Patents by Inventor Evert Hendrik Draaijer

Evert Hendrik Draaijer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060285101
    Abstract: A lithographic apparatus includes a control system configured to control a position of a substrate table, the control system including: a first detection device to generate a projection system position signal representative of the position of the projection system, a second detection device to generate a projection system feed-forward signal, a comparative unit to generate a servo error signal by subtracting a signal representative of an actual substrate table position from a substrate table position reference signal and adding the projection system position signal, a control unit to generate a first control signal on the basis of the servo error signal, an addition unit to generate a second control signal by adding the feed-forward signal and the first control signal, and an actuator unit to actuate said substrate table to a desired substrate table position on the basis of the second control signal, The control system further includes a projection system position signal filter unit to filter the projection s
    Type: Application
    Filed: June 20, 2005
    Publication date: December 21, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Hans Butler, Evert Hendrik Draaijer, Marcus Joseph Breukers