Patents by Inventor Evert H. J. Draaijer

Evert H. J. Draaijer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6721036
    Abstract: On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements.
    Type: Grant
    Filed: April 6, 2001
    Date of Patent: April 13, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Arie C. Scheiberlich, Menno Fien, Evert H. J. Draaijer
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20020039694
    Abstract: On-the-Fly leveling in a lithographic apparatus is conducted using a setpoint derived by filtering the output of the combination of the output of a level sensor and another position sensor (LVDT or IFM). The level sensor may include look-ahead. The filter may be a low pass filter to cut-off level variations of wavelength shorter than the width of the slit during a scanning exposure. The filter may also be selected to reduce cross-talk between tilt movements and horizontal displacements.
    Type: Application
    Filed: April 6, 2001
    Publication date: April 4, 2002
    Inventors: Arie C. Scheiberlich, Menno Fien, Evert H.J. Draaijer