Patents by Inventor Ewald Neumann

Ewald Neumann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for the purification of corrosive gases
    Patent number: 7108737
    Abstract: The present invention relates to a novel process for the preparation of high-purity chemicals with an extremely low particle count, such as ammonia gas, hydrogen fluoride and hydrogen chloride, which are also used as aqueous solutions in semiconductor technology the corrosive gas is enriched with an absorbent which is miscible with the gas and in which impurities present in the gas are soluble, and the gas is subsequently subjected to membrane filtration.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: September 19, 2006
    Assignee: BASF Aktiengesellschaft
    Inventors: Ewald Neumann, Wolfgang Himmler, Werner Büttner, Harald Fritsch, Hans-Jürgen Schmidt, Martin Hostalek
  • Method for the purification of hydrogen peroxide solutions
    Patent number: 6939527
    Abstract: The invention relates to a novel chromatographic process for the further purification of hydrogen peroxide solutions, giving high-purity solutions which can be employed in semiconductor technology under today's high purity requirements.
    Type: Grant
    Filed: March 29, 2001
    Date of Patent: September 6, 2005
    Assignee: Merck Patent GmbH
    Inventors: Dietmar Oeter, Claus Dusemund, Ewald Neumann, Klaus Freissler, Martin Hostalek
  • Method for the purification of corrosive gases
    Publication number: 20040089152
    Abstract: The present invention relates to a novel process for the preparation of high-purity chemicals with an extremely low particle count, such as ammonia gas, hydrogen fluoride and hydrogen chloride, which are also used as aqueous solutions in semiconductor technology the corrosive gas is enriched with an absorbent which is miscible with the gas and in which impurities present in the gas are soluble, and the gas is subsequently subjected to membrane filtration.
    Type: Application
    Filed: September 26, 2003
    Publication date: May 13, 2004
    Inventors: Ewald Neumann, Wolfgang Himmler, Werner Buttner, Harald Fritsch, Hans-Jurgen Schmidt, Martin Hostalek
  • Method for the purification of hydrogen peroxide solutions
    Publication number: 20030165420
    Abstract: The invention relates to a novel chromatographic process for the further purification of hydrogen peroxide solutions, giving high-purity solutions which can be employed in semiconductor technology under today's high purity requirements.
    Type: Application
    Filed: November 22, 2002
    Publication date: September 4, 2003
    Inventors: Dietmar Oeter, Claus Dusemund, Ewald Neumann, Klaus Freissler, Martin Hostalek
  • Front construction unit for electrical monitoring panel
    Patent number: 4652972
    Abstract: In an electrical monitoring panel comprising a grid frame (26,27) having front elements (26,27) disposed at its front side and instrument insets at its rear side, elements of the electric circuitry are arranged inside the front elements.The front elements may be removed from the grid frame whereby the connection with the electric lines and components of the instrument inset is interrupted. The front elements are interconnected by contact elements to permit electric connections in the plane ahead of the grid frame.
    Type: Grant
    Filed: May 14, 1985
    Date of Patent: March 24, 1987
    Assignee: Christof Subklew
    Inventor: Ewald Neumann