Abstract: A secondary ion mass spectrometer comprises: (a) a first primary ion source for generating a first pulsed primary ion beam with short pulse durations; (b) a second primary ion source for generating a second pulsed primary ion beam with pulse durations in the range of 50 ns and up to 5 s; (c) a first TOF-SIMS analysis unit for mass spectroscopic analysis of the secondary ions generated by the primary ion pulses of the first primary ion source from a sample; and (d) a second analysis unit for mass spectroscopic analysis of the secondary ions generated by the primary ion pulses of the second primary ion source from a sample.

Abstract: A secondary ion mass spectrometer comprises: (a) a first primary ion source for generating a first pulsed primary ion beam with short pulse durations; (b) a second primary ion source for generating a second pulsed primary ion beam with pulse durations in the range of 50 ns and up to 5 s; (c) a first TOF-SIMS analysis unit for mass spectroscopic analysis of the secondary ions generated by the primary ion pulses of the first primary ion source from a sample; and (d) a second analysis unit for mass spectroscopic analysis of the secondary ions generated by the primary ion pulses of the second primary ion source from a sample.

Abstract: A method is used in a time-of-flight mass spectrometer for analysis of a first pulsed ion beam, the ions of which are disposed along the pulse direction, separated with respect to their ion masses. The ions of at least one individual predetermined ion mass or of at least one predetermined range of ion masses can be decoupled from the first pulsed ion beam, as at least one decoupled ion beam, and the first ion beam and the at least one decoupled ion beam are analyzed.

Abstract: A method is used in a time-of-flight mass spectrometer for analysis of a first pulsed ion beam, the ions of which are disposed along the pulse direction, separated with respect to their ion masses. The ions of at least one individual predetermined ion mass or of at least one predetermined range of ion masses can be decoupled from the first pulsed ion beam, as at least one decoupled ion beam, and the first ion beam and the at least one decoupled ion beam are analyzed.

Abstract: A method is used in a time-of-flight mass spectrometer for analysis of a first pulsed ion beam, the ions of which are disposed along the pulse direction, separated with respect to their ion masses. The ions of at least one individual predetermined ion mass or of at least one predetermined range of ion masses can be decoupled from the first pulsed ion beam, as at least one decoupled ion beam, and the first ion beam and the at least one decoupled ion beam are analyzed.

Abstract: Described is a method for analysis of a solid sample and, in particular, for analysis of the material composition and distribution in or on a solid surface. The surface to be analysed is covered with caesium, at least partially and/or in regions, and the surface is irradiated with an analysis beam which contains predominantly or exclusively polyatomic ions with at least 3 atoms per ion. The secondary ions which are produced are then analysed on caesium compound.

Abstract: The invention relates to a method to determine depth profiles in an area of thin coating of solid substrates comprising the following steps: producing an ion beam with a substantial amount of ions having a molecular weight above 32 and consisting of at least 3 atoms; focusing the ion beam on the substrate surface whereby ions break down into two components upon impact and impact energy of the individual atoms or molecular fragments is sufficient for the removal of the upper coating as defined and interaction of particles bombarded by the solid body does not lead to a coating to be formed; removing defined surface coatings by an ionic beam sputter process; determining of concentration of sputtered components removed from the substrate surface by means of a measuring probe with a measuring and evaluation circuit connected downstream.

Abstract: The invention pertains to a process for operating a time-of-flight secondary ion mass spectrometer for analysis of mass spectra, wherein a number of finely structured mass ranges appear in isolation at major intervals, involving the following steps: a) a surface of a material sample is bombarded with primary ion pulses that follow each other at regular time intervals t.sub.z (cycle time), b) the secondary ions of various masses m released from the material sample surface by the primary ions are accelerated to the same energy, c) the mass-dependent time of flight t is measured over a path 1 and the mass is determined therefrom. To increase the resolution and the signal-to-noise ratio the process is characterized in that: d) each primary ion pulse consists of a number of subpulses, e) each subpulse is so narrow that it allows for resolution of the finely structured mass ranges, g) the number n of subpulses is selected so that n.multidot.t.sub.