Abstract: For producing a superconducting circuit, a film (12) consisting of a cuprate superconductor material is generated on a substrate (13), wherein the superconductor material is in the superconducting state at an operating temperature of the superconducting circuit to be produced, and then the film is irradiated by projecting an energetic ion radiation onto the film through a mask (11) positioned at a distance from the film and protecting selected areas of the film from being irradiated, the mask comprising a structure pattern transparent to the ion radiation but otherwise opaque to the ion radiation. Areas (14) not protected by the mask are irradiated with an ion dose being sufficiently low to avoid degradation of the crystal structure of the first film but being sufficient to inhibit superconductivity of the film with respect to the operating temperature; ion doses are preferably in the range of 0.8·1015 and 2·1015 ions/cm2 or below.