Patents by Inventor Evelyn Chin

Evelyn Chin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Processes using photosensitive materials including a nitro benzyl ester photoacid generator
    Patent number: 6159665
    Abstract: Photoacid generators advantageous for use in applications such as photoacid generators used in chemically amplified resists are disclosed. These compounds are based on an ortho nitro benzyl configuration employing an .alpha. substituent having high bulk, steric characteristics, and electron withdrawing ability. The enhanced efficacy is particularly found in compounds both having a suitable .alpha. substituent and a second ortho substituent with large electron withdrawing and steric effects.
    Type: Grant
    Filed: June 17, 1993
    Date of Patent: December 12, 2000
    Assignee: Lucent Technologies Inc.
    Inventors: Evelyn Chin, Francis Michael Houlihan, Omkaram Nalamasu
  • Resist materials
    Patent number: 5830619
    Abstract: Photoacid generators advantageous for use in applications such as photoacid generators used in chemically amplified resists are disclosed. These compounds are based on an ortho nitro benzyl configuration employing an .alpha. substituent having high bulk, steric characteristics, and electron withdrawing ability. The enhanced efficacy is particularly found in compounds both having a suitable .alpha. substituent and a second ortho substituent with large electron withdrawing and steric effects.
    Type: Grant
    Filed: January 7, 1997
    Date of Patent: November 3, 1998
    Assignee: Lucent Technologies Inc.
    Inventors: Evelyn Chin, Francis Michael Houlihan, Omkaram Nalamasu