Patents by Inventor Evgenii Dmitreevitch Korob

Evgenii Dmitreevitch Korob has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, radiation system and device manufacturing method
    Patent number: 8018574
    Abstract: A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: September 13, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Rafilevitch Gayazov, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Konstantin Nikolaevitch Koshelev, Givi Georgievitch Zukavishvili, Yurii Victorovitch Sidelnikov
  • Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7335900
    Abstract: A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
    Type: Grant
    Filed: July 12, 2005
    Date of Patent: February 26, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Givi Georgievitch Zukavishvili, Robert Rafilevitch Gayazov, Vladimir Mihailovitch Krivtsun
  • Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7208746
    Abstract: A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: April 24, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Givi Georgievitch Zukavishvili, Robert Rafilevitch Gayazov, Vladimir Mihailovitch Krivtsum