaction's threshold is reached.

Abstract: A process is designed to configure a smart card (CP) comprising a microchip (PE) capable of participating in at least two applications, a magnetic stripe (PM) capable of storing information, action means (MA) capable of acting on the magnetic stripe (PM) to modify certain stored information, a control circuit (MC) capable of controlling the microchip (PE) and the action means (MA), and selection means (MS) capable of allowing the selection of an application. This process comprises a step wherein, if one of the applications is selected, a dedicated piece of information that is representative of that selected application is stored in a location accessible to the control circuit (MC), so that if the microchip (PE) is woken up, the microchip (PE) automatically retrieves the dedicated information in order to activate the selected application represented by it.

Abstract: A gas supply system for providing a plurality of process gases to a process chamber includes a plurality of mass flow controllers each arranged to receive a respective subset of the plurality of process gases. Each of the respective subsets includes more than one of the process gases, and at least one of the process gases is provided to more than one of the plurality of mass flow controllers. Respective valves are arranged upstream of each of the plurality of mass flow controllers to selectively provide the respective subsets to the mass flow controllers. A first quantity of the plurality of mass flow controllers is less than a total number of the plurality of process gases to be supplied to the process chamber. The first quantity is equal to a maximum number of the plurality of process gases to be used in the process chamber at any one time.

Abstract: A gas supply subsystem for providing a set of process gases to a substrate processing chamber, the set of process gases being a subset of a plurality of process gases available to the substrate processing chamber. The gas supply subsystem has fewer multi-gas mass flow controllers than the number of available process gases, wherein multiple process gases are multiplexed at the input of one or more of the multi-gas mass flow controllers. Pump-purge may be employed to improve gas switching speed for the multi-gas mass flow controllers.

Abstract: Apparatus and methods for sharing a gas panel among a plurality of multi-zone gas feed chambers of a plasma processing chamber. Each multi-zone gas feed chamber is provided with its own multi-zone gas feed device to adjustably split the incoming gas flow into each chamber and provide the different gas flows to different zones of the multi-zone gas feed chamber.

Abstract: A method of calculating a transient flow rate of a flowed process gas comprises flowing process gas through a mass flow controller into a chamber of known volume and measuring successive data sample points which include pressure data, temperature data, and a time value for each successive data sample point. Groups of successive data sample points are identified wherein each group shares one or more successive data sample points with another group, and ratio values are calculated for each of the successive data sample points wherein each ratio value is a ratio between the pressure data and a product of temperature and gas compressibility data for each respective time value.

Abstract: A gas supply subsystem for providing a set of process gases to a substrate processing chamber, the set of process gases being a subset of a plurality of process gases available to the substrate processing chamber. The gas supply subsystem has fewer multi-gas mass flow controllers than the number of available process gases, wherein multiple process gases are multiplexed at the input of one or more of the multi-gas mass flow controllers.

Abstract: Methods and apparatus for supplying gas in a plasma processing system that employs the single line drop approach wherein a regulator is shared among multiple mass flow controllers. In one or more embodiments, an accumulator is provided and coupled in gaseous communication with a shared manifold to reduce pressure spikes and dips. A filter, which may be replaceable or non-replaceable separate from the accumulator, is integrated with the accumulator in one or more embodiments.

Abstract: Apparatus and methods for sharing a gas panel among a plurality of multi-zone gas feed chambers of a plasma processing chamber. Each multi-zone gas feed chamber is provided with its own multi-zone gas feed device to adjustably split the incoming gas flow into each chamber and provide the different gas flows to different zones of the multi-zone gas feed chamber.